摘要
                
                    综述了涂层超导体缓冲层的作用、可利用的材料及制备方法。着重介绍了几种制备缓冲层的真空及非真空方法,即磁控溅射法、脉冲激光沉积(PLD)、溶胶-凝胶法(sol-gel)、电沉积等。展望了对下一步涂层超导体缓冲层的制备。
                
                The functions, usable materials and deposition of buffer layers for coated superconductors were reviewed. From the viewpoint of vacuum and non-vacuum deposition of buffer layers, several primary methods were emphasized, such as magnetic sputtering, PLD, sol-gel and electrodeposition. The prospect for preparing the buffer layers for coated superconductors was put forward.
    
    
    
    
                出处
                
                    《表面技术》
                        
                                EI
                                CAS
                                CSCD
                        
                    
                        2007年第5期81-83,共3页
                    
                
                    Surface Technology
     
    
                关键词
                    涂层超导体
                    缓冲层
                    真空沉积
                    非真空沉积
                
                        Coated superconductor
                         Buffer layer 
                         Vacuum deposition 
                         Non-vacuum deposition
                
     
    
    
                作者简介
邹金桥(1978-),男,湖北孝感人,讲师,硕士,从事超导材料的研究工作。