摘要
在用线性系统和随机过程理论分析光刻机误差传递特性的基础上，采用时间序列分析法建立误差的数学模型，提出了综合误差修正的新方法，介绍了微机综合误差实时修正系统的电路结构与工作原理。其主要特点是，不仅能修正系统误差，而且能够根据对随机误差的预报来修正相关的动态误差。实验结果表明，系统修正精度达到±０．１μｍ。
In this paper,by using the theories of linear system and stochastic process,the transfer characteristics of the errors of a photoengraving machine are analyzed. On the basis of the an alysis,the mathematical model of the errors is derived by use of the method of time series analysis. Then,a new approach Called compositon Error Correction(CEC)is presented. The circuit structure and the working principle of the CEC system adopting microcom puter are described.Its major feature is that the method Can not only correct for systematic errors,but also can correct correlated dynamic errors according to forecasting vaiues of radom errors.The results of the exepriment show that the correction accuracy of th CEC system resches submicron grade(±0.1μm).
出处
《重庆大学学报（自然科学版）》
CAS
CSCD
1994年第3期7-12,共6页
Journal of Chongqing University
基金
国家自然科学基金
关键词
光栅
刻划
综合误差
修正
grating
engrave
composition error
correction
