摘要
通过采用现代分析手段OM、XRD及SEM/EDX,研究了钴基高温合金GH5605的高温静态空气氧化行为。得到了该合金的氧化动力学曲线、氧化膜形貌及其相组成,评价了合金的抗氧化性能并分析了合金氧化机理。结果表明：钴基高温合金GH5605在750~950℃时氧化动力学遵循抛物线规律,生成的氧化膜以Cr203为主,无氧化膜剥落;合金氧化过程中无内氧化现象发生;该合金可满足1 100℃以下高温使用要求。
The high temperature oxidation of Co-based GH5605 under static and constant temperatures were studied by means of the modern analytical tools OM,XRD SEM/EDX.Through the test,the oxidation kinetics curves and oxidation rates of the alloy,are got the micrograph and phase components of oxidation scale.The non-oxidizability and the oxidation mechanism have been discussed.The results show that the Co-base GH5605 at 750~950 ℃ oxidation kinetics followed the parabolic law,the main oxide film is Cr2O3;the oxide film didn＇t spall;the phenomenon of internal oxidation didn＇t exist during the oxidation process,and the alloy can be used at the high temperature no more than 1 100℃.
出处
《科学技术与工程》
2011年第6期1328-1331,共4页
Science Technology and Engineering
作者简介
郭淑娟（1972-），女，辽宁开原人，硕士，讲师／工程师研究方向：金属材料、材料成型（焊接方向）。E—mail：gsj1205@yeah．net。
