摘要
在纳米SiO2表面接枝聚缩醛可在粒子表面建立起空间位阻稳定层,提高纳米粒子的分散稳定性,增强纳米粒子与树脂基体的相容性。X射线光电子能谱(XPS)的分析结果表明,经过聚缩醛接枝改性的纳米SiO2的Si2p峰明显降低,结合能减小0.7eV,对C1s峰精细扫描及分峰拟合表明表面碳元素中有66.34%属于接枝物聚缩醛的有机碳,证明纳米SiO2表面形成了良好的修饰层,修饰层以化学键结合于纳米SiO2表面,同时根据XPS和热失重(TG)分析的数据结果,可以推测聚缩醛主要分布在纳米SiO2的表面,而在体相中独立存在的几率较小。
A steric hindrance layer was established when the surfaces of nano-SiO_2 were grafted with polyacetals. The steric hindrance layer increased the dispersibility of the nano-particles as well as the compatibility between the particles and the resin matrix. Examination of X-ray photoelectron spectroscopy (XPS) demonstrated that the peak of Si_ 2p on polyacetal grafted SiO_2 surfaces decreased and the binding energy decreased by 0.7eV. Results of the fine scanning and deconvolution into multiple sub-peaks of C1s indicated that 66.34% of the carbon on the surfaces of nano-SiO_2 was attributed to the grafting polyacetal. This shows that an effective modification layer was formed on SiO_2 surfaces. The grafting polyacetals were chemically bound with nano-SiO_2. Based on XPS and thermogravimetry(TG) analysis, it is conjectured that the grafting polyacetal is mainly distributed the on nano-SiO_2 surfaces.
出处
《南京理工大学学报》
EI
CAS
CSCD
北大核心
2005年第3期330-333,共4页
Journal of Nanjing University of Science and Technology
基金
南京理工大学校科研发展基金(XKF05010)
关键词
纳米粒子
二氧化硅
表面修饰
X射线光电子能谱
nano-particles
SiO_2
surface modification
X-ray photoelectron spectroscopy
