Millets are widely recognized for their nutritional significance;however, the methods employed for their processing are currently lacking. This article primarily focuses on the advanced technologies and progressions i...Millets are widely recognized for their nutritional significance;however, the methods employed for their processing are currently lacking. This article primarily focuses on the advanced technologies and progressions in millet dehulling and polishing. These technologies operate based on the fundamental principles of compression-shearing, abrasion-friction, and centrifugal-impact forces. Processing of millets can be challenging because of the physical characteristics and tight attachment of hull and bran to the endosperm. However, several dehullers have been designed to solve this problem for different kinds of millets. In addition, the nutritional and anti-nutritional characteristics undergo alterations due to both dehulling and polishing processes. These alterations are thoroughly examined and discussed in this article. Specifically, anti-nutrients such as tannins and phytate are predominantly found in the outer pericarp of the grain and experience a reduction after undergoing dehulling and polishing. The nutritional properties are also subjected to a reduction;however, this reduction can be mitigated by subjecting the grains to certain pretreatments before dehulling and polishing. These treatments serve to enhance dehulling efficiency and nutrient digestibility while simultaneously reducing the presence of anti-nutrients. Novel thermal and non-thermal methodologies such as microwave, hydrothermal, high-pressure processing, and ohmic heating can be employed for processing millets, thereby diminishing the loss of nutrients. Additional research can be carried out to investigate their impact on the dehulling and polishing of millets.展开更多
This paper deals with Polyurethane Foam Polishing Tool (PFPT), which has three dimensional softness and are adapted to polishing sophisticated curved surfaces. The manufacturing technology, the equilibrium theory of ...This paper deals with Polyurethane Foam Polishing Tool (PFPT), which has three dimensional softness and are adapted to polishing sophisticated curved surfaces. The manufacturing technology, the equilibrium theory of matter and energy have been discussed and the PFPT is produced successfully at our laboratory. After investigating their properties, the effective factors to the behavior of the PFPT are studied. The microcosmic construction of the PFPT have been observed by sweep electron microscope(SEM) and the polishing mechanism studied. A great deal of experiments have been carried out to optimize the manufacturing parameters.展开更多
In order to improve the polishing ability of polishing pads, a kind of polishing pad with the tin fixed abrasive blocks, which are arranged based on the phyllotaxis theory of biology, was designed and fabricated by th...In order to improve the polishing ability of polishing pads, a kind of polishing pad with the tin fixed abrasive blocks, which are arranged based on the phyllotaxis theory of biology, was designed and fabricated by the use of electroplating technology, and also its polishing ability for JGS-2 wafer was investigated by polishing experiments. The research results show that the phyllotactic parameters of the polishing pad influence the arrangement density of the tin fixed abrasive blocks, the polishing pad with phyllotactic pattern is feasibly fabricated by the use of electroplating technology, and the good polishing result can be obtained by using the polishing pad with phyllotactic pattern to polish a wafer when the diameter D of the tin fixed abrasive block is between Φ1.3 mm and Φ1.4 mm, and the phyllotactic coefficient k between 1.0 and 1.1,respectively.展开更多
In the light of some assumptions that are very close to the practical working conditions,a very complicated polishing process of optical element can be simplified as a linear and shift invariant system that is relatd ...In the light of some assumptions that are very close to the practical working conditions,a very complicated polishing process of optical element can be simplified as a linear and shift invariant system that is relatd only to the speed,pres- sure and time of processing.In polishing,the removed material can be represented and entreated by the convolution of the removal function of polishing head and the dwell function.The properties of removal function are presented.The assumptions and methods given by the author have been shown to be correct and applicable by experiments using a ring lap to polish the optical surfac.展开更多
