Metal-insulator-metal （MIM） capacitors with atomic-layer-deposited Al2O3 dielectric and reactively sputtered TaN electrodes in application to radio frequency integrated circuits have been characterized electrically....Metal-insulator-metal （MIM） capacitors with atomic-layer-deposited Al2O3 dielectric and reactively sputtered TaN electrodes in application to radio frequency integrated circuits have been characterized electrically. The capacitors exhibit a high density of about 6.05 fF/μm^2, a small leakage current of 4.8 × 10^-8 A/cm^2 at 3 V, a high breakdown electric field of 8.61 MV/cm as well as acceptable voltage coefficients of capacitance （VCCs） of 795 ppm/V2 and 268ppm/V at 1 MHz. The observed properties should be attributed to high-quality Al2O3 film and chemically stable TaN electrodes. Further, a logarithmically linear relationship between quadratic VCC and frequency is observed due to the change of relaxation time with carrier mobility in the dielectric. The conduction mechanism in the high field ranges is dominated by the Poole-Frenkel emission, and the leakage current in the low field ranges is likely to be associated with trap-assisted tunnelling. Meanwhile, the Al2O3 dielectric presents charge trapping under low voltage stresses, and defect generation under high voltage stresses, and it has a hard-breakdown performance.展开更多
该文首次报道了一种极简构架的5G毫米波反向阵设计原理及其CMOS芯片实现技术。该毫米波反向阵极简构架,利用次谐波混频器提供相位共轭和阵列反向功能,无需移相电路及波束控制系统,便可实现波束自动回溯移动通信功能。该文采用国产0.18μ...该文首次报道了一种极简构架的5G毫米波反向阵设计原理及其CMOS芯片实现技术。该毫米波反向阵极简构架,利用次谐波混频器提供相位共轭和阵列反向功能,无需移相电路及波束控制系统,便可实现波束自动回溯移动通信功能。该文采用国产0.18μm CMOS工艺研制了5G毫米波反向阵芯片,包括发射前端、接收前端及跟踪锁相环等核心模块,其中发射及接收前端芯片采用次谐波混频及跨导增强等技术,分别实现了19.5 d B和18.7 d B的实测转换增益。所实现的跟踪锁相环芯片具备双模工作优势,可根据不同参考信号支持幅度调制及相位调制,实测输出信号相噪优于–125 dBc/Hz@100 kHz。该文给出的测试结果验证了所提5G毫米波反向阵通信架构及其CMOS芯片实现的可行性,从而为5G/6G毫米波通信探索了一种架构极简、成本极低、拓展性强的新方案。展开更多
基金Project supported by the National Natural Science Foundation of China （Grant No 90607023）, Shanghai Pujiang Program （Grant No 05PJ14017）, SRF for R0CS, SEM, and the Micro/Nano-electronics Science and Technology Innovation Platform （985） and the Ministry of Education of China in the International Research Training Group ＂Materials and Concepts for Advanced Interconnects
文摘Metal-insulator-metal （MIM） capacitors with atomic-layer-deposited Al2O3 dielectric and reactively sputtered TaN electrodes in application to radio frequency integrated circuits have been characterized electrically. The capacitors exhibit a high density of about 6.05 fF/μm^2, a small leakage current of 4.8 × 10^-8 A/cm^2 at 3 V, a high breakdown electric field of 8.61 MV/cm as well as acceptable voltage coefficients of capacitance （VCCs） of 795 ppm/V2 and 268ppm/V at 1 MHz. The observed properties should be attributed to high-quality Al2O3 film and chemically stable TaN electrodes. Further, a logarithmically linear relationship between quadratic VCC and frequency is observed due to the change of relaxation time with carrier mobility in the dielectric. The conduction mechanism in the high field ranges is dominated by the Poole-Frenkel emission, and the leakage current in the low field ranges is likely to be associated with trap-assisted tunnelling. Meanwhile, the Al2O3 dielectric presents charge trapping under low voltage stresses, and defect generation under high voltage stresses, and it has a hard-breakdown performance.
文摘该文首次报道了一种极简构架的5G毫米波反向阵设计原理及其CMOS芯片实现技术。该毫米波反向阵极简构架,利用次谐波混频器提供相位共轭和阵列反向功能,无需移相电路及波束控制系统,便可实现波束自动回溯移动通信功能。该文采用国产0.18μm CMOS工艺研制了5G毫米波反向阵芯片,包括发射前端、接收前端及跟踪锁相环等核心模块,其中发射及接收前端芯片采用次谐波混频及跨导增强等技术,分别实现了19.5 d B和18.7 d B的实测转换增益。所实现的跟踪锁相环芯片具备双模工作优势,可根据不同参考信号支持幅度调制及相位调制,实测输出信号相噪优于–125 dBc/Hz@100 kHz。该文给出的测试结果验证了所提5G毫米波反向阵通信架构及其CMOS芯片实现的可行性,从而为5G/6G毫米波通信探索了一种架构极简、成本极低、拓展性强的新方案。
