摘要
Mo silicides Mo_5Si_3 with high quality were prepared using ion beamdeposition equipment with two Filter Metal Vacuum Are Deposition (FMEVAD). When the number ofalternant deposition times was 198, total thickness of the coating is 40nm. The coatings withdroplet free can be readily obtained, so the surface is smooth. TEM observation shows that Mo and Sialternant deposition coating is compact structure. The fine Mo silicide grains densely distributedin the coating. The coating adherence on silicon is excellent.
Mo silicides Mo_5Si_3 with high quality were prepared using ion beamdeposition equipment with two Filter Metal Vacuum Are Deposition (FMEVAD). When the number ofalternant deposition times was 198, total thickness of the coating is 40nm. The coatings withdroplet free can be readily obtained, so the surface is smooth. TEM observation shows that Mo and Sialternant deposition coating is compact structure. The fine Mo silicide grains densely distributedin the coating. The coating adherence on silicon is excellent.
作者
T.H. Zhang, Z.Z. Yi, X. Y. Wu, S.J. Zhang, Y. G. Wu, X. Zhang, H.X. Zhang, A.D. Liu and X.J. Zhang Key Laboratory for Radiation Beam Technology and Material Modification, Institute of Low Energy Nuclear Physics, Beijing Normal University, Beijing Radiatio
基金
This work was supported by 863 High Science & Technology Committee(2001AA38020)
The National Natural Science Foundation of
