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氟化物材料在深紫外波段的光学常数 被引量:8

Optical constants of fluoride films in the DUV range
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摘要 研究了紫外领域常用的6种大带隙的氟化物薄膜材料,在氟化镁单晶基底上用热舟蒸发镀制了三种高折射率材料薄膜LaF3,NdF3,GdF3和三种低折射率材料薄膜MgF2,AlF3,Na3AlF6;用商用lambda900光谱仪测量了它们在190—500 nm范围的透射率光谱曲线;用包络法研究了它们的折射率和消光系数,研究了影响透射率和光学常数的主要因素,给出了6种氟化物材料的光学常数公式和光谱色散曲线,为紫外技术与应用研究提供了参考. High-refractive-index materials such as LaF3 , NdF3 and GdF3 and low-refractive-index materials such as MgF2, AlF3 and Na3 AlF6 single thin films are deposited by a resistive-heating boat at different deposited rates and specific substrate temperatures on single crystal MgF2 substrate. Transmittances of all fluoride thin films are measured through commercial spectrometer in the ambient atmosphere. Optical constants of these films are determined by the envelope method and the factors effecting optical constants are studied. Result of this work may play an important role in the design and manufacture of cost-effective, mechanically and optically stable optical coatings for the VUV region.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2009年第7期5035-5040,共6页 Acta Physica Sinica
基金 国家自然科学基金(批准号:60678004)资助的课题~~
关键词 光学常数 包络法 氟化物材料 深紫外 optical constants, envelope method, fluoride materials, deep ultraviolet
作者简介 E-mail:xcr163@163.com
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  • 1尚淑珍,邵建达,沈健,易葵,范正修.退火对电子束热蒸发193nm Al_2O_3/MgF_2反射膜性能的影响[J].物理学报,2006,55(5):2639-2643. 被引量:7
  • 2Chen Zhiming Wang Jiannong.Basic Material Physics for Semiconductor Devices (半导体器件的材料物理学基础)[M].Beijing: Science Press,1999.326-327 (in Chinese).
  • 3正交实验法编写组.正交实验法[M].北京:国防工业出版社,1976..
  • 4Hass G, Ritter E. Optical film materials and their applications. J. Vacuum Science and Technol. , 1966, 4(2):71-79.
  • 5Arndt D P, Azzam R M A, Bennett J M et al.. Multiple determination of the optical constants of thin-film coating materials. Appl. Opt. , 1984, 23(20):3571-3596.
  • 6Zukic M, Torr D G, Spann J F a al.. Vacuum ultraviolet thin films. 1: Optica constants of BaF2, CaF2, LaF3,MgF2,Al2O3,HfO2, and SiO2.Appl.Opt., 1990, 29(28) :4284-4292.
  • 7Bennett J M, Booty M J. Computational method for determining n and k for a thin film from the measured reflectance, transmittance, and film thickness. Appl.Opt. , 1966, 5(1):41-43.
  • 8Ward L. A survey of the accuracies of some methods for the determination of the optical constants of thin films.Opt. Acta, 1985, 32(2):155-167.
  • 9Wood Ⅱ O R, Craighead H G, Sweeney J E et al..Vacuum ultraviolet loss in magnesium fluoride films.Appl. Opt. , 1984, 23(20):3644-3649.
  • 10Gupta M C. Optical constant determination of thin films.Appl. Opt., 1988, 27(51):954-956.

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