期刊文献+
共找到25,914篇文章
< 1 2 250 >
每页显示 20 50 100
Design and preliminary test of a 105/140 GHz dual-frequency MW-level gyrotron 被引量:3
1
作者 Linlin HU Dimin SUN +11 位作者 Qili HUANG Tingting ZHUO Guowu MA Yi JIANG Shenggang GONG Zaojin ZENG Zixing GUO Chaohai DU Fanhong LI Hongbin CHEN Fanbao MENG Hongge MA 《Plasma Science and Technology》 SCIE EI CAS CSCD 2022年第3期162-169,共8页
A dual-frequency(105/140 GHz)MW-level continuous-wave gyrotron was developed for fusion application at Institute of Applied Electronics,China Academy of Engineering Physics.This gyrotron employs a cylindrical cavity w... A dual-frequency(105/140 GHz)MW-level continuous-wave gyrotron was developed for fusion application at Institute of Applied Electronics,China Academy of Engineering Physics.This gyrotron employs a cylindrical cavity working in the TE18,7 mode at 105 GHz and the TE24,9 mode at 140 GHz.A triode magnetron injection gun and a built-in quasi-optical mode converter were designed to operate at these two frequencies.For the proof-test phase,the gyrotron was equipped with a single-disk boron nitride window to achieve radio frequency output with a power of~500 k W for a short-pulse duration.In the preliminary short-pulse proof-test in the first quarter of2021,the dual-frequency gyrotron achieved output powers of 300 k W at 105 GHz and 540 k W at140 GHz,respectively,under 5 Hz 1 ms continuous pulse-burst operations.Power upgrade and pulse-width extension were hampered by the limitation of the high-voltage power supply and output window.This gyrotron design was preliminarily validated. 展开更多
关键词 GYROTRON MEGAWATT plasma heating fusion application dual-frequency
在线阅读 下载PDF
Analytical Expressions of Dual-Frequency Plasma Diagnostic Theory 被引量:3
2
作者 程立 时家明 许波 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第1期37-39,共3页
Based on the fundamental ideas concerning microwave attenuation in plasma, we obtain a new expression of transmission attenuation of microwaves as a function of the incident wave frequency. And with reasonable hypothe... Based on the fundamental ideas concerning microwave attenuation in plasma, we obtain a new expression of transmission attenuation of microwaves as a function of the incident wave frequency. And with reasonable hypothesis, analytical forms of the electron density and the electron-neutral collision frequency are derived from the equations of the transmission attenuation of microwaves at two near frequencies. This method gives an effective and easy approach to diagnose the unmagnetized plasma. 展开更多
关键词 PLASMA diagnosis dual-frequency ATTENUATION electron density electron-neutral collision frequency
在线阅读 下载PDF
Optical feedback characteristics in a dual-frequency laser during laser cavity tuning 被引量:2
3
作者 刘刚 张书练 +1 位作者 李岩 朱钧 《Chinese Physics B》 SCIE EI CAS CSCD 2005年第10期1984-1989,共6页
The optical feedback characteristics in a Zeeman-birefringence dual-frequency laser are studied during the laser cavity tuning in three different kinds of optical feedback conditions: (i) only //-light is fed back;... The optical feedback characteristics in a Zeeman-birefringence dual-frequency laser are studied during the laser cavity tuning in three different kinds of optical feedback conditions: (i) only //-light is fed back; (ii) only ⊥-light is fed back; (iii) both lights are fed back. A compact displacement sensor is designed using the experimental result that there is a nearly 90 degrees phase delay between the two lights' cosine optical feedback signals when both lights are fed back into the laser cavity. The priority order that the two lights' intensity curves appear can be used for direction discrimination. The resolution of the displacement sensor is at least 79 rim, and the sensor can discriminate the target's moving direction easily. 展开更多
关键词 dual-frequency laser optical feedback SELF-MIXING displacement sensor
在线阅读 下载PDF
Difference-frequency ultrasound generation from microbubbles under dual-frequency excitation 被引量:1
4
作者 马青玉 邱媛媛 +2 位作者 黄蓓 章东 龚秀芬 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第9期437-442,共6页
