摘要
研究了一种基于光电耦合器件(CCD)及图像处理技术的聚甲基丙烯酸甲酯(PMMA)微流控芯片微通道几何尺寸的测量系统,论述了该系统的关键技术及其实现方法,包括图像的预处理、二值化、轮廓提取以及微通道尺寸的测量等。利用该系统测量的微通道几何尺寸(1-1 000μm)与轮廓仪和万能工具显微镜的测量结果吻合很好,最大测量误差为2μm(半深宽度),分析了测量误差产生的原因。检测实验结果表明:该检测方法提供的微通道几何尺寸评定正确可行、通用性好、应用简便,还可以避免轮廓仪在深结构测量中的误差。
Based on CCD-image and image processing technology, a measuring system for microchannel＇s sizes was developed. The non-contact measuring method for geometrical sizes was presented by means of the digital image manipulation technology, including image preprocessing, image binary-conversion, boundary encoding and calculation of microchannel＇s geometrical sizes, etc. The measured results show that the maximum measuring error by proposed method is 2 μm,which accords with the results measured by a stylus profiler and a universal measuring microscope. The reasons to cause the error were analyzed, results indicate errors often made by stylus in that this method is correct, feasible, simple to use, and can avoid the deeper structures.
出处
《光学精密工程》
EI
CAS
CSCD
北大核心
2007年第2期212-218,共7页
Optics and Precision Engineering
基金
国家自然科学基金资助项目(No.10572053)
高等学校博士学科点专项基金(No.20040183057)
吉林省科技发展计划资助项目(No.20020610)
关键词
微流控芯片
微细加工
CCD图像检测
尺寸测量
图像处理
二次标定
microfluidic chip
microfabrication
CCD image detection
size measurement
image processing
secondary calibration
作者简介
文伟力（1975-），男，河北唐山人，博士研究生，主要研究方向为MEMS系统设计、制作、仿真及图像处理、模式识别等。E—mail：whpmr@163．com
