Hydrogen-free silicon nitride （SiNx） films were deposited at room temperature by microwave electron cyclotron resonance （MW-ECR） plasma enhanced unbalance magnetron sputtering system. Both Fourier-transform infrar...Hydrogen-free silicon nitride （SiNx） films were deposited at room temperature by microwave electron cyclotron resonance （MW-ECR） plasma enhanced unbalance magnetron sputtering system. Both Fourier-transform infrared spectroscopy and x-ray photoelectron spectroscopy are used to study the bonding type and the change of bonding structures of the silicon nitride films. The results indicate that the chemical structure and composition of SiNx films deposited by this technique depend strongly on the N2 flow rates, the stoichiometric SiNx film, which has the highest hardness of 22.9 GPa, could be obtained at lower N2 flow rate of 4 sccm.展开更多
A simple model is described to simulate kinetic processes in dielectric barrier dis-charges for O2/NOx mixtures. A threshold of ozone production found experimentally is confirmedby the calculations of this modeling, a...A simple model is described to simulate kinetic processes in dielectric barrier dis-charges for O2/NOx mixtures. A threshold of ozone production found experimentally is confirmedby the calculations of this modeling, and the underiying chemical reaction mechanisms are dis-cussed. It is also found that the effects of diffusion processes in the period of the lifetime of Oatoms are not important to microdischarge channels with a large radius, i.e. larger than l50 μm.展开更多
Ti-doped WO3 films were prepared by the mid-frequency dual-target magnetron sputtering method. The structure and electrochromic properties of the Ti-doped WO3 films were analysed by X-Ray diffraction （XRD）, Raman sp...Ti-doped WO3 films were prepared by the mid-frequency dual-target magnetron sputtering method. The structure and electrochromic properties of the Ti-doped WO3 films were analysed by X-Ray diffraction （XRD）, Raman spectroscopy, spectrophotometer, cyclic chronoam- perometry and atomic force microscopy （AFM）. The results indicate that the erystallinity decrease after the doping of titanium, the channels for ion injection and extraction increase, the responding speed with 5.1% titanium doped becomes faster, and its circle life increases more than four times compared with the undoped WO3 film. In the coloured state, the W-O-W bonds decrease, but the W = O bonds increase. Since the W-O-W bonds break down for Li＋ ions＇ injection and more W = O bonds form, it is more convenient to inject Li＋ ions into the Ti-doped film than undoped film because more W-O-W bonds break down in the coloured state.展开更多
Dynamics of dust in a plasma sheath with a magnetic field was investigated using a single particle model. The result shows that the radius, initial position, initial velocity of the dust particles and the magnetic fie...Dynamics of dust in a plasma sheath with a magnetic field was investigated using a single particle model. The result shows that the radius, initial position, initial velocity of the dust particles and the magnetic field do effect their movement and equilibrium position in the plasma sheath. Generally, the dust particles with the same size, whatever original velocity and position they have, will locate at the same position in the end under the net actions of electrostatic, gravitational, neutral collisional, and Lorentz forces. But the dust particles will not locate in the plasma sheath if their radius is beyond a certain value.展开更多
One of the novel phenomena of Ar/O_(2)inductively coupled plasma,the delta negative ions density profile is discovered by the fluid simulation at very low electronegativity.The anions delta is found to be formed by th...One of the novel phenomena of Ar/O_(2)inductively coupled plasma,the delta negative ions density profile is discovered by the fluid simulation at very low electronegativity.The anions delta is found to be formed by the collaboration of successive plasma transport phases.The plasma transport itself is affected by the delta,exhibiting many new phenomena.A new type of Helmholtz equation is devised to mathematically explain the delta forming mechanism.For revealing the physics behind,a revised spring oscillator dynamic equation has been constructed according to the Helmholtz equation,in a relevant paper[Zhao S X and Li J Z(2021)Chin.Phys.B 30055202].The investigation about the anions delta distribution is a nice prediction of new phenomenon in low temperature electronegative plasmas,waiting for the validation of related experiments.展开更多
