摘要
为了研制低损耗、高性能的193 nm氟化物增透膜,研究了基底和不同氟化物材料组合对氟化物增透膜的影响。在熔石英基底上,将挡板法和预镀层技术相结合,采用热舟蒸发方式制备了不同氟化物材料组合增透膜,对增透膜的剩余反射率和光学损耗等光学特性,以及表面粗糙度和应力等特性进行了测量和比较。在分析比较和优化的基础上,设计制备的3层1/4波长规整膜系AlF3/LaF3增透膜在193 nm的剩余反射率低于0.14%,单面镀膜增透膜的透射率为93.85%,增透膜表面均方根粗糙度为0.979 nm,总的损耗约为6%。要得到高性能的193 nm增透膜,应选用超级抛光基底。
The effect of different substrates and different fluorides are studied to develop low loss,high-performance 193 nm fluoride antireflection coatings.Different fluoride antireflection coatings are deposited by a molybdenum boat evaporation process on JGS1 substrates,and the thickness of the coatings is controlled by a 1/3 baffle with pre-coating technology.Experimental results and analyses show that all of these coatings have a low residual reflectivity and small optical loss,and the optical loss at 193 nm is mainly determined by the high refractive index film.Based on these studies,an LaF3/AlF3 193 nm antireflection coating is designed and deposited.Its residual reflectivity is less than 0.14%,single-sided transmittance is 93.85%,total loss is about 6% and RMS surface roughness is 0.979 nm.To get a high-performance 193 nm antireflection coating,the super-polished substrate is the best choice.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2011年第3期675-680,共6页
High Power Laser and Particle Beams
基金
国家自然科学基金项目(60678004)
关键词
氟化物薄膜
193nm增透膜
预镀层
基底
剩余反射率
fluoride films
193 nm antireflection coatings
pre-coating
substrate
residual reflectivity
作者简介
薛春荣（1972-），女，讲师，博士，主要从事真空紫外光学薄膜和薄膜材料方面的研究；xcr163@163．com。
