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Characteristics of selective oxidation during the fabrication of vertical cavity surface emitting laser
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作者 郝永芹 钟景昌 +2 位作者 马建立 张永明 王立军 《Chinese Physics B》 SCIE EI CAS CSCD 2006年第8期1806-1809,共4页
Taking into account oxidation temperature, N2 carrier gas flow, and the geometry of the mesa structures this paper investigates the characteristics of selective oxidation during the fabrication of the vertical cavity ... Taking into account oxidation temperature, N2 carrier gas flow, and the geometry of the mesa structures this paper investigates the characteristics of selective oxidation during the fabrication of the vertical cavity surface emitting laser (VCSEL) in detail. Results show that the selective oxidation follows a law which differs from any reported in the literature. Below 435℃ selective oxidation of Al0.98Ga0.02As follows a linear growth law for the two mesa structures employed in VCSEL. Above 435℃ approximately increasing parabolic growth is found, which is influenced by the geometry of the mesa structures. Theoretical analysis on the difference between the two structures for the initial oxidation has been performed, which demonstrates that the geometry of the mesa structures does influence on the growth rate of oxide at higher temperatures. 展开更多
关键词 laser technique selective oxidation vertical-cavity surface-emitting laser QUANTUM-WELL semiconductor laser
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