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H_∞ SYNCHRONIZATION CONTROL OF LINEAR SYSTEMS AND ITS APPLICATION TO WAFER-RETICAL STAGE 被引量:5

H_∞ SYNCHRONIZATION CONTROL OF LINEAR SYSTEMS AND ITS APPLICATION TO WAFER-RETICAL STAGE
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摘要 For the outputs of two nth-order linear control systems to work insynchronization and meanwhile to track their commands, a H_(infinity) synchronization control schemeis presented. In terms of two uncoupled single variable linear systems, a multivariable coupledsystem is established by choosing one output and the difference of the two outputs as a new outputvector, so that both command tracking and synchronization properties can be demonstrated by aH_(infinity) performance index. To improve the synchronization and trailing performance and toguarantee the system robust stability, the mixed sensitivity H_(infinity), design methodology isadopted. The presented synchronization scheme is then extended to the case where one of the twosystems include two input variables, and then applied to the position synchronization control of awafer-retical stage. The wafer-reticle stage consists of a wafer stage, a reticle coarse stage, anda reticle fine stage. The reticle coarse stage picks up the reticle fine stage. The three stagesought to tack their commands, but synchronization between the wafer stage and the reticle fine stagemust be stressed in the tracking process. In the application, by appropriately determining theweighting matrices for the sensitivity function and the complementary sensitivity function, asatisfactory KL synchronization controller is obtained to realize highly accurate positionsynchronization, and to guarantee tracking performance. The above results are verified by simulationexperiments. For the outputs of two nth-order linear control systems to work insynchronization and meanwhile to track their commands, a H_(infinity) synchronization control schemeis presented. In terms of two uncoupled single variable linear systems, a multivariable coupledsystem is established by choosing one output and the difference of the two outputs as a new outputvector, so that both command tracking and synchronization properties can be demonstrated by aH_(infinity) performance index. To improve the synchronization and trailing performance and toguarantee the system robust stability, the mixed sensitivity H_(infinity), design methodology isadopted. The presented synchronization scheme is then extended to the case where one of the twosystems include two input variables, and then applied to the position synchronization control of awafer-retical stage. The wafer-reticle stage consists of a wafer stage, a reticle coarse stage, anda reticle fine stage. The reticle coarse stage picks up the reticle fine stage. The three stagesought to tack their commands, but synchronization between the wafer stage and the reticle fine stagemust be stressed in the tracking process. In the application, by appropriately determining theweighting matrices for the sensitivity function and the complementary sensitivity function, asatisfactory KL synchronization controller is obtained to realize highly accurate positionsynchronization, and to guarantee tracking performance. The above results are verified by simulationexperiments.
作者 ZhouDi
出处 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 2005年第2期174-178,共5页 中国机械工程学报(英文版)
基金 This project is supported by Japan Society for the Promotion of Sci-ence(No.P01208)National Natural Science Foundation of China (No.60104003).
关键词 H_(infinity) control Mixed sensitivity Synchronization control Wafer-reticle stage H_(infinity) control Mixed sensitivity Synchronization control Wafer-reticle stage
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