Recently,metal-graphene nanocomposite system has aroused much interest due to its radiation tolerance behavior.However,the related atomic mechanism for the metal-graphene interface is still unknown.Further,stainless s...Recently,metal-graphene nanocomposite system has aroused much interest due to its radiation tolerance behavior.However,the related atomic mechanism for the metal-graphene interface is still unknown.Further,stainless steels with Fe as main matrix are widely used in nuclear systems.Therefore,in this study,the atomic behaviors of point defects and helium(He) atoms at the Fe(110)-graphene interface are investigated systematically by first principles calculations.The results indicate that graphene interacts strongly with the Fe(110) substrate.In comparison with those of the original graphene and bulk Fe,the formation energy values of C vacancies and Fe point defects decrease significantly for Fe(110)-graphene.However,as He atoms have a high migration barrier and large binding energy at the interface,they are trapped at the interface once they enter into it.These theoretical results suggest that the Fe(110)-graphene interface acts as a strong sink that traps defects,suggesting the potential usage of steel-graphene with multiply interface structures for tolerating the radiation damage.展开更多
The behavior of argon plasma driven by nanosecond pulsed plasma in a low-pressure plasma reactor is investigated using a global model, and the results are compared with the experimental measurements. The time evolutio...The behavior of argon plasma driven by nanosecond pulsed plasma in a low-pressure plasma reactor is investigated using a global model, and the results are compared with the experimental measurements. The time evolution of plasma density and the electron energy probability function are calculated by solving the energy balance and Boltzmann equations. During and shortly after the discharge pulse, the electron energy probability function can be represented by a bi-Maxwellian distribution, indicating two energy groups of electrons. According to the effective electron temperature calculation, we find that there are more high-energy electrons that play an important role in the excitation and ionization processes than low-energy electrons. The effective electron temperature is also measured via optical emission spectroscopy to evaluate the simulation model. In the comparison, the simulation results are found to be in agreement with the measure- ments. Furthermore, variations of the effective electron temperature are presented versus other discharge parameters, such as pulse width time, pulse rise time and gas pressure.展开更多
This paper reports that amorphous silicon nitride （a-SiNx） overcoats were deposited at room temperature by microwave ECR plasma enhanced unbalanced magnetron sputtering. The 2 nm a-SiNs overcoat has better anti-corr...This paper reports that amorphous silicon nitride （a-SiNx） overcoats were deposited at room temperature by microwave ECR plasma enhanced unbalanced magnetron sputtering. The 2 nm a-SiNs overcoat has better anti-corrosion properties than that of reference a-CNx overcoats （2 4.5 nm）. The superior anti-corrosion performance is attributed to its stoichiometric bond structure, where 94.8% Si atoms form Si-N asymmetric stretching vibration bonds. The N/Si ratio is 1.33 as in the stoichiometry of Si3N4 and corresponds to the highest hardness of 25.0 GPa. The surface is atomically smooth with RMS 〈 0.2 nm. The ultra-thin a-SiNx overcoats are promising for hard disks and read/write heads protective coatings.展开更多
基金Supported by the National Natural Science Foundation of China under Grant No 50390060.
文摘Hydrogen-free silicon nitride （SiNx） films were deposited at room temperature by microwave electron cyclotron resonance （MW-ECR） plasma enhanced unbalance magnetron sputtering system. Both Fourier-transform infrared spectroscopy and x-ray photoelectron spectroscopy are used to study the bonding type and the change of bonding structures of the silicon nitride films. The results indicate that the chemical structure and composition of SiNx films deposited by this technique depend strongly on the N2 flow rates, the stoichiometric SiNx film, which has the highest hardness of 22.9 GPa, could be obtained at lower N2 flow rate of 4 sccm.
文摘A simple model is described to simulate kinetic processes in dielectric barrier dis-charges for O2/NOx mixtures. A threshold of ozone production found experimentally is confirmedby the calculations of this modeling, and the underiying chemical reaction mechanisms are dis-cussed. It is also found that the effects of diffusion processes in the period of the lifetime of Oatoms are not important to microdischarge channels with a large radius, i.e. larger than l50 μm.
文摘Ti-doped WO3 films were prepared by the mid-frequency dual-target magnetron sputtering method. The structure and electrochromic properties of the Ti-doped WO3 films were analysed by X-Ray diffraction （XRD）, Raman spectroscopy, spectrophotometer, cyclic chronoam- perometry and atomic force microscopy （AFM）. The results indicate that the erystallinity decrease after the doping of titanium, the channels for ion injection and extraction increase, the responding speed with 5.1% titanium doped becomes faster, and its circle life increases more than four times compared with the undoped WO3 film. In the coloured state, the W-O-W bonds decrease, but the W = O bonds increase. Since the W-O-W bonds break down for Li＋ ions＇ injection and more W = O bonds form, it is more convenient to inject Li＋ ions into the Ti-doped film than undoped film because more W-O-W bonds break down in the coloured state.
