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Innovative surface modification strategy for ADN:PFOA-interlayered and vibrational magnetron sputtering for constructing anti-hygroscopic composite structures
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作者 Yinan Lyu Xiaoxia Ma +3 位作者 Xiaoting Ren Shuping Sun Lin Shi Li Yang 《Defence Technology(防务技术)》 2025年第10期295-305,共11页
Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulat... Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulation methods have struggled to address the problems of uneven coating and polarity mismatch.This research innovatively introduces perfluorooctanoic acid(PFOA)as a polar transition intermediate layer.Utilizing the polarity of one end of it to adsorb on the surface of ADN through hydrogen bonds,the problem of polarity mismatch is effectively overcome.Meanwhile,the vibrational magnetron sputtering process has been first applied in the energetic field,with a special vibrating abutment enhancing ADN particle fluidity to solve coating non-uniformity,thus preparing prilled ADN@PFOA@PTFE core-dual-shell composites.Performance tests reveal that this composite material possesses excellent hydrophobic and anti-hygroscopic properties.When left at 25℃and 75%RH for 3 days,moisture absorption was reduced by more than 90%compared to pure ADN.Simultaneously,its thermal stability,heat release performance,and combustion performance have been improved.The research achievements optimize the storage conditions of ADN in the application of rocket and missile propellants,providing solid support and broad development prospects for technological innovation in military fields. 展开更多
关键词 Ammonium dinitramide(ADN) Vibrational magnetron sputtering Core-dual-shell composites Hydrophobic Polarity matching
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Corrosion resistance of self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes Ti_(3)AlC_(2)coating deposited by magnetron sputtered on copper
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作者 WANG Guo-qing WANG Ning +5 位作者 HU Yi-teng WANG Jing GAO Chuan-hui WANG Jie XUE Jun-jie YAN Ke-xin 《Journal of Central South University》 2025年第3期867-881,共15页
Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines pla... Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines plasma-enhanced non-equilibrium magnetron sputtering physical vapor deposition(PEUMS-PVD)and anodization to construct a self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes/Ti_(3)AlC_(2)coating on the surface of Cu substrates.This novel strategy enhances the corrosion resistance of copper substrates in marine environments,with corrosion current densities of up to 4.5643×10^(−8)A/cm^(2).Among them,the doping of nano-aluminum particles makes the coating self-healing.The mechanistic analysis of the corrosion behaviors during early immersion experiments was conducted using electrochemical noise,and revealed that during the initial stages of coating immersion,uniform corrosion predominates,with a minor occurrence of localized corrosion. 展开更多
