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CVD法制备高纯钛过程中杂质铁的行为研究

Study on the Behavior of Fe Impurity during Preparation of High Purity Titanium by CVD
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摘要 研究了CVD法制备高纯钛过程中杂质铁的行为;通过对卤化亚铁的相关热力学计算,分析了卤化亚铁的合成与分解条件。研究结果表明,最佳卤化温度为800~1 000K,最佳裂解沉积温度为1 400~1 650K,在此温度范围内,不仅可高效生产高纯钛,还可有效抑制杂质铁带来的二次污染。 The behavior of Fe impurity was studied during preparation of high purity titanium by CVD.The conditions of synthesis and decomposition of ferrous halide were analyzed based on thermodynamic calculation.The results show that the optimal halogenation temperature is 800~1 000 K,and the best pyrolysis deposition temperature is 1 400~1 650 K.In the above temperature range,not only can high purity titanium be effectively produced,but also the secondary pollution caused by Fe impurity can be effectively inhibited.
出处 《稀有金属与硬质合金》 CAS CSCD 北大核心 2015年第3期29-32,共4页 Rare Metals and Cemented Carbides
关键词 高纯钛 杂质铁 CVD法 低温卤化 高温沉积 热力学 high purity titanium Fe impurity CVD low temperature halogenation high temperature deposition thermodynamics
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