The difference-frequency (DF) ultrasound generated by using parametric effect promises to improve detection depth owing to its low attenuation, which is beneficial for deep tissue imaging. With ultrasound contrast a... The difference-frequency (DF) ultrasound generated by using parametric effect promises to improve detection depth owing to its low attenuation, which is beneficial for deep tissue imaging. With ultrasound contrast agents infusion, the harmonic components scattered from the microbubbles, including DF, can be generated due to the nonlinear vibration. A theoretical study on the DF generation from microbubbles under the dual-frequency excitation is proposed in formula based on the solution of the RPNNP equation. The optimisation of the DF generation is discussed associated with the applied acoustic pressure, frequency, and the microbubble size. Experiments are performed to validate the theoretical predictions by using a dual-frequency signal to excite microbubbles. Both the numerical and experimental results demonstrate that the optimised DF ultrasound can be achieved as the difference frequency is close to the resonance frequency of the microbubble and improve the contrast-to-tissue ratio in imaging. 展开更多
关键词 difference-frequency MICROBUBBLE dual-frequency excitation parametric effect
在线阅读 下载PDF
Effect of Low-frequency Power on F, CF_2 Relative Density and F/CF_2 Ratio in Fluorocarbon Dual-Frequency Plasmas 被引量:1
5
作者 黄宏伟 叶超 +3 位作者 徐轶君 袁圆 施国峰 宁兆元 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第5期566-570,共5页
Effect of low-frequency power on F, CF2 relative density and F/CF2 ratio, in C2F6, C4F8 and CHF3 dual-frequency capacitively couple discharge driven by the power of 13.56 MHz/2 MHz, was investigated by using optical e... Effect of low-frequency power on F, CF2 relative density and F/CF2 ratio, in C2F6, C4F8 and CHF3 dual-frequency capacitively couple discharge driven by the power of 13.56 MHz/2 MHz, was investigated by using optical emission spectroscopy. High F, CF2 relative density and high F/CF2 ratio were obtained in a CHF3 plasma. But for C2F6 and C4Fs plasmas, the F, CF2 relative density and F/CF2 ratio all decreased significantly due to the difference in both reactive paths and reactive energy. The increase of LF power caused simultaneous increase of F and CF2 radical relative densities in C4Fs and CHF3 plasmas, but led to increase of F with the decrease in CF2 relative densities in C2F6 plasma due to the increase of lower energy electrons and the decrease of higher energy electrons in electron energy distribution function (EEDF). 展开更多
关键词 fluorocarbon plasma dual-frequency discharge low-k films etching
在线阅读 下载PDF
Improved Double-Probe Technique for Spatially Resolved Diagnosis of Dual-Frequency Capacitive Plasmas 被引量:1
6
作者 陆文琪 蒋相站 +6 位作者 刘永新 杨烁 张权治 李小松 徐勇 朱爱民 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2013年第6期511-515,共5页
The conventional double-probe technique was improved with a combination of selfpowering and radio-frequency(RF) choking.RF perturbations in dual-frequency capacitively coupled discharge were effectively eliminated,a... The conventional double-probe technique was improved with a combination of selfpowering and radio-frequency(RF) choking.RF perturbations in dual-frequency capacitively coupled discharge were effectively eliminated,as judged by the disappearance of self-bias on the probes.The improved technique was tested by spatially resolved measurements of the electron temperature and ion density in both the axial and radial directions of a dual-frequency capacitive plasma.The measured data in the axial direction were compared with simulation results,and they were excellently consistent with each other.The measured radial distributions of the ion density and electron temperature were influenced significantly by the lower frequency(LF) power.It was shown that superposition of the lower frequency to the higher frequency(HF) power shifted the maximum ion density from the radial center to the edge region,while the trend for the electron temperature profile was the opposite.The changing feature of the ion density distribution is qualitatively consistent with that of the optical emission intensity reported. 展开更多
关键词 dual-frequency capacitive plasma double probe plasma diagnosis
在线阅读 下载PDF
