摘要
由于金刚石具有室温下最高的热导率,因此用化学气相沉积(CVD)制备的金刚石膜是大功率发光二极管(LED)理想的散热材料。本文利用微波等离子体CVD研究了不同沉积工艺下金刚石薄膜的生长。用扫描电子显微镜(SEM)和拉曼光谱对得到的金刚石薄膜进行了表征,并将金刚石薄膜用作LED散热片的散热效果进行了检测。结果表明:在硅衬底上沉积20-30μm的CVD金刚石薄膜可以有效地降低LED的工作温度;在相同的制备成本下,提高薄膜的厚度(甲烷浓度4%)比提高薄膜的质量(甲烷浓度2%)更有利于提高LED的散热效果。本研究表明微波等离子体CVD制备的金刚石薄膜是大功率LED的理想散热衬底材料。
Due to the highest thermal conductivity diamond film is an ideal heat spreader material for at room temperature, chemical vapor deposition （CVD） high power light emitting diode （LED）. In this paper, microwave plasma enhanced CVD diamond films were deposited and characterized with SEM and Raman spectrum. Effect of heat-spreading was tested on LED. The results showed that diamond thin film in thickness of 20 -30μm, used as the heat spreader, can decrease the working temperature of LED; at the same deposition cost, when increasing the thickness of diamond thin film （using 4% CH4 ）, the heat-spreading effect was better than that when improving the quality of diamond thin film（ using 2% CH4 ）. All the works show that the diamond thin film deposited by microwave plasma CVD method is an ideal heat-spreader for high power LED.
出处
《金刚石与磨料磨具工程》
CAS
北大核心
2008年第2期1-4,共4页
Diamond & Abrasives Engineering
基金
国家自然科学基金资助项目(50572075)
湖北省教育厅2004年创新团队项目
作者简介
满卫东，男，1970年生，博士，副教授。Email：plasma@mail．wit．edu．cn