关键词 magnetron sputtering TiO_(2)nanotubes Ti_(3)AlC_(2)coating corrosion resistance performance
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Effect of substrate temperature and oxygen plasma treatment on the properties of magnetron-sputtered CdS for solar cell applications
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作者 Runxuan Zang Haolin Wang +9 位作者 Xiaoqi Peng Ke Li Yuehao Gu Yizhe Dong Zhihao Yan Zhiyuan Cai Huihui Gao Shuwei Sheng Rongfeng Tang Tao Chen 《中国科学技术大学学报》 CAS CSCD 北大核心 2024年第6期22-33,I0010,共13页
Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films h... Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films have emerged,among which magnetron sputtering(MS)is one of the most commonly used vacuum techniques.For this type of technique,the substrate temperature is one of the key deposition parameters that affects the interfacial properties between the target film and substrate,determining the specific growth habits of the films.Herein,the effect of substrate temperature on the microstructure and electrical properties of magnetron-sputtered CdS(MS-CdS)films was studied and applied for the first time in hydrothermally deposited antimony selenosulfide(Sb_(2)(S,Se)_(3))solar cells.Adjusting the substrate temperature not only results in the design of the flat and dense film with enhanced crystallinity but also leads to the formation of an energy level arrangement with a Sb_(2)(S,Se)_(3)layer that is more favorable for electron transfer.In addition,we developed an oxygen plasma treatment for CdS,reducing the parasitic absorption of the device and resulting in an increase in the short-circuit current density of the solar cell.This study demonstrates the feasibility of MS-CdS in the fabrication of hydrothermal Sb_(2)(S,Se)_(3)solar cells and provides interface optimization strategies to improve device performance. 展开更多
关键词 magnetron sputtering CDS substrate heating plasma treatment Sb_(2)(S Se)_(3) thin film solar cell
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Multifunctional hopeite nanocoating on Ti64 substrates by pulsed laser deposition and radio frequency magnetron sputtering for orthopedic implant applications:A comparative study 被引量:3
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作者 Ashish DAS Mukul SHUKLA 《Journal of Central South University》 SCIE EI CAS CSCD 2020年第8期2198-2209,共12页
Functionalized implants demonstrate an upgraded approach in orthopedic implants,aiming to achieve long term success through improved bio integration.Bioceramic coatings with multifunctionality have arisen as an effect... Functionalized implants demonstrate an upgraded approach in orthopedic implants,aiming to achieve long term success through improved bio integration.Bioceramic coatings with multifunctionality have arisen as an effective