Describes a computer controlled polishing machine utilizing a small polisher with specified movement to figure optical surfces having strict dimensional requirements. The system is especially applicable in figuring as...Describes a computer controlled polishing machine utilizing a small polisher with specified movement to figure optical surfces having strict dimensional requirements. The system is especially applicable in figuring aspherical surfaces, beginning with the best fit sphere if the departure from the desired surface is not large. An interferometric measuring system is desiigned to form a closed loop control during processing.展开更多
This paper presents an innovative approach to reusing waste tile granules(TG) and ceramic polishing powder(PP) to produce high performance ceramic tiles.We studied formulations each with a TG mass fraction of 25.0% an...This paper presents an innovative approach to reusing waste tile granules(TG) and ceramic polishing powder(PP) to produce high performance ceramic tiles.We studied formulations each with a TG mass fraction of 25.0% and a different PP mass fraction between 1.0% and 7.0%.The formulations included a small amount of borax additive of a mass fracton between 0.2% and 1.2%.The effects of these industrial by-products on compressive strength,water absorption and microstructure of the new ceramic tiles were investigated.The results indicate that the compressive strength decreases and water absorption increases when TG with a mass fraction of 25.0% are added.Improvement of the compressive strength may be achieved when TG(up to 25.0%) and PP(up to 2.0%) are both used at the same time.In particular,the compressive strength improvement can be maximized and water absorption reduced when a borax additive of up to 0.5% is used as a flux.Scanning electron microscopy reveals that a certain amount of fine PP granules and a high content of fluxing oxides from borax avail the formation of glassy phase that fills up the pores in the new ceramic tiles,resulting in a dense product with high compressive strength and low water absorption.展开更多
This paper mainly focuses on the influence of colloidal silica polishing on the damage performance of fused silica optics. In this paper, nanometer sized colloidal silica and micron sized ceria are used to polish fuse...This paper mainly focuses on the influence of colloidal silica polishing on the damage performance of fused silica optics. In this paper, nanometer sized colloidal silica and micron sized ceria are used to polish fused silica optics. The colloidal silica polished samples and ceria polished samples exhibit that the root-mean-squared （RMS） average surface roughness values are 0.7 nm and 1.0 rim, respectively. The subsurface defects and damage performance of the polished optics are analyzed and discussed. It is revealed that colloidal silica polishing will introduce much fewer absorptive con- taminant elements and subsurface damages especially no trailing indentation fracture. The 355-nm laser damage test reveals that each of the fused silica samples polished with colloidal silica has a much higher damage threshold and lower damage density than ceria polished samples. Colloidal silica polishing is potential in manufacturing high power laser optics.展开更多
Metal Ti and its alloys have been widely utilized in the fields of aviation, medical science, and micro-electromechanical systems, for its excellent specific strength, resistance to corrosion, and biological compatibi...Metal Ti and its alloys have been widely utilized in the fields of aviation, medical science, and micro-electromechanical systems, for its excellent specific strength, resistance to corrosion, and biological compatibility. As the application of Ti moves to the micro or nano scale, however, traditional methods of planarization have shown their short slabs.Thus, we introduce the method of chemical mechanical polishing（CMP） to provide a new way for the nano-scale planarization method of Ti alloys. We obtain a mirror-like surface, whose flatness is of nano-scale, via the CMP method. We test the basic mechanical behavior of Ti–6Al–4V（Ti64） in the CMP process, and optimize the composition of CMP slurry.Furthermore, the possible reactions that may take place in the CMP process have been studied by electrochemical methods combined with x-ray photoelectron spectroscopy（XPS）. An equivalent circuit has been built to interpret the dynamic of oxidation. Finally, a model has been established to explain the synergy of chemical and mechanical effects in the CMP of Ti–6Al–4V.展开更多
