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Innovative surface modification strategy for ADN:PFOA-interlayered and vibrational magnetron sputtering for constructing anti-hygroscopic composite structures
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作者 Yinan Lyu Xiaoxia Ma +3 位作者 Xiaoting Ren Shuping Sun Lin Shi Li Yang 《Defence Technology(防务技术)》 2025年第10期295-305,共11页
Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulat... Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulation methods have struggled to address the problems of uneven coating and polarity mismatch.This research innovatively introduces perfluorooctanoic acid(PFOA)as a polar transition intermediate layer.Utilizing the polarity of one end of it to adsorb on the surface of ADN through hydrogen bonds,the problem of polarity mismatch is effectively overcome.Meanwhile,the vibrational magnetron sputtering process has been first applied in the energetic field,with a special vibrating abutment enhancing ADN particle fluidity to solve coating non-uniformity,thus preparing prilled ADN@PFOA@PTFE core-dual-shell composites.Performance tests reveal that this composite material possesses excellent hydrophobic and anti-hygroscopic properties.When left at 25℃and 75%RH for 3 days,moisture absorption was reduced by more than 90%compared to pure ADN.Simultaneously,its thermal stability,heat release performance,and combustion performance have been improved.The research achievements optimize the storage conditions of ADN in the application of rocket and missile propellants,providing solid support and broad development prospects for technological innovation in military fields. 展开更多
关键词 Ammonium dinitramide(ADN) Vibrational magnetron sputtering Core-dual-shell composites Hydrophobic Polarity matching
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Multifunctional hopeite nanocoating on Ti64 substrates by pulsed laser deposition and radio frequency magnetron sputtering for orthopedic implant applications:A comparative study 被引量:3
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作者 Ashish DAS Mukul SHUKLA 《Journal of Central South University》 SCIE EI CAS CSCD 2020年第8期2198-2209,共12页
Functionalized implants demonstrate an upgraded approach in orthopedic implants,aiming to achieve long term success through improved bio integration.Bioceramic coatings with multifunctionality have arisen as an effect... Functionalized implants demonstrate an upgraded approach in orthopedic implants,aiming to achieve long term success through improved bio integration.Bioceramic coatings with multifunctionality have arisen as an effective substitute for conventional coatings,owing to their combination of various properties that are essential for bio-implants,such as osteointegration and antibacterial character.In the present study,thin hopeite coatings were produced by Pulsed laser deposition(PLD)and radio frequency magnetron sputtering(RFMS)on Ti64 substrates.The obtained hopeite coatings were annealed at 500°C in ambient air and studied in terms of surface morphology,phase composition,surface roughness,adhesion strength,antibacterial efficacy,apatite forming ability,and surface wettability by scanning electron microscope(SEM),X-ray diffraction(XRD),atomic force microscope(AFM),tensometer,fluorescence-activated cell sorting(FACS),simulated body fluid(SBF)immersion test and contact angle goniometer,respectively.Furthermore,based on promising results obtained in the present work it can be summarized that the new generation multifunctional hopeite coating synthesized by two alternative new process routes of PLD and RFMS on Ti64 substrates,provides effective alternatives to conventional coatings,largely attributed to strong osteointegration and antibacterial character of deposited hopeite coating ensuring the overall stability of metallic orthopedic implants. 展开更多
关键词 hopeite Ti64 alloy pulsed laser deposition magnetron sputtering coating IMPLANT
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Photoluminescence properties of ZnO thin films prepared by DC magnetron sputtering 被引量:2
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作者 杨兵初 刘晓艳 +1 位作者 高飞 马学龙 《Journal of Central South University of Technology》 EI 2008年第4期449-453,共5页
