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C2H2流量对阴极弧沉积AlTiCN涂层结构和性能的影响

Effect of C2H2 Flow Rate on Structure and Properties of AlTiCN Films Prepared by Cathodic Arc Deposition
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摘要 采用阴极弧技术制备了AlTiCN纳米复合薄膜,利用场发射电镜、X射线光电子能谱仪、纳米压痕仪、球盘式摩擦磨损实验机和电化学工作站研究了C2H2流量对AlTiCN薄膜微结构、硬度、摩擦特性及耐腐蚀性能的影响。结果表明:AlTi(C,N)薄膜在C2H2流量为30 SCCM时表现为粗大的柱状结构,随C2H2流量增大至60 SCCM,薄膜由柱状转为均匀的细晶结构。AlTi(C,N)薄膜在C2H2流量为60 SCCM时硬度达到最大值22.31 GPa,较高的硬度主要源于基体有足够多数量的AlTiCN晶粒的支撑。薄膜摩擦系数随C2H2流量的增加而减小。所沉积的样品在3.5wt%NaCl溶液中均展现出较好的耐腐蚀性。 The effects of C2H2 flow rate on the structure,hardness,friction characteristics and corrosion resistances of Al Ti CN films prepared by cathodic arc process were investigated by field emission scanning electron microscope,X-ray photoelectron spectroscopy,micro-indentation teater and ball-on disk tester.The results show that Al Ti(C,N)film exhibits a thick columnar structure at C2H2 flow rate of 30 SCCM.With C2H2 flow rate increasing to 60 SCCM,the film transforms from columnar to fine grain structure.The hardness of Al Ti(C,N)film can reach 22.31 GPa when the flow rate of C2H2 is 60 SCCM.The higher hardness is mainy due to the support of sufficient amounts of Al Ti CN grains in matrix.The friction coefficient of the film decreases with the increase of C2H2 flow rate.The deposited samples show better corrosion resistance in3.5 wt%NaCl solution.
作者 魏朝晖 马立安 洪丽华 张奇龙 WEI Zhaohui;MA Li'an;HONG Lihua;ZHANG Qilong((1.School of Materials Science and Engineering,Fujian University of Technology,Fuzhou 350108,China;Department of Materials Science and Engineering,Mingchi University of Technology,Taiwan 24301,China)
出处 《热加工工艺》 北大核心 2020年第2期97-100,共4页 Hot Working Technology
基金 福建省科技厅引导项目(2016H0003) 福州市科技局项目(2014-G-81) 福建工程学院基金项目(GY-Z15099).
关键词 纳米复合薄膜 阴极弧沉积 摩擦系数 腐蚀 nanocomposite film cathodic arc deposition friction coefficient corrosion
作者简介 魏朝晖(1975-),女,山东潍坊人,工程师,主要从事模具及薄膜技术方面的研究,E-mail:huiwei788@163.com
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