期刊文献+

纳米金刚石薄膜的制备及场发射研究进展 被引量:3

Progress of Nanocrystalline Diamond Films Fabrication and Field Emission Research
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摘要 纳米金刚石薄膜因具有纳米材料和金刚石的双重性质且易于制备,作为场发射材料在平板显示领域拥有潜在的应用价值,而引起人们的极大兴趣。本文对近年来国内外有关纳米金刚石薄膜的制备、场发射的研究现状进行了综述。
出处 《光盘技术》 2008年第4期50-51,共2页 CD TECHNOLOGY
关键词 纳米金刚石薄膜 平板显示器件 场发射 电子亲和势 nanocrystalline diamond films flat panel display field emission electron affinity
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参考文献3

  • 1[1]J.Robertson.Amorphous carbon cathodes for field emission display.Thin Solid Films,1997,296.
  • 2[2]A.A.Talin,et al.Electron field emission from a-tC and a-tC:N.J.Vac.Sci.Technol.1996,A14(3).
  • 3[3]Chen Guanghua,Cai Rangqi,Song Xuemei,et al.Preparation and Field Electron Emission of Diamond Films on Porous Silicon Substrates with MW -CVD Technique.Chinese Journal of Semiconductors,2004,25(3).

同被引文献50

  • 1刘素田,唐伟忠,耿春雷,吕反修.纳米金刚石薄膜的制备和应用[J].金刚石与磨料磨具工程,2006,26(1):75-79. 被引量:15
  • 2梁兴勃,杨德仁,阙端麟,等.硅基纳米金刚石膜生长及其发光器件[D].杭州:浙江大学,2008.
  • 3Chen C Y, Tzeng Y, Jen C A, et al. Inkjet printing of nano-dia-mond suspensions in sthylene glycol for CVD growth of pat-terned diamond structures and practical applications[J]. Dia-mond and Related Materials, 2009,18(2-3):146-150.
  • 4Nistor L C, Van Landuyt J, Ralchenko V G,et al. Nanocrys-talline diamond films: transmission electron microscopy andRaman spectroscopy characterization[J]. Diamond and Relat-ed Materials, 1997, 6(1): 159-168.
  • 5Jiang N,Sugimoto K,Eguchi K,et al. Reducing the grain sizefor fabrication of nanocrystalline diamond films[J]. Journal ofcrystal growth, 2001,222(3): 591-594.
  • 6Mitura S, Mitura A, Niedzielski P, et al. Nanocrystalline dia-mond coatings[J]. Chaos, Solitons & Fractals, 1999,10(12):2165-2176.
  • 7Xin H W,Zhang Z M,Ling X,et al. Composite diamond filmswith smooth surface and the structural influence on dielectricproperties[J]. Diamond and related Materials, 2002,11 (2):228-233.
  • 8Gruen D M. Nanocrystalline Diamond Films 1[J]. Annual Re-view of Materials Science, 1999,29(1):211-259.
  • 9Yang T S,Lai J Y, Cheng C L,et al. Growth of faceted,bal-las-like and nanocrystalline diamond films deposited in CH 4/H 2/Ar MPCVD[J]. Diamond and Related Materials,2001,10(12):2161-2166.
  • 10Chow L,Zhou D,Hussain A, et al. Chemical vapor depositionof novel carbon materials[J]. Thin Solid Films, 2000,368(2):193-197.

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