CaN-based heterostructures with an InAlCaN/AlCaN composite barrier on sapphire （0001） substrates are grown by a low-pressure metal organic chemical vapor deposition system. Compositions of the InAiGaN layer are dete...CaN-based heterostructures with an InAlCaN/AlCaN composite barrier on sapphire （0001） substrates are grown by a low-pressure metal organic chemical vapor deposition system. Compositions of the InAiGaN layer are determined by x-ray photoelectron spectroscopy, structure and crystal quality of the heterostruetures are identified by high resolution x-ray diffraction, surface morphology of the samples are examined by an atomic force microscope, and Hall effect and capacitance-voltage measurements are performed at room temperature to evaluate the electrical properties of heterostructures. The Al/In ratio of the InAlGaN layer is 4.43, which indicates that the InAlCaN quaternary layer is nearly lattice-matched to the CaN channel. Capacitance-voltage results show that there is no parasitic channel formed between the InAIGaN layer and the AlCaN layer. Compared with the InAl- CaN/CaN heterostructure, the electrical properties of the InAlCaN/AlGaN/GaN heterostructure are improved obviously. Influences of the thickness of the AlGaN layer on the electrical properties of the heterostructures are studied. With the optimal thickness of the AlGaN layer to be 5 nm, the 2DEG mobility, sheet density and the sheet resistance of the sample is 1889.61 cm2/V.s, 1.44 × 10^13 cm-2 and as low as 201.1 Ω/sq, respectively.展开更多
基金Supported by the National Science and Technology Major Project under Grant No 2013ZX02308-002the National Natural Science Foundation of China under Grant Nos 11435010,61474086 and 61334002
文摘CaN-based heterostructures with an InAlCaN/AlCaN composite barrier on sapphire （0001） substrates are grown by a low-pressure metal organic chemical vapor deposition system. Compositions of the InAiGaN layer are determined by x-ray photoelectron spectroscopy, structure and crystal quality of the heterostruetures are identified by high resolution x-ray diffraction, surface morphology of the samples are examined by an atomic force microscope, and Hall effect and capacitance-voltage measurements are performed at room temperature to evaluate the electrical properties of heterostructures. The Al/In ratio of the InAlGaN layer is 4.43, which indicates that the InAlCaN quaternary layer is nearly lattice-matched to the CaN channel. Capacitance-voltage results show that there is no parasitic channel formed between the InAIGaN layer and the AlCaN layer. Compared with the InAl- CaN/CaN heterostructure, the electrical properties of the InAlCaN/AlGaN/GaN heterostructure are improved obviously. Influences of the thickness of the AlGaN layer on the electrical properties of the heterostructures are studied. With the optimal thickness of the AlGaN layer to be 5 nm, the 2DEG mobility, sheet density and the sheet resistance of the sample is 1889.61 cm2/V.s, 1.44 × 10^13 cm-2 and as low as 201.1 Ω/sq, respectively.
