摘要
对TA2工业纯Ti微弧氧化陶瓷膜的生长规律进行了实验研究,分析了陶瓷膜表面形貌、厚度、相结构等不同生长阶段的实验现象及结果。模拟微弧氧化工艺反应过程,运用多种理论建立并分析了氧化陶瓷膜生长模型及等效电路。模型及电路分析结果证明,陶瓷膜在形成时呈现先离散分布后连接成片的生长特点,成膜后TiO2陶瓷膜具有交流耦合电容效应。模型及等效电路分析与实验结果是吻合的,为改善TA2工业纯Ti微弧氧化工艺并提高陶瓷膜性能提供了实验与理论基础。
Experiments on the rules of ceramic coating growth were conducted in the process of pure titaniumTA2 microarc oxidation （MAO）. The surface morphology, thickness and phase component in different stages were also analysed. Based on oxidation process and dielectric theories, theoretical model and equivalent circuit were established. The analysis results show that the ceramic coating distributes in fragmentation firstly and then in connection, and the completed TiO2 ceramic coating has alternating current （AC） coupling capacitor effect. All the analysis agrees with the experimental results, and it can provide a theoretical and experimental base for improving the performance of coatings as well as MAO technologies.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2012年第20期2763-2766,共4页
Journal of Functional Materials
基金
山东省自然科学基金资助项目(ZR2009FM019)
关键词
工业纯Ti
微弧氧化
陶瓷膜
生长规律
电容效应
pure titanium
microarc oxidation
ceramic coating
growth rules
capacitor effect
作者简介
王宏元（1975-），男，山东济南人，讲师，博士，师承朱瑞富教授和吕宇鹏教授，从事金属材料、生物材料及表面工程研究。