基金supported by National Natural Science Foundation of China(No.10605008)the Scientific Research Program of the Education Department of Liaoning Province(No.2005069)
文摘Dynamics of dust in a plasma sheath with a magnetic field was investigated using a single particle model. The result shows that the radius, initial position, initial velocity of the dust particles and the magnetic field do effect their movement and equilibrium position in the plasma sheath. Generally, the dust particles with the same size, whatever original velocity and position they have, will locate at the same position in the end under the net actions of electrostatic, gravitational, neutral collisional, and Lorentz forces. But the dust particles will not locate in the plasma sheath if their radius is beyond a certain value.
基金supported by the foundation of project DUT19LK59
文摘One of the novel phenomena of Ar/O_(2)inductively coupled plasma,the delta negative ions density profile is discovered by the fluid simulation at very low electronegativity.The anions delta is found to be formed by the collaboration of successive plasma transport phases.The plasma transport itself is affected by the delta,exhibiting many new phenomena.A new type of Helmholtz equation is devised to mathematically explain the delta forming mechanism.For revealing the physics behind,a revised spring oscillator dynamic equation has been constructed according to the Helmholtz equation,in a relevant paper[Zhao S X and Li J Z(2021)Chin.Phys.B 30055202].The investigation about the anions delta distribution is a nice prediction of new phenomenon in low temperature electronegative plasmas,waiting for the validation of related experiments.
基金Project supported by the Nuclear Power Technology Innovation Center ProgramNational Defense Science&Technology Industry,China(Grant No.HDLCXZX-2019-ZH-028)。
文摘Recently,metal-graphene nanocomposite system has aroused much interest due to its radiation tolerance behavior.However,the related atomic mechanism for the metal-graphene interface is still unknown.Further,stainless steels with Fe as main matrix are widely used in nuclear systems.Therefore,in this study,the atomic behaviors of point defects and helium(He) atoms at the Fe(110)-graphene interface are investigated systematically by first principles calculations.The results indicate that graphene interacts strongly with the Fe(110) substrate.In comparison with those of the original graphene and bulk Fe,the formation energy values of C vacancies and Fe point defects decrease significantly for Fe(110)-graphene.However,as He atoms have a high migration barrier and large binding energy at the interface,they are trapped at the interface once they enter into it.These theoretical results suggest that the Fe(110)-graphene interface acts as a strong sink that traps defects,suggesting the potential usage of steel-graphene with multiply interface structures for tolerating the radiation damage.
基金supported by National Natural Science Foundation of China (Nos.10875023,11175035)the Ph.D research program(No.200801411040 ) of Educational Ministry+1 种基金the Scientific and Technical Foundation of Liaoning Province (No.20082168)National Magnetic Confinement Fusion Science Program of China (Nos.2009GB106004,2008CB717801)
文摘The behavior of argon plasma driven by nanosecond pulsed plasma in a low-pressure plasma reactor is investigated using a global model, and the results are compared with the experimental measurements. The time evolution of plasma density and the electron energy probability function are calculated by solving the energy balance and Boltzmann equations. During and shortly after the discharge pulse, the electron energy probability function can be represented by a bi-Maxwellian distribution, indicating two energy groups of electrons. According to the effective electron temperature calculation, we find that there are more high-energy electrons that play an important role in the excitation and ionization processes than low-energy electrons. The effective electron temperature is also measured via optical emission spectroscopy to evaluate the simulation model. In the comparison, the simulation results are found to be in agreement with the measure- ments. Furthermore, variations of the effective electron temperature are presented versus other discharge parameters, such as pulse width time, pulse rise time and gas pressure.
基金Project supported by the Major Program of the National Natural Science Foundation of China (Grant No 50390060)the National Natural Science Foundation of China (Grant Nos 60576022 and 50572012)
文摘This paper reports that amorphous silicon nitride （a-SiNx） overcoats were deposited at room temperature by microwave ECR plasma enhanced unbalanced magnetron sputtering. The 2 nm a-SiNs overcoat has better anti-corrosion properties than that of reference a-CNx overcoats （2 4.5 nm）. The superior anti-corrosion performance is attributed to its stoichiometric bond structure, where 94.8% Si atoms form Si-N asymmetric stretching vibration bonds. The N/Si ratio is 1.33 as in the stoichiometry of Si3N4 and corresponds to the highest hardness of 25.0 GPa. The surface is atomically smooth with RMS 〈 0.2 nm. The ultra-thin a-SiNx overcoats are promising for hard disks and read/write heads protective coatings.