Investigation of Capacitively Coupled Argon Plasma Driven by Dual-Frequency with Different Frequency Configurations 被引量:1
7
作者 虞一青 辛煜 +1 位作者 陆文琪 宁兆元 《Plasma Science and Technology》 SCIE EI CAS CSCD 2011年第5期571-574,共4页
Low pressure argon dual-frequency (DF) capacitively coupled plasma (CCP) is generated by using different frequency configurations, such as 13.56/2, 27/2, 41/2, and 60/2 MHz. Characteristics of the plasma are inves... Low pressure argon dual-frequency (DF) capacitively coupled plasma (CCP) is generated by using different frequency configurations, such as 13.56/2, 27/2, 41/2, and 60/2 MHz. Characteristics of the plasma are investigated by using a floating double electrical probe and optical emission spectroscopy (OES). It is shown that in the DF-CCPs, the electron temperature Te decreases with the increase in exciting frequency, while the onset of 2 MHz induces a sudden increase in Te and the electron density increases basically with the increase in low frequency (LF) power. The intensity of 750.4 nm emission line increases with the LF power in the case of 13.56/2 MHz, while different tendencies of line intensity with the LF power appear for other configurations. The reason for this is also discussed. 展开更多
关键词 dual-frequency capacitively coupled plasma double probe optical emission spectroscopy
在线阅读 下载PDF
Effect of Discharge Parameters on Properties of Diamond-Like Carbon Films Prepared by Dual-Frequency Capacitively Coupled Plasma Source 被引量:1
8
作者 杨磊 辛煜 +2 位作者 徐海鹏 虞一青 宁兆元 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第1期53-58,共6页
Diamond-like carbon (DLC) films were prepared with CH4-Ar using a capacitively coupled plasma enhanced chemical vapor deposition (CCP-CVD) method driven by dual-frequency of 41 MHz and 13.56 MHz in combination. Du... Diamond-like carbon (DLC) films were prepared with CH4-Ar using a capacitively coupled plasma enhanced chemical vapor deposition (CCP-CVD) method driven by dual-frequency of 41 MHz and 13.56 MHz in combination. Due to a coupling via bulk plasma, the self-bias voltage depended not only on the radiofrequency (RF) power of the corresponding electrode but also on another RF power of the counter electrode. The influence of the discharge parameters on the deposition rate, optical and Raman properties of the deposited films was investigated. The optical band decreased basically with the increase in the input power of both the low frequency and high frequency. Raman measurements show that the deposited films have a maximal sp3 content with an applied negative self-bias voltage of -150 V, while high frequency power causes a continuous increase in the sp3 content. The measurement of atomic force microscope (AFM) shows that the surface of the deposited films under ion-bombardment becomes smoother than those with non-intended self-bias voltage. 展开更多
关键词 dual-frequency capacitively coupled discharge DLC Raman spectroscopy
在线阅读 下载PDF
Deposition of organosilicone thin film from hexamethyldisiloxane(HMDSO)with 50kHz/33MHz dual-frequency atmospheric-pressure plasma jet 被引量:1
9
作者 李娇娇 袁强华 +3 位作者 常小伟 王勇 殷桂琴 董晨钟 《Plasma Science and Technology》 SCIE EI CAS CSCD 2017年第4期92-98,共7页
The deposition of organosilicone thin films from hexamethyldisiloxane(HMDSO) by using a dual-frequency (50 kHz/33 MHz) atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was ... The deposition of organosilicone thin films from hexamethyldisiloxane(HMDSO) by using a dual-frequency (50 kHz/33 MHz) atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was investigated.The topography was measured by using scanning electron microscopy.The chemical bond and composition of these films were analyzed by Fourier transform infrared spectroscopy (FTIR) and x-ray photoelectron spectroscopy.The results indicated that the as-deposited film was constituted by silicon,carbon,and oxygen elements,and FTIR suggested the films are organosilicon with the organic component (-CHx) and hydroxyl functional group(-OH) connected to the Si-O-Si backbone.Thin-film hardness was recorded by an MH-5-VM Digital Micro-Hardness Tester.Radio frequency power had a strong impact on film hardness and the hardness increased with increasing power. 展开更多
