摘要
本文采用真空蒸镀法制备了不同厚度的酞菁锌(ZnPc)超薄膜,研究了不同厚度的ZnPc缓冲层对OLEDs器件发光性能的影响,测试了器件的一系列光电性能,对相关机理进行了探讨。结果表明:含有ZnPc修饰层的器件性能明显优于不含有修饰层的器件,加入ZnPc修饰层后器件发光稳定性也得到了改善,同时不同厚度的修饰层对器件性能的影响也有所不同。分析认为,ZnPc能有效改善ITO表面的平整度和降低空穴注入势垒的性质是提高器件性能的主要原因。
The different thicknesses of ZnPc used as the anode modification layer in typical OLED(ITO/TPD/Alq3/LiF/Al) was prepared by evaporating deposition technique,the influence of thickness on the characteristics was investigatedthe and relative mechanisms was discussed.It has been found that the modified devices with ZnPc show better performance than that of the unmodified devices by comparing their optical and electrical properties,and the luminescence stability was greatly improved.Different thicknesses of ZnPc have different influences on OLEDs.ZnPc can improve the surface roughness of ITO and reduces the barrier between the anode and the hole transport layer,it is the main reason for improving the properties of device.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2009年第3期721-726,共6页
Journal of Synthetic Crystals
作者简介
李方馨（1986-），女，内蒙古自治区人，硕士研究生。E-mail：lfx329@tom．com
通讯作者：李果华，教授。E-mail：guohua_li55@yahoo．com
