A nano-structured surface is formed on the pyramid structure of n-type silicon solar cells by size-controlled silver nano-particle assisted etching. Such a nano-structure creates a front average weighted reflectance o...A nano-structured surface is formed on the pyramid structure of n-type silicon solar cells by size-controlled silver nano-particle assisted etching. Such a nano-structure creates a front average weighted reflectance of less than 2.5% in the 300-1200nm range due to the broadband reflection suppression. The sodium hydroxide is used to obtain the low-area surface by post-etching the nano-structure, thus the severe carrier recombination associated with the nano-structured surface could be reduced. After emitter forming, screen printing and firing by means of the industrial fabrication protocol, an 18.3%-efficient nano-structured silicon solar cell with rear emitter is fabricated. The process of fabricating the solar cells matches well with industrial manufacture and shows promising prospects.展开更多
Back interface passivation reduces the back recombination of photogenerated electrons, whereas aggravates the blocking of hole transport towards back contact, which complicate the back interface engineering for ultrat...Back interface passivation reduces the back recombination of photogenerated electrons, whereas aggravates the blocking of hole transport towards back contact, which complicate the back interface engineering for ultrathin CIGSe solar cells with a Schottky back contact. In this work, theoretical explorations were conducted to study how the two contradictory electrical effects impact cell performance. For ultrathin CIGSe solar cells with a pronounced Schottky potential barrier(E_(h)> 0.2 eV), back interface passivation produces diverse performance evolution trends, which are highly dependent on cell structures and properties. Since a back Ga grading can screen the effect of reduced recombination of photogenerated electrons from back interface passivation, the hole blocking effect predominates and back interface passivation is not desirable. However, when the back Schottky diode merges with the main pn junction due to a reduced absorber thickness,the back potential barrier and the hole blocking effect is much reduced on this occasion. Consequently, cells exhibit the same efficiency evolution trend as ones with an Ohmic contact, where back interface passivation is always advantageous.The discoveries imply the complexity of back interface passivation and provide guidance to manipulate back interface for ultrathin CIGSe solar on TCOs with a pronounced Schottky back contact.展开更多
Interdigitated back contact silicon hetero-junction(IBC-SHJ) solar cells exhibit excellent performance owing to the IBC and SHJ structures.The front surface field(FSF) layer composed of electric field passivation and ...Interdigitated back contact silicon hetero-junction(IBC-SHJ) solar cells exhibit excellent performance owing to the IBC and SHJ structures.The front surface field(FSF) layer composed of electric field passivation and chemical passivation has been proved to play an important role in IBC-SHJ solar cells.The electric field passivated layer n^+-a-Si: H, an n-type Si alloy with carbon or oxygen in amorphous phase, is simulated in this study to investigate its effect on IBC-SHJ.It is indicated that the n^+-a-Si: H layer with wider band gap can reduce the light absorption on the front side efficaciously,which hinders the surface recombination of photo-generated carriers and thus contributes to the improvement of the short circuit current density Jsc.The highly doped n^+-a-Si: H can result in the remakable energy band bending, which makes it outstanding in the field passivation, while it makes little contribution to the chemical passivation.It is noteworthy that when the electric field intensity exceeds 1.3 × 10^5 V/cm, the efficiency decrease caused by the inferior chemical passivation is only 0.16%.In this study, the IBC-SHJ solar cell with a front n^+-a-Si: H field passivation layer is simulated, which shows the high efficiency of 26% in spite of the inferior chemical passivation on the front surface.展开更多
Atomic layer deposition(ALD)can synthesise materials with atomic-scale precision.The ability to tune the material composition,film thickness with excellent conformality,allow low-temperature processing,and in-situ rea...Atomic layer deposition(ALD)can synthesise materials with atomic-scale precision.The ability to tune the material composition,film thickness with excellent conformality,allow low-temperature processing,and in-situ real-time monitoring makes this technique very appealing for a wide range of applications.In this review,we focus on the application of ALD layers in a wide range of solar cells.We focus on industrial silicon,thin film,organic and quantum dot solar cells.It is shown that the merits of ALD have already been exploited in a wide range of solar cells at the lab scale and that ALD is already applied in high-volume manufacturing of silicon solar cells.展开更多
采用PC1D软件仿真分析钝化发射极及背接触（passivation emitter and rear contact,PERC）电池;模拟结果表明：降低电池的背表面复合速率有利于增强电池性能、提高电池长波响应。PERC电池由于背表面钝化可采用较低的背场厚度;背钝化层...采用PC1D软件仿真分析钝化发射极及背接触（passivation emitter and rear contact,PERC）电池;模拟结果表明：降低电池的背表面复合速率有利于增强电池性能、提高电池长波响应。PERC电池由于背表面钝化可采用较低的背场厚度;背钝化层中的表面电荷对高背表面复合速率的电池性能的提升作用显著,但在背表面复合速率较低时影响不大;实测得到PERC电池比常规全铝背接触电池的开路电压和短路电流分别增大1.56%和2.56%。展开更多
基金Supported by the National Natural Science Foundation of China under Grant No 51532007the Major Projects of Zhejiang Province under Grant No 2013C01037the Foundation of State Key Lab of Silicon Materials
文摘A nano-structured surface is formed on the pyramid structure of n-type silicon solar cells by size-controlled silver nano-particle assisted etching. Such a nano-structure creates a front average weighted reflectance of less than 2.5% in the 300-1200nm range due to the broadband reflection suppression. The sodium hydroxide is used to obtain the low-area surface by post-etching the nano-structure, thus the severe carrier recombination associated with the nano-structured surface could be reduced. After emitter forming, screen printing and firing by means of the industrial fabrication protocol, an 18.3%-efficient nano-structured silicon solar cell with rear emitter is fabricated. The process of fabricating the solar cells matches well with industrial manufacture and shows promising prospects.
