Titanium dioxide(TiO2) films were prepared by cone - jet mode electrospraying a titanium ethoxideprecursor solution onto a silicon substrate.The effects of spraying time,substrate temperature and aging on thesurface m...Titanium dioxide(TiO2) films were prepared by cone - jet mode electrospraying a titanium ethoxideprecursor solution onto a silicon substrate.The effects of spraying time,substrate temperature and aging on thesurface morphology of the films prepared were studied.Thin films obtained after spraying for 600 s were aged atroom temperature to form a porous TiO2 network with pores in the size range of 100 - 500 nm.Thicker filmswere prepared by spraying for 3 000 s,but these cracked on drying although it can be concluded that films pre-pared using a higher substrate temperature were denser.By this method,SiC coating was also prepared on anAl2O3 substrate using polysilane as a precursor.The result implies the potential of an industrial production ofdye sensitized solar cells by electrospraying technique.展开更多
The crystalline structure and surface morphology of TiO2 semiconductor coating play an important role in the conversion efficiency of dye-sensitized solar cells. In order to obtain TiO2 coating with controllable morph...The crystalline structure and surface morphology of TiO2 semiconductor coating play an important role in the conversion efficiency of dye-sensitized solar cells. In order to obtain TiO2 coating with controllable morphology and high porosity, nanoporous TiO2 films were fabricated on conducting glass （FTO） substrates, Ti thin films （1.5-2 gin） were deposited on conducting glass （FTO） substrates via the DC sputtering method, and then electrochemically anodized in NH4F/ethylene glycol solution. The crystalline structure and surface morphology of the samples were characterized by X-ray diffraction （XRD） and field emission scanning electron microscopy （FESEM）, respectively. The influences of anodizing potential, electrolyte composition, and pH value on the surface morphology of nanoporous TiO2 films were extensively studied. The growth mechanism of nanoporous TiO2 films was discussed by current density variations with anodizing time. The results demonstrate that nanoporous TiO2 films with high porosity and three-dimensional （3D） networks are observed at 30 V, when the NH4F concentration in ethylene glycol solution is 0.3% （mass fraction） and the electrolyte pH value is 5.0.展开更多
Preparation of TiO<sub>2</sub> thin films by MOCVD method is presented in this paper. A MOCVD system has been designed and built. A wide range of processing conditions are investigated to deposit TiO<su...Preparation of TiO<sub>2</sub> thin films by MOCVD method is presented in this paper. A MOCVD system has been designed and built. A wide range of processing conditions are investigated to deposit TiO<sub>2</sub> films on Si wafers starting from metal-organic precursor tetrabutyl titanate. Activation energy of the film formation （E） is obtained to be 23.6 kJ/mol. Structure of films is pure anatase when deposit temperatures are low, rutile forms at 700℃. The films also exhibit preferred crystallographic orientations which strongly depend on deposit conditions. Refractive index increases with increasing of film thickness and decreasing of deposit temperature.展开更多
基金supported by the Science Foun-dation of Educational Commission and Provincial Key Laboratory Program of Liaoning Province of China(Grant No.2008593 and CL-200902)~~
文摘Titanium dioxide(TiO2) films were prepared by cone - jet mode electrospraying a titanium ethoxideprecursor solution onto a silicon substrate.The effects of spraying time,substrate temperature and aging on thesurface morphology of the films prepared were studied.Thin films obtained after spraying for 600 s were aged atroom temperature to form a porous TiO2 network with pores in the size range of 100 - 500 nm.Thicker filmswere prepared by spraying for 3 000 s,but these cracked on drying although it can be concluded that films pre-pared using a higher substrate temperature were denser.By this method,SiC coating was also prepared on anAl2O3 substrate using polysilane as a precursor.The result implies the potential of an industrial production ofdye sensitized solar cells by electrospraying technique.
基金Projects(21171027,50872014) supported by the National Natural Science Foundation of ChinaProject(K1001020-11)supported by the Science and Technology Key Project of Changsha City,China
文摘The crystalline structure and surface morphology of TiO2 semiconductor coating play an important role in the conversion efficiency of dye-sensitized solar cells. In order to obtain TiO2 coating with controllable morphology and high porosity, nanoporous TiO2 films were fabricated on conducting glass （FTO） substrates, Ti thin films （1.5-2 gin） were deposited on conducting glass （FTO） substrates via the DC sputtering method, and then electrochemically anodized in NH4F/ethylene glycol solution. The crystalline structure and surface morphology of the samples were characterized by X-ray diffraction （XRD） and field emission scanning electron microscopy （FESEM）, respectively. The influences of anodizing potential, electrolyte composition, and pH value on the surface morphology of nanoporous TiO2 films were extensively studied. The growth mechanism of nanoporous TiO2 films was discussed by current density variations with anodizing time. The results demonstrate that nanoporous TiO2 films with high porosity and three-dimensional （3D） networks are observed at 30 V, when the NH4F concentration in ethylene glycol solution is 0.3% （mass fraction） and the electrolyte pH value is 5.0.
文摘Preparation of TiO<sub>2</sub> thin films by MOCVD method is presented in this paper. A MOCVD system has been designed and built. A wide range of processing conditions are investigated to deposit TiO<sub>2</sub> films on Si wafers starting from metal-organic precursor tetrabutyl titanate. Activation energy of the film formation （E） is obtained to be 23.6 kJ/mol. Structure of films is pure anatase when deposit temperatures are low, rutile forms at 700℃. The films also exhibit preferred crystallographic orientations which strongly depend on deposit conditions. Refractive index increases with increasing of film thickness and decreasing of deposit temperature.
