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SiC_P/ZL109复合材料中SiC的界面行为 被引量:19

SiC PARTICLES AND THEIR INTERFACIAL BEHAVIOR IN SiC_P/ZL109 COMPOSITES
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摘要 以常规 TEM为工具 ,研究了 Si CP/ ZL10 9复合材料中数十个 Si C颗粒及其界面 ,Si优先在 Si C表面上形核、长大 ,形成界面 Si,并形成大量 Si C/ Si界面。靠近 Si C界面的 Al基体中 ,普遍存在一层厚度小于 1μm的“亚晶铝带”,其内有大量位错。Si C与 Al、Si C与 Si之间虽然没有固定的晶体学位向关系 ,但是存在下列优先关系 :(110 3) Si C/ /(111) Al,[112 0 ]Si C/ / [110 ]Al;(110 1) Si C/ / (111) Si;[112 0 ]Si C/ / [112 SiC P/ZL109 composites fabricated by centrifugal casting and squeeze casting were characterized by conventional TEM. The leading phase Si in the (Al+Si) eutectic tended to nucleate and grow preferentially at the SiC surface(facets), thus forming the characteristic “interfacial Si” and the SiC/Si interfaces. A “subgrain Al layer” was usually observed at the Al side of a SiC/Al interface, which was less than 1μm thick with high density of dislocation generated in it. Measurements of crystallographic orientation relationship between SiC and Al and between SiC and Si were made at tens of SiC/Si and SiC/Al interfaces. It is shown that no fixed and unique orientation relationships were determined, though the following preferential ones were observed: (1103) SiC //(111) Al ,[1120] SiC //[110] Al ; (1101) SiC //(111) Si ,[1120] SiC //[112] Si .
出处 《复合材料学报》 EI CAS CSCD 北大核心 2000年第1期65-70,共6页 Acta Materiae Compositae Sinica
基金 广东省科学基金! ( 95 0 2 82 )
关键词 SiC/Al界面 碳化硅增强 界面行为 铝基复合材料 SiC P/ZL109 composites SiC/Al interface SiC/Si interface crystallographic orientation relationship interfacial Si subgrain Al layer
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参考文献3

  • 1丘思畴,半导体表面与界面物理,1995年,223页
  • 2周永溶,半导体材料,1992年
  • 3Li S,J Appl Phys,1988年,64卷,11期,6246页

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