substitute for conventional coatings,owing to their combination of various properties that are essential for bio-implants,such as osteointegration and antibacterial character.In the present study,thin hopeite coatings were produced by Pulsed laser deposition(PLD)and radio frequency magnetron sputtering(RFMS)on Ti64 substrates.The obtained hopeite coatings were annealed at 500°C in ambient air and studied in terms of surface morphology,phase composition,surface roughness,adhesion strength,antibacterial efficacy,apatite forming ability,and surface wettability by scanning electron microscope(SEM),X-ray diffraction(XRD),atomic force microscope(AFM),tensometer,fluorescence-activated cell sorting(FACS),simulated body fluid(SBF)immersion test and contact angle goniometer,respectively.Furthermore,based on promising results obtained in the present work it can be summarized that the new generation multifunctional hopeite coating synthesized by two alternative new process routes of PLD and RFMS on Ti64 substrates,provides effective alternatives to conventional coatings,largely attributed to strong osteointegration and antibacterial character of deposited hopeite coating ensuring the overall stability of metallic orthopedic implants. 展开更多
关键词 hopeite Ti64 alloy pulsed laser deposition magnetron sputtering coating IMPLANT
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Photoluminescence properties of ZnO thin films prepared by DC magnetron sputtering 被引量:2
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作者 杨兵初 刘晓艳 +1 位作者 高飞 马学龙 《Journal of Central South University of Technology》 EI 2008年第4期449-453,共5页
ZnO thin films were prepared by direct current(DC)reactive magnetron sputtering under different oxygen partial pressures.And then the samples were annealed in vacuum at 450℃.The effects of the oxygen partial pressure... ZnO thin films were prepared by direct current(DC)reactive magnetron sputtering under different oxygen partial pressures.And then the samples were annealed in vacuum at 450℃.The effects of the oxygen partial pressures and the treatment of annealing in vacuum on the photoluminescence and the concentration of six intrinsic defects in ZnO thin films such as oxygen vacancy(VO),zinc vacancy(VZn),antisite oxygen(OZn),antisite zinc(ZnO),interstitial oxygen(Oi)and interstitial zinc(Zni)were studied.The results show that a green photoluminescence peak at 520 nm can be observed in all the samples,whose intensity increases with increasing oxygen partial pressure;for the sample annealed in vacuum,the intensity of the green peak increases as well.The green photoluminescence peak observed in ZnO may be attributed to zinc vacancy,which probably originates from transitions between electrons in the conduction band and zinc vacancy levels,or from transitions between electrons in zinc vacancy levels and up valence band. 展开更多
关键词 ZnO thin films PHOTOLUMINESCENCE zinc vacancy magnetron sputtering