基金Project supported by the National Natural Science Foundation of China (Grant No. 51802240)。
文摘Back interface passivation reduces the back recombination of photogenerated electrons, whereas aggravates the blocking of hole transport towards back contact, which complicate the back interface engineering for ultrathin CIGSe solar cells with a Schottky back contact. In this work, theoretical explorations were conducted to study how the two contradictory electrical effects impact cell performance. For ultrathin CIGSe solar cells with a pronounced Schottky potential barrier(E_(h)> 0.2 eV), back interface passivation produces diverse performance evolution trends, which are highly dependent on cell structures and properties. Since a back Ga grading can screen the effect of reduced recombination of photogenerated electrons from back interface passivation, the hole blocking effect predominates and back interface passivation is not desirable. However, when the back Schottky diode merges with the main pn junction due to a reduced absorber thickness,the back potential barrier and the hole blocking effect is much reduced on this occasion. Consequently, cells exhibit the same efficiency evolution trend as ones with an Ohmic contact, where back interface passivation is always advantageous.The discoveries imply the complexity of back interface passivation and provide guidance to manipulate back interface for ultrathin CIGSe solar on TCOs with a pronounced Schottky back contact.
基金Project supported by the National Key Research Program of China(Grant Nos.2018YFB1500500 and 2018YFB1500200)the National Natural Science Foundation of China(Grant Nos.51602340,51702355,and 61674167)JKW Project,China(Grant No.31512060106)
文摘Interdigitated back contact silicon hetero-junction(IBC-SHJ) solar cells exhibit excellent performance owing to the IBC and SHJ structures.The front surface field(FSF) layer composed of electric field passivation and chemical passivation has been proved to play an important role in IBC-SHJ solar cells.The electric field passivated layer n^+-a-Si: H, an n-type Si alloy with carbon or oxygen in amorphous phase, is simulated in this study to investigate its effect on IBC-SHJ.It is indicated that the n^+-a-Si: H layer with wider band gap can reduce the light absorption on the front side efficaciously,which hinders the surface recombination of photo-generated carriers and thus contributes to the improvement of the short circuit current density Jsc.The highly doped n^+-a-Si: H can result in the remakable energy band bending, which makes it outstanding in the field passivation, while it makes little contribution to the chemical passivation.It is noteworthy that when the electric field intensity exceeds 1.3 × 10^5 V/cm, the efficiency decrease caused by the inferior chemical passivation is only 0.16%.In this study, the IBC-SHJ solar cell with a front n^+-a-Si: H field passivation layer is simulated, which shows the high efficiency of 26% in spite of the inferior chemical passivation on the front surface.
基金Australian Renewable Energy Agency(ARENA)as part of ARENA's Research and Development Program–Solar PV Research(Grant 2017/RND007)the Qatar National Research Fund(a member of Qatar Foundation,NPRP Grant#NPRP9-021-009).
文摘Atomic layer deposition(ALD)can synthesise materials with atomic-scale precision.The ability to tune the material composition,film thickness with excellent conformality,allow low-temperature processing,and in-situ real-time monitoring makes this technique very appealing for a wide range of applications.In this review,we focus on the application of ALD layers in a wide range of solar cells.We focus on industrial silicon,thin film,organic and quantum dot solar cells.It is shown that the merits of ALD have already been exploited in a wide range of solar cells at the lab scale and that ALD is already applied in high-volume manufacturing of silicon solar cells.
文摘采用PC1D软件仿真分析钝化发射极及背接触（passivation emitter and rear contact,PERC）电池;模拟结果表明：降低电池的背表面复合速率有利于增强电池性能、提高电池长波响应。PERC电池由于背表面钝化可采用较低的背场厚度;背钝化层中的表面电荷对高背表面复合速率的电池性能的提升作用显著,但在背表面复合速率较低时影响不大;实测得到PERC电池比常规全铝背接触电池的开路电压和短路电流分别增大1.56%和2.56%。