ZnO thin films were prepared by direct current(DC)reactive magnetron sputtering under different oxygen partial pressures.And then the samples were annealed in vacuum at 450℃.The effects of the oxygen partial pressure... ZnO thin films were prepared by direct current(DC)reactive magnetron sputtering under different oxygen partial pressures.And then the samples were annealed in vacuum at 450℃.The effects of the oxygen partial pressures and the treatment of annealing in vacuum on the photoluminescence and the concentration of six intrinsic defects in ZnO thin films such as oxygen vacancy(VO),zinc vacancy(VZn),antisite oxygen(OZn),antisite zinc(ZnO),interstitial oxygen(Oi)and interstitial zinc(Zni)were studied.The results show that a green photoluminescence peak at 520 nm can be observed in all the samples,whose intensity increases with increasing oxygen partial pressure;for the sample annealed in vacuum,the intensity of the green peak increases as well.The green photoluminescence peak observed in ZnO may be attributed to zinc vacancy,which probably originates from transitions between electrons in the conduction band and zinc vacancy levels,or from transitions between electrons in zinc vacancy levels and up valence band. 展开更多
关键词 ZnO thin films PHOTOLUMINESCENCE zinc vacancy magnetron sputtering
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The Status Quo and Development Trend of High-purity Gold Sputtering Targets 被引量:1
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作者 YANG Anheng XIE Hongchao ZHU Yong 《贵金属》 CAS CSCD 北大核心 2012年第A01期173-176,共4页
This article gives a brief introduction to manufacturers and markets of sputtering targets as well as the manufacturing technology thereof. Then, it analyzes the application of high-purity gold sputtering targets in t... This article gives a brief introduction to manufacturers and markets of sputtering targets as well as the manufacturing technology thereof. Then, it analyzes the application of high-purity gold sputtering targets in the fields of integrated circuit, information storage, flat panel display, etc. Based on the above, the article analyzes the processing development trend for the high-purity gold sputtering targets in aspects of ultra-high purity, manufacturing technology, analysis and testing technologies. 展开更多
关键词 high-purity gold sputtering targets status quo development trend
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Effects of ratio of hydrogen flow on microstructure of hydrogenated microcrystalline silicon films deposited by magnetron sputtering at 100 ℃
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作者 WANG Lin-qing ZHOU Yong-tao +1 位作者 WANG Jun-jun LIU Xue-qin 《Journal of Central South University》 SCIE EI CAS CSCD 2019年第10期2661-2667,共7页
Hydrogenated microcrystalline silicon(μc-Si:H)films were prepared on glass and silicon substrates by radio frequency magnetron sputtering at 100°C using a mixture of argon(Ar)and hydrogen(H2)gasses as precursor ... Hydrogenated microcrystalline silicon(μc-Si:H)films were prepared on glass and silicon substrates by radio frequency magnetron sputtering at 100°C using a mixture of argon(Ar)and hydrogen(H2)gasses as precursor gas.The effects of the ratio of hydrogen flow(H2/(Ar+H2)%)on the microstructure were evaluated.Results show that the microstructure,bonding structure,and surface morphology of theμc-Si:H films can be tailored based on the ratio of hydrogen flow.An amorphous to crystalline phase transition occurred when the ratio of hydrogen flow increased up to 50%.The crystallinity increased and tended to stabilize with the increase in ratio of hydrogen flow from 40%to 70%.The surface roughness of thin films increased,and total hydrogen content decreased as the ratio of hydrogen flow increased.Allμc-Si:H films have a preferred(111)orientation,independent of the ratio of hydrogen flow.And theμc-Si:H films had a dense structure,which shows their excellent resistance to post-oxidation. 展开更多
关键词 hydrogenated microcrystalline silicon films radio frequency magnetron sputtering ratio of hydrogen flow low temperature MICROSTRUCTURE
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Effect of tantalum doping on the microstructure and photoelectrical properties of transparent conductive zinc oxide films
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作者 Kai Yi Hongxu Jiang +3 位作者 Yanbo Cai Guangwei Wang Fei Liu Deliang Wang 《中国科学技术大学学报》 北大核心 2025年第4期49-57,48,I0002,共11页