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Fabrication of GaN films through reactive reconstruction of magnetron sputtered ZnO/Ga_2O_3 被引量:1
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作者 高海永 庄惠照 +5 位作者 薛成山 董志华 何建廷 刘亦安 吴玉新 田德恒 《Journal of Central South University of Technology》 SCIE EI CAS 2005年第1期9-12,共4页
A simple and easily operated technique was developed to fabricate GaN films. GaN films possessing hexagonal wurtzite structure were fabricated on Si(111) substrates with ZnO buffer layers through nitriding Ga2O3 films... A simple and easily operated technique was developed to fabricate GaN films. GaN films possessing hexagonal wurtzite structure were fabricated on Si(111) substrates with ZnO buffer layers through nitriding Ga2O3 films in the tube quartz furnace. ZnO buffer layers and Ga3O3 films were deposited on Si substrates in turn by using radio frequency magnetron sputtering system before the nitriding process. The structure and composition of GaN films were studied by X-ray diffraction, selected area electron diffraction and Fourier transform infrared spectrophotometer. The morphologies of GaN films were studied by scanning electron microscopy. The results show that ZnO buffer layer improves the crystalline quality and the surface morphology of the films relative to the films grown directly on silicon substrates. The measurement result of room-temperature photoluminescence spectrum indicates that the photoluminescence peaks locate at 365 nm and 422 nm. 展开更多
关键词 FABRICATION Ga2O3 film ZnO buffer layer radio frequency magnetron sputtering NITRIDING
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Composition design and properties of CoNbZr amorphous films deposited by unbalanced magnetron sputtering
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作者 郭光伟 唐光泽 +2 位作者 王亚军 马欣新 王玉江 《Journal of Central South University》 SCIE EI CAS 2009年第5期719-724,共6页
Co87Nb10Zr3,Co76Nb19Zr5,Co64Nb26Zr10 and Co64Nb16Zr20 amorphous films were deposited on noncrystalline glass substrates by DC unbalanced magnetron sputtering. The compositions of amorphous films were tailored in the l... Co87Nb10Zr3,Co76Nb19Zr5,Co64Nb26Zr10 and Co64Nb16Zr20 amorphous films were deposited on noncrystalline glass substrates by DC unbalanced magnetron sputtering. The compositions of amorphous films were tailored in the light of the individual deposition rate of Co,Nb and Zr. The amorphous films with the anticipated composition were prepared by means of co-sputtering Co,Nb and Zr targets simultaneously. It is indicated that there is interaction among three targets during co-sputtering. The morphology and composition of the films were observed by SEM,AFM and EDS. The structure and magnetic property were measured by XRD and physical property measurement system(PPMS) . The coercivity changes with the composition,varying from 240 to 1 600 A/m. After vacuum isothermal annealing at temperatures of 475,500,525 and 550 ℃ for 15 and 30 min,respectively,it is found that high Nb content is beneficial to improving thermal stability of amorphous films. The crystallized films have the mean grain size of 2-19 nm. 展开更多
