期刊文献+

高Al组分AlGaN基紫外LED结构材料 被引量:3

High Al Content AlGaN Based LED Functional Structures
在线阅读 下载PDF
导出
摘要 采用金属有机物气相外延(MOVPE)技术在c面蓝宝石衬底上,引入脉冲原子层外延技术,制备了一系列表面平整度较高的高Al组分AlGaN基异质结构外延片.并采用电子束金属蒸镀技术及优化热退火方法,获得了良好的欧姆接触电极,进一步将外延片制备成LED管芯.通过对量子结构有源层量子阱混晶组分的设计和调整,掌握并实现了主波长260~330nm紫外LED结构材料的制备. High Al content AlGaN-based ultraviolet light-emitting diode (LED) structures were grown on sapphire substrate by metal organic vapor-phase epitaxy (MOVPE). The pulsed atomic layer epitaxy technology was adopted to improve the crystal quality. Ohmic contacts for the LED devices were obtained by optimizing the annealing conditions. The UV-LEDs with different wavelength(from 260 nm to 330 nm) were achieved by tuning the Al content.
出处 《厦门大学学报(自然科学版)》 CAS CSCD 北大核心 2012年第1期17-21,共5页 Journal of Xiamen University:Natural Science
基金 国家自然科学基金项目(60827004 90921002) 国家重点基础研究发展计划(973)项目(2011CB301905)
关键词 ALGAN 量子阱 欧姆接触 紫外LED AlGaN quantum well ohmic contact UV-LED
作者简介 通信作者:jykang@xmu.edu.cn
  • 相关文献

参考文献11

  • 1Taniyasu Y,Kasu M, Makimoto T. An aluminum nitride light-emitting diode with a wavelength of 210 nanometer [J]. Nature, 2006,441 : 325-328.
  • 2Hiravama H,Tsukada Y, Maeda T, et al. Marked enhancement in the efficiency of deep-ultraviolet AlGaN light-e mitring diodes by using a multi quantum-barrier electron blocking layer[J]. Appl Phys Express,2010,3:031002.
  • 3Fujikawa S, Hideki H, Takano T, et al. Extremely high efficiency 280 nm-band emission from quaternary InAl- GaN quantum wells realized by controlling Si-doped layers[J]. Phys Status Solid C,2009,6:784-787.
  • 4Grandusky J R, Gibb S R, Mendrick M C, et al. Properties of mid-ultraviolet light emitting diodes fabricated from pseudomorphic layers on bulk aluminum nitride substrates[J]. Appl Phys Express, 2010,3 : 072103.
  • 5Khan M A, Shatalov M, Maruska H P, et al. III-nitride UV devices[J]. Jpn J Appl Phys, 2005,44 (10): 7191- 7206.
  • 6Li J, Oder T N, Nakarmi M L, et al. Optical and electrical properties of Mg-doped p-type AlxGa1-x N[J]. Appl Phys Lett, 2002,80:1210-1212.
  • 7Zhang J, Kuokstis E, Fareed Q, et al. Pulsed atomic layer epitaxy of quaternary AIInGaN layers [J]. Appl Phys Lett,2001,79(7):925-927.
  • 8Huang K C,Lan W H, Huang K F. Inductively coupled plasma reactive ion etching-induced GaN defect studied by Schottky current transports analysis [J]. Jap J Appl Phys, 2004,43 (1) : 82-85.
  • 9Srivastava S, Hwang S M,Islam M,et al. Ohmic contact to high aluminum content AtGaN epilayers[J]. J Electron Mater, 2009,38 (11) : 2348-2352.
  • 10Gong R,Wang J Y,Dong Z H,et al. Analysis on the new mechanisms of low resistance stacked Ti/Al ohmic con- tact structure on A1GaN/GaN HEMTs[J]. J Phys D: Appl Phys,2010,43(39):1-6.

同被引文献19

  • 1Yoshihiko Muramoto,Masahiro Kimura,Suguru Nouda.Development and future of ultraviolet light-emitting diodes: UV-LED will replace the UV lamp[J]. Semiconductor Science and Technology . 2014 (8)
  • 2A.-C. Chevremont,A.-M. Farnet,B. Coulomb,J.-L. Boudenne.Effect of coupled UV-A and UV-C LEDs on both microbiological and chemical pollution of urban wastewaters[J]. Science of the Total Environment . 2012
  • 3A.-C. Chevremont,A.-M. Farnet,M. Sergent,B. Coulomb,J.-L. Boudenne.Multivariate optimization of fecal bioindicator inactivation by coupling UV-A and UV-C LEDs[J]. Desalination . 2011
  • 4HidekiHirayama,JunNorimatsu,NorimichiNoguchi,SachieFujikawa,TakayoshiTakano,KenjiTsubaki,NorihikoKamata.Milliwatt power 270 nm‐band AlGaN deep‐UV LEDs fabricated on ELO‐AlN templates[J]. Phys. Status Solidi (c) . 2009 (S2)
  • 5NoguchiNorimichi,HidekiHirayama,TohruYatabe,NorihikoKamata.222 nm single‐peaked deep‐UV LED with thin AlGaN quantum well layers[J]. Phys. Status Solidi (c) . 2009 (S2)
  • 6Viola Kueller,Arne Knauer,Christoph Reich.Modulated Epitaxial Lateral Overgrowth of AlN for Efficient UV LEDs. IEEE Photonics Technology Letters . 2012
  • 7Horng, Ray-Hua,Lin, Re-Ching,Hu, Hung-Lieh,Peng, Kun-Cheng,Hsu, Chen-Peng.Diamond-added-copper heat spreader for UV LED applications. Electrochemical and Solid State Letters . 2011
  • 8H. Hirayama,S. Fujikawa,N. Noguchi, et al.222-282nm AlGaN andInAlGaN-based deep-UV LEDs fabricated on high-quality AlN on sapphire. PhysStatus Solidi . 2009
  • 9Jourdan D.The UV LED market is booming[R/OL]. Yole Developpement . 2013
  • 10Kurin S,Antipov A,Barash I.et al.CHVPE growth of AlGaN-based UV LEDs. Physica Status Solidi C . 2013

引证文献3

二级引证文献5

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部