关键词 organosilicone thin film HEXAMETHYLDISILOXANE dual-frequency atmospheric-pressureplasma jet
在线阅读 下载PDF
Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C4F8/Ar Dual-Frequency Capacitively Coupled Plasma 被引量:1
10
作者 XU Yijun WU Xuemei YE Chao 《Plasma Science and Technology》 SCIE EI CAS CSCD 2013年第10期1066-1070,共5页
Dry etching of 6H silicon carbide (6H-SiC) wafers in a C4Fs/Ar dual-frequency capacitively coupled plasma (DF-CCP) was investigated. Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) wer... Dry etching of 6H silicon carbide (6H-SiC) wafers in a C4Fs/Ar dual-frequency capacitively coupled plasma (DF-CCP) was investigated. Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) were used to measure the SiC surface structure and compositions, respectively. Optical emission spectroscopy (OES) was used to measure the relative concentration of F radicals in the plasma. It was found that the roughness of the etched SiC surface and the etching rate are directly related to the power of low-frequency (LF) source. At lower LF power, a smaller surface roughness and a lower etching rate are obtained due to weak bombardment of low energy ions on the SiC wafers. At higher LF power the etching rate can be efficiently increased, but the surface roughness increases too. Compared with other plasma dry etching methods, the DF-CCP can effectively inhibit CχFγ films' deposition, and reduce surface residues. 展开更多
关键词 SIC plasma etching dual-frequency capacitively coupled plasma X-ray photoelectron spectroscopy optical emission spectroscopy
在线阅读 下载PDF
Effects of HF frequency on plasma characteristics in dual-frequency helium discharge at atmospheric pressure by fluid modeling
11
作者 Yinan WANG Shuaixing LI +3 位作者 Li WANG Ying JIN Yanhua ZHANG Yue LIU 《Plasma Science and Technology》 SCIE EI CAS CSCD 2018年第11期76-83,共8页
On the basis of the fluid theory and the drift-diffusion approximation, a numerical model for dual-frequency atmospheric pressure helium discharge is established, in order to investigate the effects of the high freque... On the basis of the fluid theory and the drift-diffusion approximation, a numerical model for dual-frequency atmospheric pressure helium discharge is established, in order to investigate the effects of the high frequency source (HF) on the characteristics of dual-frequency atmospheric pressure helium discharge. The numerical results showed that the electron heating rate increases with enhancing HF frequency, as well as the particles densities, electron dissipation rate, current density, net electron generation and bulk plasma region. Moreover, it is also observed that the efficient electron heating region moves when the HF frequency has been changed. The plasma parameters are not linear change with the HF frequency linearly increasing. 展开更多
关键词 dual-frequency numerical study electron energy mechanisms
在线阅读 下载PDF
Simulation of Capacitively Coupled Dual-Frequency N_2,O_2,N_2/O_2 Discharges:Effects of External Parameters on Plasma Characteristics
12
作者 尤左伟 戴忠玲 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2014年第4期335-343,共9页
A one-dimensional fluid model is adopted to simulate the characteristics of N2, O2, and N2/O2 dual-frequency (DF) capacitively coupled plasmas (CCPs) under typical conditions in PECVD technologies. Not only the gr... A one-dimensional fluid model is adopted to simulate the characteristics of N2, O2, and N2/O2 dual-frequency (DF) capacitively coupled plasmas (CCPs) under typical conditions in PECVD technologies. Not only the ground, the excited states but also the vibration levels of the main species are considered. The study focuses on the influence of external parameters such as matching of the high-frequency (HF) and low-frequency (LF), HF and LF of the voltage sources, as well as discharge pressures, on physical characteristics of discharges. The results show that the decoupling of the two sources is possible by increasing the applied HF, the electron density and ion flux are determined only by the HF of the voltage source, whereas the LF has a little influence on the plasma characteristics. In addition, the matching of frequency affects the characteristics of discharges to some extent. Fhrthermore, the pressure is a main external parameter affecting the characteristics of discharges, and a small amount of oxygen in N2 plasma can efficiently increase N+ ion flux incident onto the electrode and the density of N atom. 展开更多
