氧化矾作为非制冷微测辐射热计的热敏材料,电阻率ρ和电阻温度系数TCR(Temperature Co-efficient of Resistance)是表征其性能的重要参数。通过对用离子束溅射得到的氧化矾薄膜在相同时间不同温度下的N2+H2退火实验,我们发现氧化矾薄膜...氧化矾作为非制冷微测辐射热计的热敏材料,电阻率ρ和电阻温度系数TCR(Temperature Co-efficient of Resistance)是表征其性能的重要参数。通过对用离子束溅射得到的氧化矾薄膜在相同时间不同温度下的N2+H2退火实验,我们发现氧化矾薄膜的电阻率ρ和电阻温度系数TCR之间存在着密切的正相关关系,AES结果表明它们的变化对应着氧化矾热敏材料的O/V比例(或氧空位浓度)的变化。这三个参量随着退火温度的改变而变化,在350～500 ℃的退火温度范围内,我们发现电阻率ρ,电阻温度系数TCR以及O/V比例随着温度的变化均出现一个峰值。通过对氧化矾的电阻温度特性的分析,我们讨论了氧化矾薄膜的导电机制。我们认为,用本方法制备的氧化矾薄膜在室温下导电的载流子主要来自于相对较深能级杂质的电离。展开更多
Laminine(Ln) has been identified as an important marker of liver fibrosis or cirrhosis. The Ln immunosensor was formed with thioglycolic acid to produce a self-assembled monolayer on the gold electrode surface. The mo...Laminine(Ln) has been identified as an important marker of liver fibrosis or cirrhosis. The Ln immunosensor was formed with thioglycolic acid to produce a self-assembled monolayer on the gold electrode surface. The monoclonal Ln antibody was orderly immobilized on the modified gold surface covalently using EDC/NHS. An unlabeled antigen combined on the antibody could reduce the capacitance of the electrode, which was evaluated by the potentiostatic method. The measurement was performed in microseconds. Ln antigen could be determined in the range of 2-50 ng/mL. The quick response made the immunosensor a promising clinical screening method.展开更多
Selective metallization on glass is widely used in the production of printed circuit boards(PCB),display panels and solar cells. Selective masking and etching steps are used in the traditional photolithographic proces...Selective metallization on glass is widely used in the production of printed circuit boards(PCB),display panels and solar cells. Selective masking and etching steps are used in the traditional photolithographic processes to create the regions of metallization on non-conducting substrates; however, these processes require high-cost facilities and complicated operations. To address these issues, a non-photolithographic process to form metal patterns on glass was proposed and put into practice, which combines self-assembly of aminosilane, desktop inkjet printing of a catalyst ink, and selective electroless plating of Au, Cu or Ni-B alloy on the catalyst template to form desired patterns with a minimal line width of about 200 μm. The adherence of the metal layer deposited on glass is significantly enhanced due to the surface modification of self-assembled aminosilane layer. The non-photolithographic approach could be cost-effective for prototype and small patch of production of metallic patterns, simple electric circuits and other electronic device parts.展开更多
文摘氧化矾作为非制冷微测辐射热计的热敏材料,电阻率ρ和电阻温度系数TCR(Temperature Co-efficient of Resistance)是表征其性能的重要参数。通过对用离子束溅射得到的氧化矾薄膜在相同时间不同温度下的N2+H2退火实验,我们发现氧化矾薄膜的电阻率ρ和电阻温度系数TCR之间存在着密切的正相关关系,AES结果表明它们的变化对应着氧化矾热敏材料的O/V比例(或氧空位浓度)的变化。这三个参量随着退火温度的改变而变化,在350～500 ℃的退火温度范围内,我们发现电阻率ρ,电阻温度系数TCR以及O/V比例随着温度的变化均出现一个峰值。通过对氧化矾的电阻温度特性的分析,我们讨论了氧化矾薄膜的导电机制。我们认为,用本方法制备的氧化矾薄膜在室温下导电的载流子主要来自于相对较深能级杂质的电离。
文摘Laminine(Ln) has been identified as an important marker of liver fibrosis or cirrhosis. The Ln immunosensor was formed with thioglycolic acid to produce a self-assembled monolayer on the gold electrode surface. The monoclonal Ln antibody was orderly immobilized on the modified gold surface covalently using EDC/NHS. An unlabeled antigen combined on the antibody could reduce the capacitance of the electrode, which was evaluated by the potentiostatic method. The measurement was performed in microseconds. Ln antigen could be determined in the range of 2-50 ng/mL. The quick response made the immunosensor a promising clinical screening method.
文摘Selective metallization on glass is widely used in the production of printed circuit boards(PCB),display panels and solar cells. Selective masking and etching steps are used in the traditional photolithographic processes to create the regions of metallization on non-conducting substrates; however, these processes require high-cost facilities and complicated operations. To address these issues, a non-photolithographic process to form metal patterns on glass was proposed and put into practice, which combines self-assembly of aminosilane, desktop inkjet printing of a catalyst ink, and selective electroless plating of Au, Cu or Ni-B alloy on the catalyst template to form desired patterns with a minimal line width of about 200 μm. The adherence of the metal layer deposited on glass is significantly enhanced due to the surface modification of self-assembled aminosilane layer. The non-photolithographic approach could be cost-effective for prototype and small patch of production of metallic patterns, simple electric circuits and other electronic device parts.
