摘要
通过对TFT-LCD行业用显影液浓度(质量分数)C1和其中酸根离子浓度(质量分数)C2与半色调光刻胶膜厚(Half Tone Thickness,THK)的影响研究,提出了改善THK波动的方法。首先,固定光刻工艺生产条件,采用单因素实验法分别对C1和C2对THK的影响进行试验,研究表明,C1、C2的变化都会影响显影液的显影能力,导致THK的变化,且都呈线性负相关。其次,根据C1和C2变化对THK的影响程度,将二者之间建立公式对应关系,通过系统对C1进行调整,改善C2波动的影响。最终将关系公式导入系统,稳定了显影能力,有效改善了THK的波动,沟道相关不良发生率从0.20%以上降低到0.03%以下。
The influence of concentration(mass fraction,C1)and concentration of acid radical ion(mass fraction,C2)of TFT-LCD developer on Halftone THK is researched,and the way to improve THK fluctuations is put forward.Firstly,the production conditions of lithography process are fixed,then the influence of THK with C1 and C2 is respectively tested using the single factor experimental method.Studies show that the changes of C1 and C2 will affect the developer’s development ability and lead to the changes of THK.THK with C1 and C2 are both linear negative correlation.Secondly,according to the influence degree of C1 and C2 changes on THK,the formula corresponding relations between the two is established.The C1 is adjusted through the system and then the C2 fluctuations are improved.Lastly,the development ability and the THK fluctuations are stable through putting the formula into the system which make channel related incidence reduced to below 0.03%from more than 0.20%.
作者
陈国
韩亚军
于洪禄
丁振勇
王鹏
郑铁元
李伟
CHEN Guo;HAN Ya-jun;YU Hong-lu;DING Zhen-yong;WANG Peng;CHUL Won;LI Wei(Beijing BOE Display Technology Co.,Ltd,Beijing 100176,China)
出处
《液晶与显示》
CAS
CSCD
北大核心
2019年第12期1161-1165,共5页
Chinese Journal of Liquid Crystals and Displays
关键词
显影液
浓度
酸根离子
半色调膜厚
波动
developer
doncentration
acid radical ion
halftone thickness
fluctuation
作者简介
通信联系人:陈国,E-mail:chenguo@boe.com.cn,(1985-),男,山东济南人,硕士,高级工程师,2010年于中国矿业大学(北京)获得硕士学位,主要从事液晶显示面板阵列工艺及不良分析改善。