关键词 CCP dual-frequency fluid model N2 discharge O2 discharge
在线阅读 下载PDF
C_2F_6 /O_2 /Ar Plasma Chemistry of 60 MHz/2 MHz Dual-Frequency Discharge and Its Effect on Etching of SiCOH Low-k Film
13
作者 袁颖 叶超 +6 位作者 陈天 葛水兵 刘卉敏 崔进 徐轶君 邓艳红 宁兆元 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第1期48-53,共6页
This work investigated C2F6/O2/Ar plasma chemistry and its effect on the etching characteristics of SiCOH low-k dielectrics in 60 MHz/2 MHz dual-frequency capacitively coupled discharge. For the C2F6/Ar plasma, the in... This work investigated C2F6/O2/Ar plasma chemistry and its effect on the etching characteristics of SiCOH low-k dielectrics in 60 MHz/2 MHz dual-frequency capacitively coupled discharge. For the C2F6/Ar plasma, the increase in the low-frequency (LF) power led to an increased ion impact, prompting the dissociation of C2F6 with higher reaction energy. As a result, fluorocarbon radicals with a high F/C ratio decreased. The increase in the discharge pressure led to a decrease in the electron temperature, resulting in the decrease of C2F6 dissociation. For the C2F6/O2/Ar plasma, the increase in the LF power prompted the reaction between 02 and C2F6, resulting in the elimination of CF3 and CF2 radicals, and the production of an F-rich plasma environment. The F-rich plasma improved the etching characteristics of SiCOH low-k films, leading to a high etching rate and a smooth etched surface. 展开更多
关键词 fluorocarbon plasma dual-frequency discharge low-k films etching
在线阅读 下载PDF
Surface defect gap solitons in one-dimensional dual-frequency lattices
14
作者 朱伟玲 罗莉 +1 位作者 何影记 汪河洲 《Chinese Physics B》 SCIE EI CAS CSCD 2009年第10期4319-4325,共7页
We study the surface defect gap solitons in an interface between a defect of one-dimensional dual-frequency lattices and the uniform media. Some unique properties are revealed that such lattices can broaden the region... We study the surface defect gap solitons in an interface between a defect of one-dimensional dual-frequency lattices and the uniform media. Some unique properties are revealed that such lattices can broaden the region of semi-finite gap, and the semi-finite gap exists not only in the positive and zero defects but also in the negative defect; unlike in the regular lattices, the semi-finite gap exists in the positive and zero defects but does not exist in the negative defect. In particular, stable solitons exist almost in the whole semi-finite gap for the positive and zero defects. These properties are different from other lattices with defects. In addition, it is found that the existence of surface dual-frequency lattice solitons does not need a threshold power. 展开更多
关键词 dual-frequency lattices surface defect gap solitons
在线阅读 下载PDF
Numerical study of converting beat-note signals of dual-frequency lasers to optical frequency combs by optical injection locking of semiconductor lasers
15
作者 Chenhao Liu Haoshu Jin +1 位作者 Hui Liu Jintao Bai 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第8期418-423,共6页
The optical injection locking of semiconductor lasers to dual-frequency lasers is studied by numerical simulations.The beat-note signals can be effectively transformed to optical frequency combs due to the effective f... The optical injection locking of semiconductor lasers to dual-frequency lasers is studied by numerical simulations.The beat-note signals can be effectively transformed to optical frequency combs due to the effective four wave-mixing in the active semiconductor gain medium. The low-noise Gaussian-like pulse can be obtained by locking the relaxation oscillation and compensating the gain asymmetry. The simulations suggest that pulse trains of width below 30 ps and repetition rate in GHz frequency can be generated simply by the optical injection locking of semiconductor lasers. Since the optical injection locking can broaden the spectrum and amplify the optical power simultaneously, it can be a good initial stage for generating optical frequency combs from dual-frequency lasers by multi-stage of spectral broadening in nonlinear waveguides. 展开更多