ZnO thin films with varying Ta concentrations were fabricated through magnetron sputtering.The crystallinity and surface morphology of the ZnO films are significantly influenced by the incorporation of Ta,as evidenced... ZnO thin films with varying Ta concentrations were fabricated through magnetron sputtering.The crystallinity and surface morphology of the ZnO films are significantly influenced by the incorporation of Ta,as evidenced by the X-ray diffraction and scanning electron microscopy results.The lattice constants,as determined by X-ray diffraction,contradict the disparity in Ta and Zn ion radii,which is attributed to the impact of interstitial defects.This inconsistency introduces variations in carrier concentration in this experiment compared with prior studies.Subsequent exploration of the luminescent characteristics and emission mechanism of defect levels in Ta-doped ZnO films was conducted through photoluminescence.Furthermore,the factors influencing the bandgap are discussed. 展开更多
关键词 tantalum-doped zinc oxide RF magnetron sputtering MICROSTRUCTURE PHOTOLUMINESCENCE
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Corrosion resistance of self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes Ti_(3)AlC_(2)coating deposited by magnetron sputtered on copper
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作者 WANG Guo-qing WANG Ning +5 位作者 HU Yi-teng WANG Jing GAO Chuan-hui WANG Jie XUE Jun-jie YAN Ke-xin 《Journal of Central South University》 2025年第3期867-881,共15页
Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines pla... Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines plasma-enhanced non-equilibrium magnetron sputtering physical vapor deposition(PEUMS-PVD)and anodization to construct a self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes/Ti_(3)AlC_(2)coating on the surface of Cu substrates.This novel strategy enhances the corrosion resistance of copper substrates in marine environments,with corrosion current densities of up to 4.5643×10^(−8)A/cm^(2).Among them,the doping of nano-aluminum particles makes the coating self-healing.The mechanistic analysis of the corrosion behaviors during early immersion experiments was conducted using electrochemical noise,and revealed that during the initial stages of coating immersion,uniform corrosion predominates,with a minor occurrence of localized corrosion. 展开更多
关键词 magnetron sputtering TiO_(2)nanotubes Ti_(3)AlC_(2)coating corrosion resistance performance
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Resistive Switching of BN-based Films Accompanied with the Modulation of Ferromagnetism
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作者 FAN Huan SHI Yana +2 位作者 LI Jiale ZHAO Juanjuan LI Xiaoli 《材料导报》 EI CAS CSCD 北大核心 2024年第S02期63-66,共4页
Nanostructured BN and BN-Co films with Cu,Co,Au as the top electrodes,and Pt as the bottom electrodes were grown by magnetron sputtering.Both BN samples and BN-Co ones show bipolar resistive switching behaviors.For th... Nanostructured BN and BN-Co films with Cu,Co,Au as the top electrodes,and Pt as the bottom electrodes were grown by magnetron sputtering.Both BN samples and BN-Co ones show bipolar resistive switching behaviors.For the sample with active Cu as the top electrode,the formation and rupture of metallic Cu conductive filaments can explain the resistive switching behavior;for the other samples,the generation and annihilation of nitrogen vacancies under the electric stimuli may contribute to the occurrence of resistive switching.Taking advantage of the formed and broken Co-N bonds during resistive switching,the saturation magnetization of the BN-Co films can be modulated.Thus,it investigated the resistive switching behavior of BN and BN-Co materials in this work.Similar to that of oxide materials,the resistive switching behaviors of the nitrides may be attributed to the movement of cations or anions within the dielectric or electrodes during the application of voltage.Additionally,ion migration may lead to the formation or breaking of Co-N bonds,which can effectively regulate the magnetism of BN-Co materials.This study extends resistive switching materials to nitrides,enabling the regulation of magnetism along with resistance changes,thus providing insights for the design of novel voltage-controlled magnetic devices and achieving multi-functionality. 展开更多
关键词 BN-based thin film magnetron sputtering resistive switching saturation magnetization
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Effect of substrate temperature and oxygen plasma treatment on the properties of magnetron-sputtered CdS for solar cell applications
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作者 Runxuan Zang Haolin Wang +9 位作者 Xiaoqi Peng Ke Li Yuehao Gu Yizhe Dong Zhihao Yan Zhiyuan Cai Huihui Gao Shuwei Sheng Rongfeng Tang Tao Chen 《中国科学技术大学学报》 CAS CSCD 北大核心 2024年第6期22-33,I0010,共13页
Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films h... Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films have emerged,among which magnetron sputtering(MS)is one of the most commonly used vacuum techniques.For this type of technique,the substrate temperature is one of the key deposition parameters that affects the interfacial properties between the target film and substrate,determining the specific growth habits of the films.Herein,the effect of substrate temperature on the microstructure and electrical properties of magnetron-sputtered CdS(MS-CdS)films was studied and applied for the first time in hydrothermally deposited antimony selenosulfide(Sb_(2)(S,Se)_(3))solar cells.Adjusting the substrate temperature not only results in the design of the flat and dense film with enhanced crystallinity but also leads to the formation of an energy level arrangement with a Sb_(2)(S,Se)_(3)layer that is more favorable for electron transfer.In addition,we developed an oxygen plasma treatment for CdS,reducing the parasitic absorption of the device and resulting in an increase in the short-circuit current density of the solar cell.This study demonstrates the feasibility of MS-CdS in the fabrication of hydrothermal Sb_(2)(S,Se)_(3)solar cells and provides interface optimization strategies to improve device performance. 展开更多
关键词 magnetron sputtering CDS substrate heating plasma treatment Sb_(2)(S Se)_(3) thin film solar cell
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高功率脉冲非平衡磁控溅射放电特性和参数研究 被引量:1
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作者 牟宗信 王春 +4 位作者 贾莉 牟晓东 藏海荣 刘冰冰 董闯 《核聚变与等离子体物理》 CAS CSCD 北大核心 2010年第4期365-369,共5页
用线圈电流控制非平衡磁场,用汤森放电击穿形成深度自触发放电,用磁阱捕获放电形成的二次电子和导致漂移电流,形成了高功率非平衡磁控溅射放电。采用偏压为-100V相对磁控靶放置的圆形平面电极收集饱和离子电流;在距离磁控靶14cm的位置由... 用线圈电流控制非平衡磁场,用汤森放电击穿形成深度自触发放电,用磁阱捕获放电形成的二次电子和导致漂移电流,形成了高功率非平衡磁控溅射放电。采用偏压为-100V相对磁控靶放置的圆形平面电极收集饱和离子电流;在距离磁控靶14cm的位置由Langmuir探针测量浮置电位;示波器测量磁控靶的脉冲电压、电流、浮置电位和饱和离子电流信号。装置的放电脉冲功率达到0.9MW,脉冲频率最大值为40Hz左右,空间电荷限制条件是控制电子电流和离子电流的主要机制。 展开更多
关键词 高功率脉冲 非平衡磁控溅射 放电特性 参数研究 magnetron sputtering high power discharge properties 离子电流 磁控靶 LANGMUIR探针 示波器测量 主要机制 形成深度 限制条件 脉冲频率 脉冲功率 脉冲电压 电流控制 空间电荷 浮置
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陶瓷靶射频磁控溅射TiO_2薄膜的制备和光催化特性(英文) 被引量:1
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作者 桑敏 刘发民 +2 位作者 丁芃 毋二省 王天民 《功能材料》 EI CAS CSCD 北大核心 2005年第7期1126-1130,共5页
本文采用Ti O2陶瓷靶及射频磁控溅射法在玻璃衬底上制备出了一系列透明Ti O2薄膜,利用X射线衍射(XRD)和原子力显微镜(AFM)对不同衬底温度和溅射功率的Ti O2薄膜结构和形貌进行了表征,结果随着溅射条件的不同会出现锐钛矿或锐钛矿-金红... 本文采用Ti O2陶瓷靶及射频磁控溅射法在玻璃衬底上制备出了一系列透明Ti O2薄膜,利用X射线衍射(XRD)和原子力显微镜(AFM)对不同衬底温度和溅射功率的Ti O2薄膜结构和形貌进行了表征,结果随着溅射条件的不同会出现锐钛矿或锐钛矿-金红石的混合相。利用UV-Vis-Nir分光光度计测得的透射光谱表明随着衬底温度和溅射功率的增加吸收边有一定的红移。薄膜的光催化活性通过对罗丹明B溶液的降解效率来表征,结果表明在550℃和130 W表面出最佳的光催化效果。 展开更多
关键词 TITANIA thin films RF MAGNETRON sputtering ceramic target PHOTOCATALYTIC activity
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Microstructure and magnetic properties of granularFePt/(FePt)_(27)Ti_(73) films for ultrahigh-density recording media 被引量:2
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作者 于红云 孙会元 +4 位作者 封顺珍 高凤菊 周鸿娟 聂向富 孙玉平 《Journal of Central South University of Technology》 2005年第2期155-158,共4页
FePt granular films were prepared by direct current facing-target magnetron sputtering system onto glass substrates and subsequently in-situ annealed in vacuum. Vibrating sample magnetometer, X-ray diffraction and sca... FePt granular films were prepared by direct current facing-target magnetron sputtering system onto glass substrates and subsequently in-situ annealed in vacuum. Vibrating sample magnetometer, X-ray diffraction and scanning probe microscope were applied to study the magnetic properties, microstructures, morphologies and domain structures of the samples. (FePt)27Ti73 bilayer films were fabricated at various conditions to investigate the effect of Ti on FePt grains. The results show that without Ti matrix layer, FePt films deposited onto the glass substrates are fcc disordered; with addition of Ti matrix layer, FePt/Ti films form a ternary (FePt)27Ti73 alloy possessing fcc and L10 (111) mixed texture. FePt/(FePt)27Ti73 films with perfectly ordered L10(111) structure and unique magnetic properties can be obtained at Ti thickness of 35nm and substrate temperature of 250℃. The maximum coercivity is more than 240kA/m and the squareness ratio is more than 0.9. The obtained results suggest that the granular FePt/(FePt)27Ti73 films can be applicable to ultrahigh-density magnetic recording media. 展开更多
关键词 FePt magnetic layer ordered L1_0 structure facing-target magnetron sputtering system magnetic (recording) media
