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CR传输线解析EIS确定Bi/Bi_2O_3体系平带电位

Interpretation of EIS by CR transmission line model to ascertain the flat-band potential in Bi/Bi_2O_3 system
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摘要 电化学阻抗谱是表征金属/氧化物体系的强大工具,应用关键是正确解析.许多金属氧化物有半导体特征,平带电位是关键参数,以文献Bi/Bi2O3体系EIS实例说明根据CR传输线离散参数Ci随特征频率fi的分布,能从共存的多个表面态电容CSS中鉴别出空间电荷层电容CSC,直接根据Mott-Schottky关系得到较准确的平带电位,最后讨论了方法的合理性. The electrochemical impedance spectroscopy (EIS) is one of the most important techniques to study metal oxide system, but the correct analysis is crucial for its application. In this paper, the EIS data of Bi/Bi2O3 taken from the literature was re-interpreted by CR Transmission Line Model (CRM). Using the peak in plot of discrete elements Ci vs. characteristic frequencys fi, the space charge layer capacitance CSC could be distinguished from surface state capacitances CSS, and the flat-band potential in Bi/B...
作者 孙秋霞 陆英
出处 《韶关学院学报》 2010年第6期58-61,共4页 Journal of Shaoguan University
基金 韶关学院校级科研项目(2007-01) 韶关市科技局科研资助项目(2007教-02)
关键词 电化学阻抗谱 CR传输线模型 半导体 平带电位 EIS CR transmission line model semiconductor flat-band potentials
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