关键词 optical frequency combs optical injection locking dual-frequency lasers
在线阅读 下载PDF
Metal–Organic Gel Leading to Customized Magnetic‑Coupling Engineering in Carbon Aerogels for Excellent Radar Stealth and Thermal Insulation Performances 被引量:2
16
作者 Xin Li Ruizhe Hu +7 位作者 Zhiqiang Xiong Dan Wang Zhixia Zhang Chongbo Liu Xiaojun Zeng Dezhi Chen Renchao Che Xuliang Nie 《Nano-Micro Letters》 SCIE EI CSCD 2024年第3期36-52,共17页
Metal–organic gel(MOG)derived composites are promising multi-functional materials due to their alterable composition,identifiable chemical homogeneity,tunable shape,and porous structure.Herein,stable metal–organic h... Metal–organic gel(MOG)derived composites are promising multi-functional materials due to their alterable composition,identifiable chemical homogeneity,tunable shape,and porous structure.Herein,stable metal–organic hydrogels are prepared by regulating the complexation effect,solution polarity and curing speed.Meanwhile,collagen peptide is used to facilitate the fabrication of a porous aerogel with excellent physical properties as well as the homogeneous dispersion of magnetic particles during calcination.Subsequently,two kinds of heterometallic magnetic coupling systems are obtained through the application of Kirkendall effect.FeCo/nitrogen-doped carbon(NC)aerogel demonstrates an ultra-strong microwave absorption of−85 dB at an ultra-low loading of 5%.After reducing the time taken by atom shifting,a FeCo/Fe3O4/NC aerogel containing virus-shaped particles is obtained,which achieves an ultra-broad absorption of 7.44 GHz at an ultra-thin thickness of 1.59 mm due to the coupling effect offered by dual-soft-magnetic particles.Furthermore,both aerogels show excellent thermal insulation property,and their outstanding radar stealth performances in J-20 aircraft are confirmed by computer simulation technology.The formation mechanism of MOG is also discussed along with the thermal insulation and electromagnetic wave absorption mechanism of the aerogels,which will enable the development and application of novel and lightweight stealth coatings. 展开更多
关键词 Metal-organic gels Heterometallic magnetic coupling radar stealth Thermal insulation Computer simulation technology
在线阅读 下载PDF
Optimization of Nonlinear Energy Sink for Vibration Suppression of Systems Under Dual-Frequency Excitation
17
作者 Sun Bin Wu Zhiqiang 《Transactions of Nanjing University of Aeronautics and Astronautics》 EI CSCD 2018年第6期986-991,共6页
Aiming to decrease the vibration of wing induced by dual-rotor civil turbofan engines,the dynamic models of a single-degree of freedom (DOF) linear main oscillator coupled with single-DOF and two-DOF nonlinear energy ... Aiming to decrease the vibration of wing induced by dual-rotor civil turbofan engines,the dynamic models of a single-degree of freedom (DOF) linear main oscillator coupled with single-DOF and two-DOF nonlinear energy sink (NES) are established.According to the related energy criteria for the optimization of the dynamic vibration absorber,focusing on the effects of external excitation on the kinetic energy of the primary mass and total system energy,the vibration suppression effects of single-DOF,two-DOF serial and parallel NES on the main oscillator system are studied.Under the condition that the characteristic parameters of the main oscillator system and additional total mass of the vibration absorber remain unchanged,results show that the two-DOF parallel NES has the best vibration energy suppression effects,which can provide data reference for the optimal design of NES vibration suppression under dual-frequency excitation. 展开更多
关键词 nonlinear energy sink(NES) CIVIL TURBOFAN engine dual-frequency vibration suppression OPTIMIZATION
在线阅读 下载PDF
A new type of Wilkinson dual-frequency power divider with symmetrical transmission line stubs
18
作者 丁尧舜 DONG Gang YANG Yin-tang 《Journal of Chongqing University》 CAS 2014年第1期17-25,共9页