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Fabrication of GaN films through reactive reconstruction of magnetron sputtered ZnO/Ga_2O_3 被引量:1
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作者 高海永 庄惠照 +5 位作者 薛成山 董志华 何建廷 刘亦安 吴玉新 田德恒 《Journal of Central South University of Technology》 SCIE EI CAS 2005年第1期9-12,共4页
A simple and easily operated technique was developed to fabricate GaN films. GaN films possessing hexagonal wurtzite structure were fabricated on Si(111) substrates with ZnO buffer layers through nitriding Ga2O3 films... A simple and easily operated technique was developed to fabricate GaN films. GaN films possessing hexagonal wurtzite structure were fabricated on Si(111) substrates with ZnO buffer layers through nitriding Ga2O3 films in the tube quartz furnace. ZnO buffer layers and Ga3O3 films were deposited on Si substrates in turn by using radio frequency magnetron sputtering system before the nitriding process. The structure and composition of GaN films were studied by X-ray diffraction, selected area electron diffraction and Fourier transform infrared spectrophotometer. The morphologies of GaN films were studied by scanning electron microscopy. The results show that ZnO buffer layer improves the crystalline quality and the surface morphology of the films relative to the films grown directly on silicon substrates. The measurement result of room-temperature photoluminescence spectrum indicates that the photoluminescence peaks locate at 365 nm and 422 nm. 展开更多
关键词 FABRICATION Ga2O3 film ZnO buffer layer radio frequency magnetron sputtering NITRIDING
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炭专业文献中的关键词—制备和过程
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作者 李峰 王茂章 《新型炭材料》 SCIE EI CAS CSCD 北大核心 2006年第2期143-143,共1页
关键词 专业文献 锻烧 石墨化 激光辐照 电弧放电 催化剂载体 sputtering 化学气相沉积 INFILTRATION 电化学处理
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炭专业文献中的关键词——制备和过程
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作者 李峰 王茂章 《新型炭材料》 SCIE EI CAS CSCD 北大核心 2011年第1期40-40,共1页
关键词 专业文献 石墨化 锻烧 激光辐照 电弧放电 催化剂载体 sputtering 化学气相沉积 INFILTRATION 电化学处理
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Optical and electrical properties of room temperature preparedα-IGZO thin films using an In_(2)Ga_(2)ZnO_(7) ceramic target
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作者 ZHANG Yu CHEN Jie +5 位作者 SUN Ben-shuang LIU Shuai WANG Zhi-jun LIU Shu-han SHU Yong-chun HE Ji-lin 《Journal of Central South University》 SCIE EI CAS CSCD 2022年第4期1062-1074,共13页
In this study,a high-purity In_(2)Ga_(2)ZnO_(7) ceramic target was used to deposit indium gallium zinc oxide(IGZO)films by RF magnetron sputtering technology.The microstructure,growth state,optical and electrical prop... In this study,a high-purity In_(2)Ga_(2)ZnO_(7) ceramic target was used to deposit indium gallium zinc oxide(IGZO)films by RF magnetron sputtering technology.The microstructure,growth state,optical and electrical properties of the IGZO films were studied.The results showed that the surface of the IGZO film was uniform and smooth at room temperature.As the substrate temperature increased,the surface roughness of the film gradually increased.From room temperature to 300℃,all the films maintained amorphous phase and good thermal stabilities.Moreover,the transmission in the visible region decreased from 91.93%to 91.08%,and the band gap slightly decreased from 3.79 to 3.76 eV.The characterization of the film via atomic force microscope(AFM)and X-ray photoelectron spectroscopy(XPS)demonstrated that the film prepared at room temperature exhibited the lowest surface roughness and the largest content of oxygen vacancies.With the rise in temperature,the non-homogeneous particle distribution,increase in the surface roughness,and reduction in the number of oxygen vacancies resulted in lower performance of theα-IGZO film.Comprehensive analysis showed that the best optical and electrical properties can be obtained by depositing IGZO films at room temperature,which indicates their potential applications in flexible substrates. 展开更多
关键词 oxide ceramic sputtering film microstructure photoelectric performance
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Local segregation in Cu-In precursors and its effects on microstructures of selenized CuInSe_2 thin films
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作者 方玲 张弓 +2 位作者 庄大明 赵明 吴敏生 《Journal of Central South University of Technology》 2005年第1期13-16,共4页
