期刊文献+

光学薄膜膜厚监控方法及其进展 被引量:17

The progress of optical thin film thickness monitoring
在线阅读 下载PDF
导出
摘要 针对目前膜厚监控技术的广泛使用和其方法的日益多样性 ,力图对光学薄膜膜厚监控方法作一个全面、细致的描述。包括膜厚监控方法的分类、进展和展望 。 Based on recent and extensive application of thin film thickness monitoring,we try to summary the basic techniques and their progress of different monitoring methods.Special emphasis are given on some optical monitoring methods like rapidly developing spectroscopic ellipsometry.
出处 《激光杂志》 CAS CSCD 北大核心 2004年第4期10-12,共3页 Laser Journal
关键词 光学薄膜 膜厚监控 optical thin film thickness monitoring
  • 相关文献

参考文献11

  • 1朱震.光学薄膜厚度监控技术[J].激光与红外,1987,17(1):32-36.
  • 2周鹏飞,陈桂莲,张荣福.宽光谱膜厚监控仪的研制[J].光学仪器,2001,23(5):36-40. 被引量:5
  • 3张晓晖,陈清明,朱伟民,汤炜,杨光.一种提高极值法监控精度的方法[J].激光技术,2001,25(5):386-390. 被引量:8
  • 4刘晓元,黄云,周宁平,龙兴武.光学镀膜宽带膜厚监控系统[J].国防科技大学学报,2001,23(1):23-27. 被引量:21
  • 5[8]Wu.Peiyun,Gu Peifu.Wideband monitoring of optical coatings with deposition error correction[J].Proceedings of SPIE-The International Society for Optical Engineering,1993,2000:121-132.
  • 6[9]Yoshioka,Y.Ikuta,T.Monitoring of Si molecular-beam epitaxial growth by an ellipsometric method [J].Japanese Journal of Applied Physics,2001,40(1):371-375.
  • 7[10]Wanger.T.Johs.B.[J].Materials Science and Engineering.1997,44(1-3):134-138.
  • 8[11]K.Vedam.Spectroscopic ellipsometry:a historical overview[J].Thin Solid Film,1998,313-314.
  • 9[12]G.Kremer and L.A.Moraga.High-precision low-cost quartz crystal thin-film monitor with temperature control[J].American Institute of Physics;1985,56(7):1467-1468.
  • 10[13]Hirofumi Kawashima and kenji Sunaga.A Sensor for Thin Film thickness monitor using torsional quartz crystal resonators of stepped [J].Free-Free Bar-Type,IEEE international,frequency,IEEE INTERNATIONAL FREQUENCY CONTROL SYMPOSIVM.,1998,430-440.

二级参考文献4

共引文献28

同被引文献98

引证文献17

二级引证文献52

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部