关键词 CoNbZr amorphous film magnetron co-sputtering isothermal annealing
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Effects of ratio of hydrogen flow on microstructure of hydrogenated microcrystalline silicon films deposited by magnetron sputtering at 100 ℃
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作者 WANG Lin-qing ZHOU Yong-tao +1 位作者 WANG Jun-jun LIU Xue-qin 《Journal of Central South University》 SCIE EI CAS CSCD 2019年第10期2661-2667,共7页
Hydrogenated microcrystalline silicon(μc-Si:H)films were prepared on glass and silicon substrates by radio frequency magnetron sputtering at 100°C using a mixture of argon(Ar)and hydrogen(H2)gasses as precursor ... Hydrogenated microcrystalline silicon(μc-Si:H)films were prepared on glass and silicon substrates by radio frequency magnetron sputtering at 100°C using a mixture of argon(Ar)and hydrogen(H2)gasses as precursor gas.The effects of the ratio of hydrogen flow(H2/(Ar+H2)%)on the microstructure were evaluated.Results show that the microstructure,bonding structure,and surface morphology of theμc-Si:H films can be tailored based on the ratio of hydrogen flow.An amorphous to crystalline phase transition occurred when the ratio of hydrogen flow increased up to 50%.The crystallinity increased and tended to stabilize with the increase in ratio of hydrogen flow from 40%to 70%.The surface roughness of thin films increased,and total hydrogen content decreased as the ratio of hydrogen flow increased.Allμc-Si:H films have a preferred(111)orientation,independent of the ratio of hydrogen flow.And theμc-Si:H films had a dense structure,which shows their excellent resistance to post-oxidation. 展开更多
关键词 hydrogenated microcrystalline silicon films radio frequency magnetron sputtering ratio of hydrogen flow low temperature MICROSTRUCTURE
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Simulation of Discharge Plasma in Mid-frequency Pulsed DC Magnetron
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作者 QIU Qingquan QU Fei GU Hongwei ZHANG Guomin DAI Shaotao 《高电压技术》 EI CAS CSCD 北大核心 2013年第10期2526-2531,共6页
关键词 放电等离子体 脉冲磁控溅射 脉冲直流 模拟系统 中频 等离子体性能 粒子模型 等离子体密度
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钯及其合金膜制备研究进展
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作者 王莹 田梦圆 +2 位作者 张振展 刘明 李慧 《膜科学与技术》 北大核心 2025年第2期192-204,共13页
在氢气相关应用领域,高纯氢的需求日益增加,钯基膜以其优异的氢气渗透性和选择性,在氢气分离-纯化领域得到广泛应用。但在一定温度和压力下会发生氢脆,研究者通过在钯膜中加入其他金属元素来解决该问题,通过合金化后抑制氢脆并提高氢气... 在氢气相关应用领域,高纯氢的需求日益增加,钯基膜以其优异的氢气渗透性和选择性,在氢气分离-纯化领域得到广泛应用。但在一定温度和压力下会发生氢脆,研究者通过在钯膜中加入其他金属元素来解决该问题,通过合金化后抑制氢脆并提高氢气透量。本综述旨在总结不同制备方法的过程和技术,详细介绍其工作原理、发展历史、膜层的沉积过程以及利用其生产的一些材料,展望了未来钯基膜制备方法的发展方向及挑战,以期为钯合金膜的制备方法创新提供思路。 展开更多
关键词 钯膜 制备 氢气分离 磁控溅射 合金
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Mo-DLC/Mo薄膜在甲醇中的摩擦学性能研究
