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Experimental Study of Surface Flashover Field of SI-GaAs Photoconductive Semiconductor Switch
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作者 JI Weili SHI Wei 《高电压技术》 EI CAS CSCD 北大核心 2013年第8期1919-1924,共6页
With its unique features, photoconductive semiconductor switch (PCSS) is generally recognized today as a promising power electronic device. However, a major limitation of PCSS is its surprisingly low voltage threshold... With its unique features, photoconductive semiconductor switch (PCSS) is generally recognized today as a promising power electronic device. However, a major limitation of PCSS is its surprisingly low voltage threshold of surface flashover (SF). In this paper, an experimental study of surface flashover of a back-triggered PCSS is presented. The PCSSs with electrode gap of 18 mm are fabricated from liquid encapsulated czochralski (LEC) semi-insulating gallium arsenide (SI-GaAs), and they are either un-coated, or partly coated, or en- tirely coated PCSSs with high-strength transparent insulation. The SF fields of the PCSSs are measured and discussed. According to the experimental results, the high-dielectric-strength coating is efficient in both reducing the gas desorption from semiconductor and increasing the SF field: a well-designed PCSS can resist a voltage up to 20 kV under the repetition frequency of 30 Hz. The physical mechanism of the PCSS SF is analyzed, and the conclusion is made that having a channel structure, the SF is the breakdown of the contaminated dielectric layer at the semiconductor-ambient dielectric interface. The non-uniform distribution of the surface field and the gas desorption due to thermal effects of semiconductor surface currents are key factors causing the SF field reduction. 展开更多
关键词 光导半导体开关 si-gaas 沿面闪络 实验 光电 电力电子装置 光导开关 半绝缘砷化镓
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沿面闪络和丝状电流对光电导开关的损伤机理 被引量:3
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作者 马湘蓉 施卫 +1 位作者 薛红 纪卫莉 《电工技术学报》 EI CSCD 北大核心 2010年第10期129-135,共7页
通过对电极间隙为3mm和8mm半绝缘GaAs光电导开关损伤实验研究发现,引起开关损伤的主要机制是沿面闪络和丝状电流。沿面闪络是在高偏置电压条件下GaAs材料在热传导过程中表现的熔化?再结晶现象,对开关造成了致命性损伤;而丝状电流是开关... 通过对电极间隙为3mm和8mm半绝缘GaAs光电导开关损伤实验研究发现,引起开关损伤的主要机制是沿面闪络和丝状电流。沿面闪络是在高偏置电压条件下GaAs材料在热传导过程中表现的熔化?再结晶现象,对开关造成了致命性损伤;而丝状电流是开关在非线性工作模式下由于存在负微分电导效应(NDC),形成的高浓度电子?空穴等离子体通道,芯片内产热和冷却之间达到了动态平衡,开关处于光控预击穿状态,存在可恢复性和不可恢复性两类损伤。 展开更多
关键词 半绝缘gaas光电导开关 沿面闪络 丝状电流 损伤
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