摘要
分析了等离子体活化烧结过程的机理,探讨了等离子体活化烧结相对于其他烧结技术所具有的独特优势,重点评述了等离子体活化烧结在电子晶体声子玻璃结构,Bi2Te3基、梯度结构等热电材料制备中的应用。
The mechanism of Plasma Activated Sintering is analyzed in this paper. The unique superiority of Plasma Activated Sintering over other sintering technologies is discussed. The great emphasis is placed on the review toward the application of Plasma Activated Sintering in preparation of thermoelectric materials such as phone glass/electron crystal structure, Bi_2Te_3 based, functionally graded structure and so on.
出处
《新技术新工艺》
2005年第6期58-60,共3页
New Technology & New Process
基金
973国家重点基础研究发展项目(2004CCA03200)
国家自然科学基金(50401008)