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作者 苏永要 彭浩 +4 位作者 徐照英 张腾飞 王锦标 余伟杰 阮海波 《表面技术》 北大核心 2025年第9期121-129,共9页
目的甲醇燃料的应用给内燃机喷射系统关键运动部件的稳定、高效运行带来了挑战。基于关键部件在减摩抗磨方面的迫切需求,在高速钢表面设计并制备Mo掺杂的类金刚石(Mo-DLC)薄膜。方法采用磁控溅射技术,在高速钢表面制备具有Mo过渡层的Mo-... 目的甲醇燃料的应用给内燃机喷射系统关键运动部件的稳定、高效运行带来了挑战。基于关键部件在减摩抗磨方面的迫切需求,在高速钢表面设计并制备Mo掺杂的类金刚石(Mo-DLC)薄膜。方法采用磁控溅射技术,在高速钢表面制备具有Mo过渡层的Mo-DLC/Mo薄膜,并与未制备过渡层的Mo-DLC薄膜进行对比研究。利用激光拉曼光谱仪、扫描电子显微镜、纳米压痕仪和摩擦磨损试验机等检测设备,对薄膜的微观结构、形貌、力学性能、摩擦磨损性能进行系统研究。结果Mo-DLC/Mo薄膜的内应力约为1.85 GPa,膜基结合力约为210 mN。与未制备过渡层的Mo-DLC薄膜(2.18 GPa,100 mN)相比,内应力降低了约15%,膜基结合力提高了110%。此外,Mo-DLC/Mo薄膜还具有优异的耐磨损性能和环境适应性,在空气和甲醇中的磨损率均较低,分别为4.6×10^(−8)、5.8×10^(−8)mm^(3)/(N·m)。结论Mo过渡层对Mo-DLC的力学性能、摩擦学性能的影响显著,Mo-DLC/Mo薄膜在甲醇中展现出优异的摩擦磨损性能,可为低应力DLC的制备及其在醇类内燃机行业的应用提供理论基础和技术储备。 展开更多
关键词 磁控溅射 DLC薄膜 过渡层 摩擦磨损 甲醇
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钴铬钼基高熵合金薄膜的耐腐蚀性与耐磨性
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作者 王波 戴铭成 +2 位作者 张丽霞 齐艳飞 汤云晖 《北京工业大学学报》 北大核心 2025年第9期1024-1032,共9页
钴铬钼合金在作为人工关节应用于人体时会产生磨粒降低使用寿命以及影响人体健康的金属离子,为了寻找性能更为优异的医用材料,延长人工关节的使用寿命,采用扇形复合靶,通过磁控溅射技术在硅片上制备了钴铬钼基高熵合金薄膜,并对其微观... 钴铬钼合金在作为人工关节应用于人体时会产生磨粒降低使用寿命以及影响人体健康的金属离子,为了寻找性能更为优异的医用材料,延长人工关节的使用寿命,采用扇形复合靶,通过磁控溅射技术在硅片上制备了钴铬钼基高熵合金薄膜,并对其微观结构以及耐腐蚀性和耐磨性进行了深入研究。结果表明:随着组成元素的增加,混合熵与原子半径相对标准差呈增大趋势,混合焓一直处于较低水平,其中七元高熵合金薄膜具有最优的耐磨性和耐腐蚀性。混合熵的增加降低了合金的吉布斯自由能,提高了合金薄膜的化学稳定性,导致更强的非晶倾向、更低的体系自由能,所以合金薄膜表现出更优良的耐腐蚀性、耐磨性以及相关力学性质。另外,添加的Zr、Nb元素有助于减小晶体颗粒尺度,降低表面的粗糙度,从而增强了合金薄膜的耐腐蚀性与耐磨性。该研究可为高熵合金薄膜在人工关节领域的应用提供参考。 展开更多
关键词 磁控溅射 高熵合金 薄膜 非晶 耐腐蚀性 耐磨性
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射频磁控溅射法制备MoS_(2)纳米薄膜的光学性能研究
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作者 樊志琴 邢淑涵 +2 位作者 李瑞 张丽英 张俊峰 《化工新型材料》 北大核心 2025年第2期131-134,共4页
采用射频磁控溅射法在石英玻璃衬底表面沉积不同厚度的MoS_(2)纳米薄膜,利用扫描电镜(SEM)、X射线衍射(XRD)、紫外-可见光分光光谱(UV-Vis)和荧光光谱等手段对MoS_(2)薄膜结构及光谱性质进行表征。结果表明:溅射时间越长,MoS_(2)薄膜的... 采用射频磁控溅射法在石英玻璃衬底表面沉积不同厚度的MoS_(2)纳米薄膜,利用扫描电镜(SEM)、X射线衍射(XRD)、紫外-可见光分光光谱(UV-Vis)和荧光光谱等手段对MoS_(2)薄膜结构及光谱性质进行表征。结果表明:溅射时间越长,MoS_(2)薄膜的结晶性越好。薄膜形成条状纳米结构相互交叠的表面形貌,样品表面形貌均匀致密。MoS_(2)纳米薄膜在可见光波段对短波长光源吸收较强,对长波长光源透射较强。随着溅射时间的增加,薄膜厚度增加,导致MoS_(2)纳米薄膜的吸收系数增加,透射率减小,光学带隙也逐渐减少。在MoS_(2)薄膜的发射谱中,位于675nm的A激子峰,对应的带隙为1.8eV。发射峰的强度随着MoS_(2)薄膜层数的增加而减小,发射峰的位置随着MoS_(2)薄膜层数的增加而蓝移。 展开更多
关键词 MoS_(2)薄膜 射频磁控溅射 光学性能 激子峰
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HiPIMS占空比对TiZrN/TiN纳米多层膜结构和性能的影响
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作者 魏永强 张晓晓 +5 位作者 张华森 顾艳阳 刘畅 吕怿东 韦春贝 钟素娟 《中国有色金属学报》 北大核心 2025年第10期3566-3580,共15页
本文采用电弧离子镀(Arc ion plating,AIP)和高功率脉冲磁控溅射(High power impulse magnetron sputtering,HiPIMS)复合方法,通过调控HiPIMS占空比在M2高速钢基体和单晶硅片上沉积TiZrN/TiN纳米多层膜,探究HiPIMS占空比对TiZrN/TiN纳... 本文采用电弧离子镀(Arc ion plating,AIP)和高功率脉冲磁控溅射(High power impulse magnetron sputtering,HiPIMS)复合方法,通过调控HiPIMS占空比在M2高速钢基体和单晶硅片上沉积TiZrN/TiN纳米多层膜,探究HiPIMS占空比对TiZrN/TiN纳米多层膜微观结构和性能的影响规律。结果表明:随着HiPIMS占空比的增加,TiZrN/TiN纳米多层膜表面大颗粒数量呈先减少后增加趋势,同时薄膜厚度呈先减小后增大趋势。随着HiPIMS占空比从2%增加10%,TiZrN/TiN纳米多层膜择优取向从(111)晶面转变为(220)晶面,膜基结合力等级均为HF1级,硬度均在33 GPa以上,稳定摩擦因数在0.79左右。当HiPIMS占空比为2%时,TiZrN/TiN纳米多层膜的磨损率达到最小,为1.73×10^(-8) mm^(3)/(N·mm),薄膜的耐磨损性能最好。当HiPIMS占空比为6%时,TiZrN/TiN纳米多层膜的硬度和弹性模量分别增加到43.73GPa和362.98 GPa,自腐蚀电位可达到-0.39 V(vs SCE),自腐蚀电流密度为0.731μA/cm^(2),薄膜耐腐蚀性能最强,腐蚀速率较低。综合对比可知,HiPIMS占空比为6%,是TiZrN/TiN纳米多层膜制备的最佳工艺参数。 展开更多