Local segregation in Cu-In precursors and its effects on the element distribution and microstructures of selenized CuInSe2 thin films were investigated. Cu-In precursors with an ideal total mole ratio of Cu to In of 0... Local segregation in Cu-In precursors and its effects on the element distribution and microstructures of selenized CuInSe2 thin films were investigated. Cu-In precursors with an ideal total mole ratio of Cu to In of 0.92 were prepared by middle frequency alternating current magnetron sputtering with Cu-In alloy target, then CuInSe2 absorbers for solar cells were formed by selenization process in selenium atmosphere. Scanning electron microscope and energy dispersive X-ray spectroscope were used respectively to observe the surface morphologies and determine the compositions of both Cu-In precursors and CuInSe2 thin films. Their microstructures were characterized by X-ray diffractometry and Raman spectroscope. The results show that Cu-In precursors are mainly composed of (Cu11In9) phase with In-rich solid solution. Stoichiometric CuInSe2 thin films with a homogeneous element distribution and single chalcopyrite phase can be synthesized from a segregated Cu-In precursor film with an ideal total mole ratio of Cu to In of 0.92. CuInSe2 thin film shows P-type conductivity and its resistivity reaches 1.2×103Ω·cm. 展开更多
关键词 solar cell Cu-In precursor CuInSe_2 thin film SELENIZATION magnetron sputtering
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Effect of Substrate Surface Roughness on Properties of Ni-Cr Alloy Thin Film
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作者 王广海 于晓艳 +1 位作者 李国新 焦清介 《Defence Technology(防务技术)》 CAS 2012年第1期41-46,共6页
The effect of surface roughness of aluminum oxide (95%) substrate on the properties of Ni-Cr alloy thin film is studied.The thin films are prepared on the substrates with different roughness by using magnetron sputter... The effect of surface roughness of aluminum oxide (95%) substrate on the properties of Ni-Cr alloy thin film is studied.The thin films are prepared on the substrates with different roughness by using magnetron sputtering.The micro-structure,adhesive and electrical properties of the thin films were investigated by using scanning electron microscopy,scratch method and four-probe method.The burst voltage and current of the thin film transducers with different substrates were measured according to D-optimization method.The results show that the particle size,structural defect,resistivity and adhesion strength of the thin film increase with the increase of the substrate roughness.The difference among the burst time of the samples with difference substrate roughness gradually decreases with the increase of stimulation amount.The burst time is approximate to 20 μs in the charging voltage of 37 V. 展开更多
关键词 physical chemistry Ni-Cr thin film magnetron sputtering surface roughness electrical property morphology ADHESION
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WORK FUNCTION,AES AND TDS STUDIES OF ADSORPTION OF CO ON Ag-Pd ALLOY
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作者 Wang Huaiming, Bao Xinhe and Deng Jingfa (Chemistry Department, Fudan University, Shanghai,China) 《分子催化》 EI CAS CSCD 1989年第S1期83-87,共5页
The adsorption and desorption of CO on the Ag-rich and Pd-rich surface of Ag-Pd al-loy have been investigated with work function measurement, Auger spectroscopy (AES),and thermal desorption spectroscopy (TDS) in a... The adsorption and desorption of CO on the Ag-rich and Pd-rich surface of Ag-Pd al-loy have been investigated with work function measurement, Auger spectroscopy (AES),and thermal desorption spectroscopy (TDS) in an ultrahigh vacuum system, respectively.AES showed that the surface of the alloy (X<sub>Pd.bulk</sub>=40% at.) was rich in Ag after an-ncaling as would normally be expected and was rich in Pd after Ar<sup>+</sup> bombardment possiblycaused by different sputtering rate on account of their different surface binding energy.Afteradmission of CO the work functions of both surfaces (Pd-rich and Ag-rich) are raised. Theresults of AES and work function measurement confirmed that the Ag-rich alloy becamecnriched with Pd upon prolonged contact with CO at 293 K. With TDS, one singledesorption peak of adsorbed CO was observed throughout the whole range of exposure forthe Ag-Pd system. This result implied that Pd atom in the surface were acting as individualchemisorption centers and that the Ag atoms were merely acting as a 展开更多
关键词 DESORPTION adsorbed merely sputtering PROLONGED EXPOSURE implied THROUGHOUT raised normally
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