Silicon(Si)diffraction microlens arrays are usually used to integrating with infrared focal plane arrays(IRFPAs)to improve their performance.The errors of lithography are unavoidable in the process of the Si diffrac-t...Silicon(Si)diffraction microlens arrays are usually used to integrating with infrared focal plane arrays(IRFPAs)to improve their performance.The errors of lithography are unavoidable in the process of the Si diffrac-tion microlens arrays preparation in the conventional engraving method.It has a serious impact on its performance and subsequent applications.In response to the problem of errors of Si diffraction microlens arrays in the conven-tional method,a novel self-alignment method for high precision Si diffraction microlens arrays preparation is pro-posed.The accuracy of the Si diffractive microlens arrays preparation is determined by the accuracy of the first li-thography mask in the novel self-alignment method.In the subsequent etching,the etched area will be protected by the mask layer and the sacrifice layer or the protective layer.The unprotection area is carved to effectively block the non-etching areas,accurately etch the etching area required,and solve the problem of errors.The high precision Si diffraction microlens arrays are obtained by the novel self-alignment method and the diffraction effi-ciency could reach 92.6%.After integrating with IRFPAs,the average blackbody responsity increased by 8.3%,and the average blackbody detectivity increased by 10.3%.It indicates that the Si diffraction microlens arrays can improve the filling factor and reduce crosstalk of IRFPAs through convergence,thereby improving the perfor-mance of the IRFPAs.The results are of great reference significance for improving their performance through opti-mizing the preparation level of micro nano devices.展开更多
Organic semiconductor materials have shown unique advantages in the development of optoelectronic devices due to their ease of preparation,low cost,lightweight,and flexibility.In this work,we explored the application ...Organic semiconductor materials have shown unique advantages in the development of optoelectronic devices due to their ease of preparation,low cost,lightweight,and flexibility.In this work,we explored the application of the organic semiconductor Y6-1O single crystal in photodetection devices.Firstly,Y6-1O single crystal material was prepared on a silicon substrate using solution droplet casting method.The optical properties of Y6-1O material were characterized by polarized optical microscopy,fluorescence spectroscopy,etc.,confirming its highly single crystalline performance and emission properties in the near-infrared region.Phototransistors based on Y6-1O materials with different thicknesses were then fabricated and tested.It was found that the devices exhibited good visible to near-infrared photoresponse,with the maximum photoresponse in the near-infrared region at 785 nm.The photocurrent on/off ratio reaches 10^(2),and photoresponsivity reaches 16 mA/W.It was also found that the spectral response of the device could be regulated by gate voltage as well as the material thickness,providing important conditions for optimizing the performance of near-infrared photodetectors.This study not only demonstrates the excellent performance of organic phototransistors based on Y6-1O single crystal material in near-infrared detection but also provides new ideas and directions for the future development of infrared detectors.展开更多
To further extend knowledge about the detailed knowledge on the crossflow characteristics in a multi-jets system under a confined space,particle image velocimetry (PIV) was employed to investigate the flow structures ...To further extend knowledge about the detailed knowledge on the crossflow characteristics in a multi-jets system under a confined space,particle image velocimetry (PIV) was employed to investigate the flow structures together with the distributions of the mean velocity components for Reynolds numbers (Re) ranging from 6 213 to 13 418,nozzle-to-plate spacing (H/D) varying from 0. 20 to1. 25,respectively. Results show that the crossflow configuration is significantly different from those of large nozzle-to-plate spacing. In addition,a turning point H/D=0.50 is revealed in the profile of the normalized maximum radial velocity which is associated with the heat transfer distribution on the impingement plate.展开更多
Numerical studies on transient heat transfer characteristics of air-array-jet impingement with a small jet-to-plate distance and a large temperature difference between nozzles and plate were presented.The dimensionles...Numerical studies on transient heat transfer characteristics of air-array-jet impingement with a small jet-to-plate distance and a large temperature difference between nozzles and plate were presented.The dimensionless jet-to-plate distance(H/D)was 0.2,and non-dimensional nozzle-to-nozzle spacing(S/D)was 3,4,5 and 6,respectively.It is found that the quenching time is shortened at a constant total mass flow at air jet inlet m·(m·=218.21 kg/h),and the heat transfer uniformity is deterio-rated as S/D increases.However,the adding reversed-flow nozzles can shorten the quenching time of the glass plate considerably with a modest change in the heat transfer uniformity.The results at variable m·are the same as those at a fixed m·.Furthermore,the parity and arrangement of nozzles are also discussed,It is found that an odd number of nozzles is more beneficial for transient heat transfer.Based on these results,an appropriate proposal for ultra-thin glass tempering process is presented.展开更多
