摘要
通过采用磁控溅射工艺,将两种铁基和镍基材质的靶材溅射到基材(1Cr18Ni9Ti)上,形成4种薄膜。对靶材、基材和薄膜等分别在不同浓度硫酸中的耐腐蚀性进行了测量,并对薄膜在0.05mol/L硫酸中的耐点蚀性进行了研究。通过对Tafel曲线、循环极化曲线及显微组织的分析,结果表明:溅射后薄膜组织为微晶,薄膜的耐蚀性普遍比溅射材前靶的耐蚀性要好;薄膜耐点蚀性很好。
By using magnetic sputtering disposition four films were made by sputtering two iron target materials and two nickel target materials on a base material (1Cr18Ni9Ti). Corrosion resistances of these films, target materials and base material mentioned above were studied in various H2SO4 concentration solutions and the pitting resistance of the film were also investigated in 0.05mol/L H2SO4 solution. It has been found from the Tafel Plots, the cyclic polarization measurements and the microscopic internal analysis that sputtered films are microcrystal organization and have better corrosion resistances including pitting resistance than the target material without sputtering.
出处
《北京科技大学学报》
EI
CAS
CSCD
北大核心
1990年第1期19-24,共6页
Journal of University of Science and Technology Beijing
关键词
磁控溅射
薄膜
耐蚀性
循环极化
magnetic sputter, sputtered film, corrosion resistance, cyclic polarization.