关键词 电弧离子镀 高功率脉冲磁控溅射技术 HiPIMS占空比 耐磨性 耐腐蚀性
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N_(2)/Ar流量比对TiZrN/TiN纳米多层薄膜微观结构和性能的影响
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作者 魏永强 张华森 +5 位作者 张晓晓 顾艳阳 刘畅 吕怿东 韦春贝 钟素娟 《表面技术》 北大核心 2025年第14期92-104,共13页
目的 通过改变N2/Ar流量比,研究TiZrN/TiN纳米多层薄膜微观结构和性能的变化规律。方法采用电弧离子镀(Arc Ion Plating,AIP)和高功率脉冲磁控溅射(High Power Pulsed Magnetron Sputtering,Hi PIMS)复合方法,通过调节N_(2)/Ar流量比,... 目的 通过改变N2/Ar流量比,研究TiZrN/TiN纳米多层薄膜微观结构和性能的变化规律。方法采用电弧离子镀(Arc Ion Plating,AIP)和高功率脉冲磁控溅射(High Power Pulsed Magnetron Sputtering,Hi PIMS)复合方法,通过调节N_(2)/Ar流量比,分别在M2高速钢和单晶硅片(100)上制备TiZrN/TiN纳米多层薄膜。研究N2/Ar流量比对TiZrN/TiN纳米多层薄膜形貌结构、元素成分、相结构、纳米硬度、膜基结合力、摩擦磨损性能和耐腐蚀性能的影响。结果在N2/Ar流量比为35/65时,薄膜表面粗糙度最低达到0.298μm;在N2/Ar流量比为40/60时,薄膜总厚度最高达574 nm;TiZrN/TiN纳米多层薄膜均以(111)晶面为择优取向,硬度在22.95~27.15 GPa。在N2/Ar流量比为25/75时,TiZrN/TiN纳米多层薄膜离子轰击作用最强,Zr/(Ti+Zr)的值较大(0.088),硬度和弹性模量最高分别达到27.15 GPa和271.14 GPa。在N_(2)/Ar流量比为25/75和30/70时,TiZrN/TiN纳米多层薄膜的膜基结合力最好,达到HF1等级。TiZrN/TiN纳米多层薄膜稳定摩擦系数均在0.8左右,磨损率先增大后减小。N_(2)/Ar流量比为25/75时,TiZrN/TiN纳米多层薄膜的自腐蚀电位和自腐蚀电流密度分别为-0.546 V和1.167μA/cm^(2),薄膜对M2高速钢基体的保护率最高达到87.9%。结论采用电弧离子镀和高功率脉冲磁控溅射复合方法,大幅改善了薄膜表面质量;N_(2)/Ar流量比可改变离子轰击强度的强弱,随着N_(2)/Ar流量比的增加,沉积离子轰击强度逐渐减弱,薄膜硬度和耐腐蚀性能逐渐下降;在N_(2)/Ar流量比为25/75时,薄膜综合性能最优。 展开更多
关键词 高功率脉冲磁控溅射 电弧离子镀 TiZrN/TiN纳米多层薄膜 N_(2)/Ar流量比 纳米硬度 耐磨性
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新型磁控变压器的特性分析
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作者 赵国生 高权威 +1 位作者 郑晓雷 潘俊鹏 《电源学报》 北大核心 2025年第4期322-331,共10页
传统的有载调压技术会存在产生电弧、响应速度慢、调节精度低等不足,影响变压器运行可靠性。新型电力电子变压器虽具有无弧、响应快的优势,但其损耗高、成本高。基于此,提出1种新型单相四柱式磁控变压器结构,由磁控电抗器和变压器串联... 传统的有载调压技术会存在产生电弧、响应速度慢、调节精度低等不足,影响变压器运行可靠性。新型电力电子变压器虽具有无弧、响应快的优势,但其损耗高、成本高。基于此,提出1种新型单相四柱式磁控变压器结构,由磁控电抗器和变压器串联连接组成。根据磁控电抗器拓扑结构分析该磁控变压器工作原理,并推导出电路方程与电磁方程。该结构的右旁轭可以提供交流磁通回路,不受直流磁通干扰。利用Ansys软件Maxwell与Simplorer进行模型场路耦合多物理域联合仿真分析其调压能力,并在Simulink中对输出电压进行谐波分析。结果验证了该新型磁控变压器可以无弧、无级、连续平滑地调节输出电压,谐波含量低。 展开更多
关键词 新型磁控变压器 磁控电抗器 ANSYS 场路耦合多物理域联合仿真 谐波
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Effect of tantalum doping on the microstructure and photoelectrical properties of transparent conductive zinc oxide films
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作者 Kai Yi Hongxu Jiang +3 位作者 Yanbo Cai Guangwei Wang Fei Liu Deliang Wang 《中国科学技术大学学报》 北大核心 2025年第4期49-57,48,I0002,共11页
ZnO thin films with varying Ta concentrations were fabricated through magnetron sputtering.The crystallinity and surface morphology of the ZnO films are significantly influenced by the incorporation of Ta,as evidenced... ZnO thin films with varying Ta concentrations were fabricated through magnetron sputtering.The crystallinity and surface morphology of the ZnO films are significantly influenced by the incorporation of Ta,as evidenced by the X-ray diffraction and scanning electron microscopy