基金Supported by the National Natural Science Foundation of China(NSFC 62105100)the National Key research and development program in the 14th five year plan(2021YFA1200700)。
文摘Silicon(Si)diffraction microlens arrays are usually used to integrating with infrared focal plane arrays(IRFPAs)to improve their performance.The errors of lithography are unavoidable in the process of the Si diffrac-tion microlens arrays preparation in the conventional engraving method.It has a serious impact on its performance and subsequent applications.In response to the problem of errors of Si diffraction microlens arrays in the conven-tional method,a novel self-alignment method for high precision Si diffraction microlens arrays preparation is pro-posed.The accuracy of the Si diffractive microlens arrays preparation is determined by the accuracy of the first li-thography mask in the novel self-alignment method.In the subsequent etching,the etched area will be protected by the mask layer and the sacrifice layer or the protective layer.The unprotection area is carved to effectively block the non-etching areas,accurately etch the etching area required,and solve the problem of errors.The high precision Si diffraction microlens arrays are obtained by the novel self-alignment method and the diffraction effi-ciency could reach 92.6%.After integrating with IRFPAs,the average blackbody responsity increased by 8.3%,and the average blackbody detectivity increased by 10.3%.It indicates that the Si diffraction microlens arrays can improve the filling factor and reduce crosstalk of IRFPAs through convergence,thereby improving the perfor-mance of the IRFPAs.The results are of great reference significance for improving their performance through opti-mizing the preparation level of micro nano devices.
基金Supported by the National Key Research and Development Program of China(2021YFB2012601)National Natural Science Foundation of China(12204109)+1 种基金Science and Technology Innovation Plan of Shanghai Science and Technology Commission(21JC1400200)Higher Education Indus⁃try Support Program of Gansu Province(2022CYZC-06)。
文摘Organic semiconductor materials have shown unique advantages in the development of optoelectronic devices due to their ease of preparation,low cost,lightweight,and flexibility.In this work,we explored the application of the organic semiconductor Y6-1O single crystal in photodetection devices.Firstly,Y6-1O single crystal material was prepared on a silicon substrate using solution droplet casting method.The optical properties of Y6-1O material were characterized by polarized optical microscopy,fluorescence spectroscopy,etc.,confirming its highly single crystalline performance and emission properties in the near-infrared region.Phototransistors based on Y6-1O materials with different thicknesses were then fabricated and tested.It was found that the devices exhibited good visible to near-infrared photoresponse,with the maximum photoresponse in the near-infrared region at 785 nm.The photocurrent on/off ratio reaches 10^(2),and photoresponsivity reaches 16 mA/W.It was also found that the spectral response of the device could be regulated by gate voltage as well as the material thickness,providing important conditions for optimizing the performance of near-infrared photodetectors.This study not only demonstrates the excellent performance of organic phototransistors based on Y6-1O single crystal material in near-infrared detection but also provides new ideas and directions for the future development of infrared detectors.
基金National Natural Science Foundation of China(51335002)
文摘To further extend knowledge about the detailed knowledge on the crossflow characteristics in a multi-jets system under a confined space,particle image velocimetry (PIV) was employed to investigate the flow structures together with the distributions of the mean velocity components for Reynolds numbers (Re) ranging from 6 213 to 13 418,nozzle-to-plate spacing (H/D) varying from 0. 20 to1. 25,respectively. Results show that the crossflow configuration is significantly different from those of large nozzle-to-plate spacing. In addition,a turning point H/D=0.50 is revealed in the profile of the normalized maximum radial velocity which is associated with the heat transfer distribution on the impingement plate.
基金Natural Science Foundation of China(51335002,51905049)。
文摘Numerical studies on transient heat transfer characteristics of air-array-jet impingement with a small jet-to-plate distance and a large temperature difference between nozzles and plate were presented.The dimensionless jet-to-plate distance(H/D)was 0.2,and non-dimensional nozzle-to-nozzle spacing(S/D)was 3,4,5 and 6,respectively.It is found that the quenching time is shortened at a constant total mass flow at air jet inlet m·(m·=218.21 kg/h),and the heat transfer uniformity is deterio-rated as S/D increases.However,the adding reversed-flow nozzles can shorten the quenching time of the glass plate considerably with a modest change in the heat transfer uniformity.The results at variable m·are the same as those at a fixed m·.Furthermore,the parity and arrangement of nozzles are also discussed,It is found that an odd number of nozzles is more beneficial for transient heat transfer.Based on these results,an appropriate proposal for ultra-thin glass tempering process is presented.