Effects of abrasive concentration on material removal rate CMRR） and surtace quality m the chemical mecnamcal polishing （CMP） of light-emitting diode sapphire substrates are investigated. Experimental results show ...Effects of abrasive concentration on material removal rate CMRR） and surtace quality m the chemical mecnamcal polishing （CMP） of light-emitting diode sapphire substrates are investigated. Experimental results show that the MRR increases linearly with the abrasive concentration, while the rms roughness decreases with the increasing abrasive concentration. In addition, the in situ coefficient of friction （COF） is also conducted during the sapphire polishing process. The results present that COF increases sharply with the abrasive concentration up to 20 wt% and then shows a slight decrease from 20wt% to 40wt%. Temperature is a product of the friction force that is proportional to COF, which is an indicator for the mechanism of the sapphire CMP.展开更多
To improve polishing quality and cope with the shortage of skilled workers for aluminum wheel-hub surface polishing, an automatic surface polishing system with hierarchical control based on the teaching-playback metho...To improve polishing quality and cope with the shortage of skilled workers for aluminum wheel-hub surface polishing, an automatic surface polishing system with hierarchical control based on the teaching-playback method was presented. Multi-axis cutter location data (CL data) were generated with the teaching method. First, a helical tool path and a flexible polishing tool were adopted to achieve high quality and high efficiency; next, the initial irregular data were processed into continuous polishing CL data. The important factor affecting polishing quality, namely the interpolation cycle in the multi-axis CL data was calculated based on a constant removal rate. Results from polishing experiments show that the quality of automatic machine polishing is better and stabler than manual polishing.展开更多
The present investigation was aimed to study functional properties,antioxidant activity and in-vitro digestibility characteristics of brown and polished flours obtained from four rice cultivars(SR-4,K-39,Mushq Budij a...The present investigation was aimed to study functional properties,antioxidant activity and in-vitro digestibility characteristics of brown and polished flours obtained from four rice cultivars(SR-4,K-39,Mushq Budij and Zhag)of Kashmir.Brown rice flours had higher total dietary fibre(3.08%-3.68%),oil absorption(116.0%-139.0%),emulsion capacity(4.78%-9.52%),emulsion stability(87.46%-99.93%)and resistant starch content(6.80%-9.00%)than polished flours.However,polished flours presented greater water absorption(102.0%-122.0%),foaming capacity(8.00%-13.63%),apparent amylose(19.16%-22.62%),peak(2260.0-2408.0 cP),trough(1372.0-1589.0 cP)and breakdown(714.0-978.0 cP)viscosities than their brown counterparts.Brown rice flours depicted highest total phenolic content(4.40-6.40 mg GAE/g)and inhibition of lipid peroxidation(19.50%-33.20%).However,equilibrium starch hydrolysis percentage(C∞)and predicted glycemic index of brown rice flours were lower than their polished counterparts.Among rice cultivars,brown Zhag flour had the highest total dietary fibre(3.68%),emulsion capacity(9.52%),emulsion stability(99.93%),resistant starch(9.00%),DPPH radical scavenging activity(85.45%)and inhibition of lipid peroxidation(33.20%),respectively.Emulsion capacity and emulsion stability were positively correlated with protein content of rice flours.However,peak,trough,breakdown and setback viscosities were negatively correlated with protein and fat contents of rice flour.The present investigation will be helpful in identifying nutritive role of rice flours from studied cultivars in human diet.展开更多
The performance of optical power transmission through a side-polished fiber on which materials of different refractive indices were overlaid is investigated. The experiments show that the transmitted optical power thr...The performance of optical power transmission through a side-polished fiber on which materials of different refractive indices were overlaid is investigated. The experiments show that the transmitted optical power through the side-polished fiber varies with the refractive index of the overlaid material. The result of our experiments fits well the theoretical calculation. Side-polished fiber manufactured by wheel polishing method can be used not only to control optical power transmission through the fiber core but also as a refractive index sensor.展开更多
Laser-induced damage in fused silica optics greatly restricts the performances of laser facilities. Gray haze damage,which is always initiated on ceria polished optics, is one of the most important damage morphologies...Laser-induced damage in fused silica optics greatly restricts the performances of laser facilities. Gray haze damage,which is always initiated on ceria polished optics, is one of the most important damage morphologies in fused silica optics.In this paper, the laser-induced gray haze damages of four fused silica samples polished with CeO2, Al2O3, ZrO2, and colloidal silica slurries are investigated. Four samples all present gray haze damages with much different damage densities.Then, the polishing-induced contaminant and subsurface damages in four samples are analyzed. The results reveal that the gray haze damages could be initiated on the samples without Ce contaminant and are inclined to show a tight correlation with the shallow subsurface damages.展开更多
