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Synchrotron Radiation Lithography and MEMS Technique at NSRL 被引量:1
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作者 LIU Gang, TIAN Yang chao (National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, 230029, China) 《光学精密工程》 EI CAS CSCD 2001年第5期455-457,共3页
Two beamlines and stations for soft X-ray lithography and hard X-ray lithography at NSRL are presented. Synchrotron radiation lithography (SRL) and mask techniques are developed, and the micro-electro-mechanical syste... Two beamlines and stations for soft X-ray lithography and hard X-ray lithography at NSRL are presented. Synchrotron radiation lithography (SRL) and mask techniques are developed, and the micro-electro-mechanical systems (MEMS) techniques are also investigated at NSRL. In this paper, some results based on SRL and MEMS techniques are reported, and sub-micron and high aspect ratio microstructures are given. Some micro-devices, such as microreactors are fabricated at NSRL. 展开更多
关键词 synchrotron radiation lithography (srl) MEMS MICROREACTORS
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同步辐射光刻技术
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作者 胡一贯 《量子电子学》 CSCD 1991年第3期291-297,共7页
同步辐射光刻有希望代替传统光刻技术,用于0.25μm以下图形的超精细加工。本文叙述了它的原理、相关技术的开发现状和工艺应用。
关键词 同步辐射 光刻 集成电路 微细加工
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