To realize equal power splitting at two arbitrary gigahertz-frequencies, this paper presents a new type of Wilkinson dual frequency power divider, consisting of three-section transmission lines and a series RLC(resist... To realize equal power splitting at two arbitrary gigahertz-frequencies, this paper presents a new type of Wilkinson dual frequency power divider, consisting of three-section transmission lines and a series RLC(resistor, inductor and capacitor)circuit. By equating the [ABCD] matrix of the proposed circuit to that of the quarter-wave impedance transformer, coupled with even/odd mode analyses, the design equations of the proposed network are derived. For verification, two dual-frequency power dividers with dual-band operating frequencies at 0.6 GHz and 3.0 GHz, and 3.8 GHz and 10 GHz respectively are designed and simulated. Simulation results show that the dual-band ratio of the proposed power divider can be as large as 5. Comparisons of the simulation results at X-band and S-band with different power dividers indicate that the proposed dual-band power divider performs better under the scenario of the upper operating frequency extending to X-band. 展开更多
关键词 dual-frequency symmetrical transmission line stubs power divider ARBITRARY
在线阅读 下载PDF
Deposition of Polymer Thin Film Using an Atmospheric Pressure Micro-Plasma Driven by Dual-Frequency Excitation
19
作者 王晓敏 袁强华 +2 位作者 周永杰 殷桂琴 董晨钟 《Plasma Science and Technology》 SCIE EI CAS CSCD 2014年第1期68-72,共5页
Polymer thin film deposition using an atmospheric pressure micro-plasma jet driven by dual-frequency excitations is described in this paper. The discharge process was operated with a mixture of argon (6 slm) and a s... Polymer thin film deposition using an atmospheric pressure micro-plasma jet driven by dual-frequency excitations is described in this paper. The discharge process was operated with a mixture of argon (6 slm) and a small amount of acetone (0-2100 ppm). Plasma composition was measured by optical emission spectroscopy (OES). In addition to a large number of Ar spectra lines, we observed some spectra of C, CN, CH and C2. Through changing acetone content mixed in argon, we found that the optimum discharge condition for deposition can be characterized by the maximum concentration of carbonaceous species. The deposited film was characterized by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FTIR) spectroscopy. The XPS indicated that the film was mostly composed of C with trace amount of O and N elements. The FTIR suggested different carbon-containing bonds (-CHx, C=O, C=C, C-O-C) presented in the deposited film. 展开更多
关键词 atmospheric pressure plasma dual-frequency excitation polymer thin film
在线阅读 下载PDF
Abnormal Enhancement of N_2^+ Emission Induced by Lower Frequency in N_2 Dual-Frequency Capacitively Coupled Plasmas
20
作者 虞一青 辛煜 +1 位作者 陆文琪 宁兆元 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第3期222-226,共5页
Nitrogen dual-frequency capacitively coupled plasmas (DF-CCPs) with different fre- quency configurations, i.e., 60/2 MHz and 60/13.56 MHz, are investigated by means of opticM emission spectroscopy (OES) and a floa... Nitrogen dual-frequency capacitively coupled plasmas (DF-CCPs) with different fre- quency configurations, i.e., 60/2 MHz and 60/13.56 MHz, are investigated by means of opticM emission spectroscopy (OES) and a floating double probe. The excited nitrogen molecule ion N+(B) is monitored by measuring the emission intensity of the (0,0) bandhead of the first neg- ative system (FNS) at 391.44 nm. It is shown that in the discharge with 60/13.56 MHz, the N+ emission intensity decreases with the increase in pressure. In the discharge with 60/2 MHz, however, an abnormal enhancement of N+ emission at higher pressure is observed when a higher power of 2 MHz is added. Variation in the ion density shows a similar dependence on the gas pressure. This indicates that in the discharge with 60/2 MHz there is a mode transition from the alpha to gamma type when a higher power of 2 MHz is added at high pressures. Combining the measurements using OES and double probe, the influence of low frequency on the discharge is investigated and the excitation route of the N+(B) state in the discharge of 60/2 MHz is also discussed. 展开更多
关键词 dual-frequency capacitively coupled plasma double probe optical emissionspectroscopy
在线阅读 下载PDF
上一页 1 2 250 下一页 到第
使用帮助 返回顶部