Chemically vapor deposited diamond films were etched at different parameters using oxygen plasma produced by a DC （direct current） glow discharge and then polished by a modified mechanical polishing device. Scanning...Chemically vapor deposited diamond films were etched at different parameters using oxygen plasma produced by a DC （direct current） glow discharge and then polished by a modified mechanical polishing device. Scanning electron microscope, atomic force microscope and Raman spectrometer were used to evaluate the surface states of diamond films before and after polishing. It was found that a moderate plasma etching would produce a lot of etch pits and amorphous carbon on the top surface of diamond film. As a result, the quality and the efficiency of mechanical polishing have been enhanced remarkably.展开更多
We report on the investigation of the origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid. The oxide to nitride removal selectivity of the ceria slurry with pi...We report on the investigation of the origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid. The oxide to nitride removal selectivity of the ceria slurry with picolinic acid is as high as 76.6 in the chemical mechanical polishing. By using zeta potential analyzer, particle size analyzer, horizon profilometer, thermogravimetric analysis and Fourier transform infrared spectroscopy, the pre- and the post-polished wafer surfaces as well as the pre- and the post-used ceria-based slurries are compared. Possible mechanism of high oxide to nitride selectivity with using ceria-based slurry with picolinic acid is discussed.展开更多
The effect of iron trichloride （FeC13） on chemical mechanical polishing （CMP） of Ge2Sb2Te5 （GST） film is inves- tigated in this paper. The polishing rate of GST increases from 38 nm/min to 144 nm/min when the Fe...The effect of iron trichloride （FeC13） on chemical mechanical polishing （CMP） of Ge2Sb2Te5 （GST） film is inves- tigated in this paper. The polishing rate of GST increases from 38 nm/min to 144 nm/min when the FeC13 concentration changes from 0.01 wt% to 0.15 wt%, which is much faster than 20 nm/min for the 1 wt% H2O2-based slurry. This polish- ing rate trends are inversely correlated with the contact angle data of FeCl3-based slurry on the GST film surface. Thus, it is hypothesized that the hydrophilicity of the GST film surface is associated with the polishing rate during CMP. Atomic force microscope （AFM） and optical microscope （OM） are used to characterize the surface quality after CMP. The chemical mechanism is studied by potentiodynamic measurements such as Ecorr and Icorr to analyze chemical reaction between FeCl3 and GST surface. Finally, it is verified that slurry with FeCl3 has no influence on the electrical property of the post-CMP GST film by the resistivity-temperature （RT） tests.展开更多
We investigate the effect of cations with different valences on the chemical mechanical polishing(CMP)of silicon dioxide films.The removal rate and surface roughness of the silicon-dioxide-film post-CMP are checked fo...We investigate the effect of cations with different valences on the chemical mechanical polishing(CMP)of silicon dioxide films.The removal rate and surface roughness of the silicon-dioxide-film post-CMP are checked for the silica-based slurry with different cation salts(NaCl,CaCl_(2),AlCl_(3)).Meanwhile,the particle size and size distribution of the slurries are characterized to test their lifetimes.The result shows that the three kinds of salts can improve the polishing removal rate from around 20nm/min to 120nm/min without affecting the surface roughness when the polishing slurry is stable.With increasing valence of cations,the polishing slurry requires less cation concentration to be added to improve the removal rate,while keeping a superior surface topography and maintaining a longer lifetime as well.展开更多
We report the latest research development of vertical buffered electropolishing on its post-treatment procedure as well as the effects of several major post-treatment techniques for buffered electropolishing(BEP)proce...We report the latest research development of vertical buffered electropolishing on its post-treatment procedure as well as the effects of several major post-treatment techniques for buffered electropolishing(BEP)processed 1.5 GHz niobium(Nb)superconducting radio frequency(SRF)cavities.With the established post-treatment procedure,an accelerating gradient of 28.4MV/m is obtained on a single cell cavity of the cebaf shape.This is the best result in the history of BEP development.The cavity is limited by quench with a high quality factor over 1.2×1010 at the quench point.Analyses from optical inspection and temperature-mapping show that the quench should be originated from the pits that were already present on the cavity before this BEP treatment.All of these factors indicate that this procedure will have a great potential to produce better results if cavities without intrinsic performance limiting imperfections are used.展开更多
