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Fabrication of micro carbon pillar by laser-induced chemical vapor deposition
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作者 周健 罗迎社 +3 位作者 李立君 钟琦文 李新华 殷水平 《Journal of Central South University》 SCIE EI CAS 2008年第S1期197-201,共5页
Argon ion laser was used as the induced light source and ethane(C2H4) was selected as the precursor gas,in the variety ranges of laser power from 0.5 W to 4.5 W and the pressure of the precursor gas from 225×133.... Argon ion laser was used as the induced light source and ethane(C2H4) was selected as the precursor gas,in the variety ranges of laser power from 0.5 W to 4.5 W and the pressure of the precursor gas from 225×133.3 Pa to 680×133.3 Pa,the experiments of laser induced chemical vapor deposition were proceeded for fabrication of micro carbon pillar.In the experiments,the influences of power of laser and pressure of work gas on the diameter and length of micro carbon pillar were investigated,the variety on averaged growth rate of carbon pillar with the laser irradiation time and moving speed of focus was discussed.Based on experiment data,the micro carbon pillar with an aspect ratio of over 500 was built through the method of moving the focus. 展开更多
关键词 LASER-INDUCED chemical vapor deposition(LCVD) GROWING rapid DIAMETER microcarbon.
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