摘要
利用朗谬尔静电探针技术对双层辉光离子渗金属的等离子体参数进行了初步诊断．结果表明，等离子体电位和电子温度随气压的升高平缓下降，而等离子体密度则随气压的增加而提高，等离子体电位和电子温度均随源极电压和工件阴极电压的增加而降低．在适当的工艺条件下，源极和阴极之间产生了不等电位空心阴极效应，等离子体密度从１０１０数量级增加到１０１２ｃｍ－３．
Langmuir probe technique is used for the plasma diagnostics of double glow plasma surface alloying technique. It has been shown that the plasma potential and the electron temperature decrease and the plasma density increase, with the rise of the gas pressure and the source electrode voltage and substrate cathode voltage. Under suitable processes condition, the unequal potential hollow cathode effect is produced between the source electrode and substrate cathode. The plasma density is increased apparently from 10 10 to 10 12 cm -3 .
出处
《应用科学学报》
CAS
CSCD
1999年第2期232-236,共5页
Journal of Applied Sciences
