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Effects of buried oxide layer on working speed of SiGe heterojunction photo-transistor
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作者 Xian-Cheng Liu Jia-Jun Ma +4 位作者 Hong-Yun Xie Pei Ma Liang Chen Min Guo Wan-Rong Zhang 《Chinese Physics B》 SCIE EI CAS CSCD 2020年第2期458-462,共5页
The effects of buried oxide(BOX) layer on the capacitance of SiGe heterojunction photo-transistor(HPT),including the collector-substrate capacitance,the base-collector capacitance,and the base-emitter capacitance,... The effects of buried oxide(BOX) layer on the capacitance of SiGe heterojunction photo-transistor(HPT),including the collector-substrate capacitance,the base-collector capacitance,and the base-emitter capacitance,are studied by using a silicon-on-insulator(SOI) substrate as compared with the devices on native Si substrates.By introducing the BOX layer into Si-based SiGe HPT,the maximum photo-characteristic frequency ft,0 p.of SO1-based SiGe HPT reaches up to 24.51 GHz,which is 1.5 times higher than the value obtained from Si-based SiGe HPT.In addition,the maximum optical cut-off frequency fβ,opt,namely its 3-dB bandwidth,reaches up to 1.13 GHz,improved by 1.18 times.However,with the increase of optical power or collector current,this improvement on the frequency characteristic from BOX layer becomes less dominant as confirmed by reducing the 3-dB bandwidth of SOI-based SiGe HPT which approaches to the 3-dB bandwidth of Si-based SiGe HPT at higher injection conditions. 展开更多
关键词 silicon-on-insulator(SOI) sige heterojunction photo-transistor(hpt) characteristic frequency 3-dB BANDWIDTH
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