基金the Indian Institute of Technology, Kharagpur, West Bengal, 721302, for providing technical and financial support for the research。
文摘Millets are widely recognized for their nutritional significance;however, the methods employed for their processing are currently lacking. This article primarily focuses on the advanced technologies and progressions in millet dehulling and polishing. These technologies operate based on the fundamental principles of compression-shearing, abrasion-friction, and centrifugal-impact forces. Processing of millets can be challenging because of the physical characteristics and tight attachment of hull and bran to the endosperm. However, several dehullers have been designed to solve this problem for different kinds of millets. In addition, the nutritional and anti-nutritional characteristics undergo alterations due to both dehulling and polishing processes. These alterations are thoroughly examined and discussed in this article. Specifically, anti-nutrients such as tannins and phytate are predominantly found in the outer pericarp of the grain and experience a reduction after undergoing dehulling and polishing. The nutritional properties are also subjected to a reduction;however, this reduction can be mitigated by subjecting the grains to certain pretreatments before dehulling and polishing. These treatments serve to enhance dehulling efficiency and nutrient digestibility while simultaneously reducing the presence of anti-nutrients. Novel thermal and non-thermal methodologies such as microwave, hydrothermal, high-pressure processing, and ohmic heating can be employed for processing millets, thereby diminishing the loss of nutrients. Additional research can be carried out to investigate their impact on the dehulling and polishing of millets.
文摘This paper deals with Polyurethane Foam Polishing Tool (PFPT), which has three dimensional softness and are adapted to polishing sophisticated curved surfaces. The manufacturing technology, the equilibrium theory of matter and energy have been discussed and the PFPT is produced successfully at our laboratory. After investigating their properties, the effective factors to the behavior of the PFPT are studied. The microcosmic construction of the PFPT have been observed by sweep electron microscope(SEM) and the polishing mechanism studied. A great deal of experiments have been carried out to optimize the manufacturing parameters.
基金Sponsored by the National Nature Science Foundation of China (50875179)
文摘In order to improve the polishing ability of polishing pads, a kind of polishing pad with the tin fixed abrasive blocks, which are arranged based on the phyllotaxis theory of biology, was designed and fabricated by the use of electroplating technology, and also its polishing ability for JGS-2 wafer was investigated by polishing experiments. The research results show that the phyllotactic parameters of the polishing pad influence the arrangement density of the tin fixed abrasive blocks, the polishing pad with phyllotactic pattern is feasibly fabricated by the use of electroplating technology, and the good polishing result can be obtained by using the polishing pad with phyllotactic pattern to polish a wafer when the diameter D of the tin fixed abrasive block is between Φ1.3 mm and Φ1.4 mm, and the phyllotactic coefficient k between 1.0 and 1.1,respectively.
文摘In the light of some assumptions that are very close to the practical working conditions,a very complicated polishing process of optical element can be simplified as a linear and shift invariant system that is relatd only to the speed,pres- sure and time of processing.In polishing,the removed material can be represented and entreated by the convolution of the removal function of polishing head and the dwell function.The properties of removal function are presented.The assumptions and methods given by the author have been shown to be correct and applicable by experiments using a ring lap to polish the optical surfac.
文摘Describes a computer controlled polishing machine utilizing a small polisher with specified movement to figure optical surfces having strict dimensional requirements. The system is especially applicable in figuring aspherical surfaces, beginning with the best fit sphere if the departure from the desired surface is not large. An interferometric measuring system is desiigned to form a closed loop control during processing.
