The geometry of an inductively coupled plasma （ICP） etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these pa...The geometry of an inductively coupled plasma （ICP） etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these parameters were determined by the ＂trial and error＂ method, resulting in wastes of time and funds. In this paper, a new approach of regression orthogonal design with plasma simulation experiments is proposed to investigate the sensitivity of the structural parameters on the uniformity of plasma characteristics. The tool for simulating plasma is CFD-ACE＋, which is commercial multi-physical modeling software that has been proven to be accurate for plasma simulation. The simulated experimental results are analyzed to get a regression equation on three structural parameters. Through this equation, engineers can compute the uniformity of the electron number density rapidly without modeling by CFD-ACE＋. An optimization performed at the end produces good results.展开更多
Supersaturated design is essentially a fractional factorial design in which the number of potential effects is greater than the number of runs. In this article, the supersaturated design is applied to a computer exper...Supersaturated design is essentially a fractional factorial design in which the number of potential effects is greater than the number of runs. In this article, the supersaturated design is applied to a computer experiment through an example of steady current circuit model problem. A uniform mixed-level supersaturated design and the centered quadratic regression model are used. This example shows that supersaturated design and quadratic regression modeling method are very effective for screening effects and building the predictor. They are not only useful in computer experiments but also in industrial and other scientific experiments.展开更多
基金supported by Important National Science & Technology Specific Projects of China (No.2) (Nos.2009ZX02001,2011ZX02403)
文摘The geometry of an inductively coupled plasma （ICP） etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these parameters were determined by the ＂trial and error＂ method, resulting in wastes of time and funds. In this paper, a new approach of regression orthogonal design with plasma simulation experiments is proposed to investigate the sensitivity of the structural parameters on the uniformity of plasma characteristics. The tool for simulating plasma is CFD-ACE＋, which is commercial multi-physical modeling software that has been proven to be accurate for plasma simulation. The simulated experimental results are analyzed to get a regression equation on three structural parameters. Through this equation, engineers can compute the uniformity of the electron number density rapidly without modeling by CFD-ACE＋. An optimization performed at the end produces good results.
基金Research supported by the National Natural Science Foundation of China (10301015)the Science and Technology Innovation Fund of Nankai University, the Visiting Scholar Program at Chern Institute of Mathematicsa Hong Kong Research Grants Council Grant (RGC/HKBU 200804)
文摘Supersaturated design is essentially a fractional factorial design in which the number of potential effects is greater than the number of runs. In this article, the supersaturated design is applied to a computer experiment through an example of steady current circuit model problem. A uniform mixed-level supersaturated design and the centered quadratic regression model are used. This example shows that supersaturated design and quadratic regression modeling method are very effective for screening effects and building the predictor. They are not only useful in computer experiments but also in industrial and other scientific experiments.
