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阴极电弧离子镀沉积过程的计算机模拟研究 被引量:1

Deposition Process in Cathodic Arc Ion Plating Through Computer Simulation
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摘要 在近似计算的基础上,对圆柱形真空镀膜室内偏压电场分布进行模拟,描绘了阴极电弧源粒子的蒸发和运动形态,设计了对称的粒子接收屏,讨论了不同带电粒子的相对接收比例,揭示了成分离析效应的影响因素· Based on a rational approximation, the bias-voltage electric field in cylinder-like vacuum chamber is simulated and the evaporation of metal atoms and the movement characteristics of electrical particles during plating are depicted. Some various symmetrical cylinder-like lateral surfaces for receiving the particle coming from cathodic target have been designed. The changes of compositions of alloy (different particles) at the receiving surface with different target of various compositions under some deposition processes are discussed. The factors that influence the composition segregation effect are revealed.
出处 《沈阳大学学报》 CAS 2004年第6期32-35,共4页
关键词 阴极电弧离子镀 离子沉积 计算机模拟 cathodic arc ion plating ion deposition computer simulation
作者简介 张钧(1966-),男,辽宁锦州人,沈阳大学教授,博士.
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参考文献4

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共引文献24

同被引文献18

  • 1葛毅成,易茂中.载荷、时间、速度对C/C复合材料摩擦磨损行为的影响[J].中国有色金属学报,2006,16(2):241-246. 被引量:17
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  • 8Tong C J, Chen M R, Yeh J W, et al. Mechanical Performance of the AI:CoCrCuFeNi High-Entropy Alloy System with Multiprincipal Elements[JT. Metallurgical and Materials Transactions A, 2005,36(5): 1263 - 1271.
  • 9Wen L H, Kou H C, Li J S, et al. Effect of Aging Temperature on Microstructure and Properties of AICoCrCuFeNi High Entropy Alloy[-JT. Intermetallics, 2009,17(4) :266 - 269.
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