基金Funded by a grant from the Key Technologies R & D Program of Guangzhou (No. 2004440003110013)
文摘This paper presents an innovative approach to reusing waste tile granules(TG) and ceramic polishing powder(PP) to produce high performance ceramic tiles.We studied formulations each with a TG mass fraction of 25.0% and a different PP mass fraction between 1.0% and 7.0%.The formulations included a small amount of borax additive of a mass fracton between 0.2% and 1.2%.The effects of these industrial by-products on compressive strength,water absorption and microstructure of the new ceramic tiles were investigated.The results indicate that the compressive strength decreases and water absorption increases when TG with a mass fraction of 25.0% are added.Improvement of the compressive strength may be achieved when TG(up to 25.0%) and PP(up to 2.0%) are both used at the same time.In particular,the compressive strength improvement can be maximized and water absorption reduced when a borax additive of up to 0.5% is used as a flux.Scanning electron microscopy reveals that a certain amount of fine PP granules and a high content of fluxing oxides from borax avail the formation of glassy phase that fills up the pores in the new ceramic tiles,resulting in a dense product with high compressive strength and low water absorption.
文摘This paper mainly focuses on the influence of colloidal silica polishing on the damage performance of fused silica optics. In this paper, nanometer sized colloidal silica and micron sized ceria are used to polish fused silica optics. The colloidal silica polished samples and ceria polished samples exhibit that the root-mean-squared （RMS） average surface roughness values are 0.7 nm and 1.0 rim, respectively. The subsurface defects and damage performance of the polished optics are analyzed and discussed. It is revealed that colloidal silica polishing will introduce much fewer absorptive con- taminant elements and subsurface damages especially no trailing indentation fracture. The 355-nm laser damage test reveals that each of the fused silica samples polished with colloidal silica has a much higher damage threshold and lower damage density than ceria polished samples. Colloidal silica polishing is potential in manufacturing high power laser optics.
基金Project supported by the National Major Scientific and Technological Special Project during the Twelfth Five-year Plan Period of China(Grant No.2009ZX02030-1)the National Natural Science Foundation of China(Grant No.51205387)+1 种基金the Support by Science and Technology Commission of Shanghai City,China(Grant No.11nm0500300)the Science and Technology Commission of Shanghai City,China(Grant No.14XD1425300)
文摘Metal Ti and its alloys have been widely utilized in the fields of aviation, medical science, and micro-electromechanical systems, for its excellent specific strength, resistance to corrosion, and biological compatibility. As the application of Ti moves to the micro or nano scale, however, traditional methods of planarization have shown their short slabs.Thus, we introduce the method of chemical mechanical polishing（CMP） to provide a new way for the nano-scale planarization method of Ti alloys. We obtain a mirror-like surface, whose flatness is of nano-scale, via the CMP method. We test the basic mechanical behavior of Ti–6Al–4V（Ti64） in the CMP process, and optimize the composition of CMP slurry.Furthermore, the possible reactions that may take place in the CMP process have been studied by electrochemical methods combined with x-ray photoelectron spectroscopy（XPS）. An equivalent circuit has been built to interpret the dynamic of oxidation. Finally, a model has been established to explain the synergy of chemical and mechanical effects in the CMP of Ti–6Al–4V.
基金Supported by the National Major Scientific and Technological Special Project during the Twelfth Five-year Plan Period under Grant No 2011ZX02704the National Natural Science Foundation of China under Grant No 51205387the Science and Technology Commission of Shanghai under Grant Nos llnm0500300 and 14XD1425300
文摘Effects of abrasive concentration on material removal rate CMRR） and surtace quality m the chemical mecnamcal polishing （CMP） of light-emitting diode sapphire substrates are investigated. Experimental results show that the MRR increases linearly with the abrasive concentration, while the rms roughness decreases with the increasing abrasive concentration. In addition, the in situ coefficient of friction （COF） is also conducted during the sapphire polishing process. The results present that COF increases sharply with the abrasive concentration up to 20 wt% and then shows a slight decrease from 20wt% to 40wt%. Temperature is a product of the friction force that is proportional to COF, which is an indicator for the mechanism of the sapphire CMP.
