摘要
微电子工业在日益庞大而复杂的数据处理与存储市场需求的驱动下,半导体线宽已缩小至7 nm。若不能建立起有效空气化学污染控制标准和对其彻底控制,纳米级的光刻工艺是无法进行的。介绍空气化学污染的控制设施平台的建设,并进行了实验验证,该平台是中国首例达到国际标准(ISO1级,ISO14644-1)超净空气环境设施,在该设施中可开展空气洁净度和空气污染控制等课题研究,对实际项目的设计、运行具有重要参考价值。
Driven by the market demand of increasingly larger and more complex data handling power and storage in the microelectronics industry,the linewidth has been down to 7 nm.Without effective AMC control standard and a complete AMC control program,it is no longer possible to manufacture the linewidth in nano size in the lithography.This article introduces the construction of AMC control system and in this system carries out experimental verification.This is the first ultra clean environment meeting the ISO 14644-1 standard in China.The researching on air cleanliness,AMC control,etc.could be carried out in this system,which has import reference value for the design and operation of practical projects.
出处
《洁净与空调技术》
2020年第2期61-67,共7页
Contamination Control & Air-Conditioning Technology
作者简介
吴小泉,男,1979年4月生,大学本科,工程师,210046南京经济技术开发区恒业路6号,15366096116,E-mail:xiaoquan@ticachina.com