results.The lattice constants,as determined by X-ray diffraction,contradict the disparity in Ta and Zn ion radii,which is attributed to the impact of interstitial defects.This inconsistency introduces variations in carrier concentration in this experiment compared with prior studies.Subsequent exploration of the luminescent characteristics and emission mechanism of defect levels in Ta-doped ZnO films was conducted through photoluminescence.Furthermore,the factors influencing the bandgap are discussed. 展开更多
关键词 tantalum-doped zinc oxide RF magnetron sputtering MICROSTRUCTURE PHOTOLUMINESCENCE
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掺杂改性氮化物基薄膜摩擦、腐蚀与抗菌性能的研究进展
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作者 张懋达 鞠长滨 +3 位作者 王珏 韩培培 赵梁 周飞 《表面技术》 北大核心 2025年第2期70-86,共17页
由于PVD硬质薄膜与金属之间有着较高的黏附强度,且薄膜具有致密结构以及良好的力学、耐磨和耐腐蚀性,同时能够隔绝腐蚀环境中的盐分与材料表面直接接触,因此在其表面沉积具有优异磨损腐蚀和抗菌特性的防护薄膜可以保障金属材料在磨损/... 由于PVD硬质薄膜与金属之间有着较高的黏附强度,且薄膜具有致密结构以及良好的力学、耐磨和耐腐蚀性,同时能够隔绝腐蚀环境中的盐分与材料表面直接接触,因此在其表面沉积具有优异磨损腐蚀和抗菌特性的防护薄膜可以保障金属材料在磨损/腐蚀环境中的长期使用。从传统的二元氮化物薄膜入手,针对薄膜耐磨、防腐与抗菌性能日益增长的需求,综述了Si、C、Mo与Ag元素掺杂对PVD氮化物薄膜在空气与水环境中的摩擦学特性、在盐溶液与海水中的电化学腐蚀与磨损腐蚀特性,以及静态抗菌与摩擦诱导抗菌性能的影响。传统二元的氮化物薄膜已经逐渐发展为多元的CrMoSiCN基薄膜,在这个过程中,重点分析了不同三甲基硅烷反应气体流速与Si、Mo、Ag靶材溅射电流下,薄膜的力学性能与摩擦学特性之间的紧密关联;阐述了薄膜在腐蚀性溶液中磨粒磨损、氧化磨损与电化学腐蚀之间的协同耦合关系;阐明了不同Mo、Ag元素含量下,薄膜的抗微生物黏附与抗菌特性的演变机理。指出多元氮化物基薄膜在盐溶液中的摩擦因数与磨损腐蚀材料损失受到薄膜中Si、Mo与Ag元素掺杂量变化的强烈影响,摩擦过程中的氧化与腐蚀产物有效增强了薄膜的自润滑与减磨特性;而含Mo、Ag氮化物基薄膜的杀菌能力主要与磨痕表面氧化物MoO_(x)的形成和Ag^(+)在菌液中的释放、扩散相关。 展开更多
关键词 磁控溅射 薄膜 摩擦 磨损 腐蚀 抗菌
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静电纺丝聚己内酯薄膜物理改性技术研究进展
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作者 赵天任 艾甫山·亚里坤 +4 位作者 张爱英 郭天庆 曹雪森 王成志 金海波 《合成树脂及塑料》 北大核心 2025年第3期69-75,共7页
综述了静电纺丝聚己内酯薄膜物理改性技术的研究现状,介绍了浸涂法、磁控溅射法、等离子体处理法、热处理法和聚多巴胺黏附法等物理改性技术的特点。根据静电纺丝聚己内酯薄膜特定的应用需求,可选择不同的物理改性技术来调控其表面性质... 综述了静电纺丝聚己内酯薄膜物理改性技术的研究现状,介绍了浸涂法、磁控溅射法、等离子体处理法、热处理法和聚多巴胺黏附法等物理改性技术的特点。根据静电纺丝聚己内酯薄膜特定的应用需求,可选择不同的物理改性技术来调控其表面性质,以改善亲/疏水性、电导率、抗菌能力、生物相容性及力学性能。最后展望了改性静电纺丝聚己内酯薄膜在生物医学、电传感器、金属防腐、自修复材料等领域的应用前景。 展开更多
关键词 静电纺丝 聚己内酯薄膜 浸涂法 磁控溅射法 等离子体处理法 聚多巴胺黏附法
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锂电复合集流体用磁控溅射Cu籽晶层微观结构及性能调控
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作者 张柳燕 郝晓瑜 +5 位作者 汪洋 杨英 古红涛 储松潮 武俊伟 郑军 《表面技术》 北大核心 2025年第10期1-12,共12页
目的 解决锂电集流体用复合铜箔所面临的导电及界面结合问题。方法 采用磁控溅射技术在PP基体表面沉积纳米级Cu籽晶层,通过调控衬底温度、气体流量及溅射功率等工艺参数,制备出电阻率低、结合力好的Cu膜。采用场发射扫描电子显微镜对薄... 目的 解决锂电集流体用复合铜箔所面临的导电及界面结合问题。方法 采用磁控溅射技术在PP基体表面沉积纳米级Cu籽晶层,通过调控衬底温度、气体流量及溅射功率等工艺参数,制备出电阻率低、结合力好的Cu膜。采用场发射扫描电子显微镜对薄膜表面形貌进行表征,利用手持式四探针方阻仪测量薄膜方阻并计算电阻率,利用划格测试法对Cu膜结合力进行评级。结果 随着衬底温度的升高,薄膜晶粒尺寸增大,电阻率增加,膜基结合性能下降;随着气体流量的增加,薄膜沉积速率先上升后降低,电阻率先下降后上升,膜基结合力逐渐提高;随着溅射功率的增加,沉积速率增大,电阻率下降,薄膜附着力变差。综合考虑薄膜微观形貌、电学性能以及界面结合性能,优选出的Cu膜最佳沉积参数为:衬底温度为-15℃;气体流量(气压)为400 m L/min(0.24 Pa);溅射功率为1.5 kW;Cu膜厚度约为80 nm。在此工艺下制备的Cu膜微观结构致密,电学性能良好(9.72×10^(-8)Ω·m),结合力评级为1级。结论 衬底温度、气体流量以及溅射功率均显著影响Cu膜的微观结构和性能。通过精细调控沉积工艺可以制备出综合性能优良的锂电复合集流体用Cu籽晶层。 展开更多
关键词 复合集流体 磁控溅射 Cu籽晶层 电学性能 结合力
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