基金Funded by the Science and Technology Department of Zhejiang Province,China (No. 2005D60SA700351)
文摘To improve polishing quality and cope with the shortage of skilled workers for aluminum wheel-hub surface polishing, an automatic surface polishing system with hierarchical control based on the teaching-playback method was presented. Multi-axis cutter location data (CL data) were generated with the teaching method. First, a helical tool path and a flexible polishing tool were adopted to achieve high quality and high efficiency; next, the initial irregular data were processed into continuous polishing CL data. The important factor affecting polishing quality, namely the interpolation cycle in the multi-axis CL data was calculated based on a constant removal rate. Results from polishing experiments show that the quality of automatic machine polishing is better and stabler than manual polishing.
基金The authors are thankful to Rice Research Centres of Anantnag and Kupwara,J&K for helping us in getting paddy.
文摘The present investigation was aimed to study functional properties,antioxidant activity and in-vitro digestibility characteristics of brown and polished flours obtained from four rice cultivars(SR-4,K-39,Mushq Budij and Zhag)of Kashmir.Brown rice flours had higher total dietary fibre(3.08%-3.68%),oil absorption(116.0%-139.0%),emulsion capacity(4.78%-9.52%),emulsion stability(87.46%-99.93%)and resistant starch content(6.80%-9.00%)than polished flours.However,polished flours presented greater water absorption(102.0%-122.0%),foaming capacity(8.00%-13.63%),apparent amylose(19.16%-22.62%),peak(2260.0-2408.0 cP),trough(1372.0-1589.0 cP)and breakdown(714.0-978.0 cP)viscosities than their brown counterparts.Brown rice flours depicted highest total phenolic content(4.40-6.40 mg GAE/g)and inhibition of lipid peroxidation(19.50%-33.20%).However,equilibrium starch hydrolysis percentage(C∞)and predicted glycemic index of brown rice flours were lower than their polished counterparts.Among rice cultivars,brown Zhag flour had the highest total dietary fibre(3.68%),emulsion capacity(9.52%),emulsion stability(99.93%),resistant starch(9.00%),DPPH radical scavenging activity(85.45%)and inhibition of lipid peroxidation(33.20%),respectively.Emulsion capacity and emulsion stability were positively correlated with protein content of rice flours.However,peak,trough,breakdown and setback viscosities were negatively correlated with protein and fat contents of rice flour.The present investigation will be helpful in identifying nutritive role of rice flours from studied cultivars in human diet.
基金supported by the National Natural Science Foundation of China under Grant No. 10776009 and 60877044Science and Technology Projects of Guangzhou Province, China under Grant No. 2007Z2-D0091Natural Science Foundation of Guangdong Province under Grant No. 7300084.
文摘The performance of optical power transmission through a side-polished fiber on which materials of different refractive indices were overlaid is investigated. The experiments show that the transmitted optical power through the side-polished fiber varies with the refractive index of the overlaid material. The result of our experiments fits well the theoretical calculation. Side-polished fiber manufactured by wheel polishing method can be used not only to control optical power transmission through the fiber core but also as a refractive index sensor.
文摘Laser-induced damage in fused silica optics greatly restricts the performances of laser facilities. Gray haze damage,which is always initiated on ceria polished optics, is one of the most important damage morphologies in fused silica optics.In this paper, the laser-induced gray haze damages of four fused silica samples polished with CeO2, Al2O3, ZrO2, and colloidal silica slurries are investigated. Four samples all present gray haze damages with much different damage densities.Then, the polishing-induced contaminant and subsurface damages in four samples are analyzed. The results reveal that the gray haze damages could be initiated on the samples without Ce contaminant and are inclined to show a tight correlation with the shallow subsurface damages.
基金National Natural Science Foundation of China(No.50572075)
文摘Chemically vapor deposited diamond films were etched at different parameters using oxygen plasma produced by a DC （direct current） glow discharge and then polished by a modified mechanical polishing device. Scanning electron microscope, atomic force microscope and Raman spectrometer were used to evaluate the surface states of diamond films before and after polishing. It was found that a moderate plasma etching would produce a lot of etch pits and amorphous carbon on the top surface of diamond film. As a result, the quality and the efficiency of mechanical polishing have been enhanced remarkably.
