摘要
针对白光干涉技术(WLI)应用于大范围测量时图像重叠拼接会引入误差并降低测量效率这一缺欠,本文基于纳米测量机(NMM)提出了一种无重叠拼接的白光干涉测试方法。利用NMM的高精度定位能力,扩展了普通白光干涉仪的测量范围,实现了对微结构近4倍于CCD视场的大范围测量,验证了无重叠图像拼接的可实现性。
White light interferometry has become an important method in micro-structure characterization to perform high precision,fast and non-contact measurements.However,with the limit of the field of view of the objective,the large scale measurement can only be achieved by image stitching.In general case,the image stitching will apply overlapping for the collected images,and the superposed image will also introduce noise.In this paper,a new method based on the nano-measuring machine（NMM） and the white light interferometry（WLI） which can perform the image stitching without superposed parts.The NMM expands the lateral measuring range of the original WLI.A micro-resonator is used to illustrate the capability of the new method and a 3D structure is successfully extracted in nearly 4 times size of CCD field of view.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2010年第7期1048-1052,共5页
Journal of Optoelectronics·Laser
基金
教育部高校博士点基金(新教师基金)资助项目(20070056072)
科技部国防科技合作与交流资助项目(2008DFA71610)
天津市自然科学基金资助项目(09JCYBJC05300)
关键词
微结构
白光干涉技术(WLI)
无重叠图像拼接
大范围
纳米测量机
micro-structures
white light interferometry（WLI）
non-overlapping image stitching
large scale
nano-measuring machine（NMM）
作者简介
E-mail：guotong@tju．edu．cn郭彤（1977-），男，博士，副教授，研究方向为微纳测试技术与精密测控技术．