基金supported by the Center for Advanced Materials Processing (CAMP) at Clarkson Universitythe National Integrate Circuit Research Program of China (Grant No. 2009ZX02023-3)+3 种基金the National Basic Research Program of China (GrantNos. 2007CB935400,2010CB934300 and 2006CB302700)the National High Technology Development Program of China (GrantNo. 2008AA031402)the Science and Technology Council of Shanghai,China (Grant Nos. 08DZ2200700,08JC1421700 and09QH1402600)the Chinese Academy of Sciences Visiting Professorship for Senior International Scientists
文摘We report on the investigation of the origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid. The oxide to nitride removal selectivity of the ceria slurry with picolinic acid is as high as 76.6 in the chemical mechanical polishing. By using zeta potential analyzer, particle size analyzer, horizon profilometer, thermogravimetric analysis and Fourier transform infrared spectroscopy, the pre- and the post-polished wafer surfaces as well as the pre- and the post-used ceria-based slurries are compared. Possible mechanism of high oxide to nitride selectivity with using ceria-based slurry with picolinic acid is discussed.
基金Project supported by the National Integrate Circuit Research Program of China(Grant Nos.2011ZX02704-002 and 2009ZX02030-001)the Funds fromthe Science and Technology Council of Shanghai,China(Grant Nos.0952nm00200 and 10QB1403600)the Chinese Academy of Sciences Visiting Professorship for Senior International Scientists
文摘The effect of iron trichloride （FeC13） on chemical mechanical polishing （CMP） of Ge2Sb2Te5 （GST） film is inves- tigated in this paper. The polishing rate of GST increases from 38 nm/min to 144 nm/min when the FeC13 concentration changes from 0.01 wt% to 0.15 wt%, which is much faster than 20 nm/min for the 1 wt% H2O2-based slurry. This polish- ing rate trends are inversely correlated with the contact angle data of FeCl3-based slurry on the GST film surface. Thus, it is hypothesized that the hydrophilicity of the GST film surface is associated with the polishing rate during CMP. Atomic force microscope （AFM） and optical microscope （OM） are used to characterize the surface quality after CMP. The chemical mechanism is studied by potentiodynamic measurements such as Ecorr and Icorr to analyze chemical reaction between FeCl3 and GST surface. Finally, it is verified that slurry with FeCl3 has no influence on the electrical property of the post-CMP GST film by the resistivity-temperature （RT） tests.
基金Supported by the National Integrate Circuit Research Program of China(2011ZX02704-002,2009ZX02030-001)the National Natural Science Foundation of China(51205387)Science and Technology Council of Shanghai(11nm0500300,10QB1403600).
文摘We investigate the effect of cations with different valences on the chemical mechanical polishing(CMP)of silicon dioxide films.The removal rate and surface roughness of the silicon-dioxide-film post-CMP are checked for the silica-based slurry with different cation salts(NaCl,CaCl_(2),AlCl_(3)).Meanwhile,the particle size and size distribution of the slurries are characterized to test their lifetimes.The result shows that the three kinds of salts can improve the polishing removal rate from around 20nm/min to 120nm/min without affecting the surface roughness when the polishing slurry is stable.With increasing valence of cations,the polishing slurry requires less cation concentration to be added to improve the removal rate,while keeping a superior surface topography and maintaining a longer lifetime as well.
文摘We report the latest research development of vertical buffered electropolishing on its post-treatment procedure as well as the effects of several major post-treatment techniques for buffered electropolishing(BEP)processed 1.5 GHz niobium(Nb)superconducting radio frequency(SRF)cavities.With the established post-treatment procedure,an accelerating gradient of 28.4MV/m is obtained on a single cell cavity of the cebaf shape.This is the best result in the history of BEP development.The cavity is limited by quench with a high quality factor over 1.2×1010 at the quench point.Analyses from optical inspection and temperature-mapping show that the quench should be originated from the pits that were already present on the cavity before this BEP treatment.All of these factors indicate that this procedure will have a great potential to produce better results if cavities without intrinsic performance limiting imperfections are used.
