Ablation threshold is an important concept in the study of femtosecond laser micro-and nano-machining.In this paper,the ablation experiments of three kinds of surface roughness 4H-Si C substrates irradiated by femtose...Ablation threshold is an important concept in the study of femtosecond laser micro-and nano-machining.In this paper,the ablation experiments of three kinds of surface roughness 4H-Si C substrates irradiated by femtosecond laser were carried out.The feature thresholds were systematically measured for three surface roughness Si C substrates and found in the modification and annealing regions ranging from coincidence(R_(a)=0.5 nm)to a clear demarcation(R_(a)=5.5 nm),eventually being difficult to identify the presence of the former(R_(a)=89 nm).Under multi-pulse laser irradiation,oriented ripple structures were generated in the annealing region,where deep subwavelength ripples(about 110 nm,Λ≈0.2λ)can be generated above substrates with surface roughness higher than 5.5 nm.We investigated the effect of surface roughness on the ablation morphology,ablation threshold,and periodic structures of femtosecond laser ablation of 4H-Si C substrates,while the ablation threshold was tended to decrease and stabilize with the increase of pulse number N≥500.展开更多
Surface-enhanced Raman scattering(SERS) has been widely used as an effective technique for lowconcentration molecules detections in the past decades. This work proposes a rapid and accessible process to fabricate SERS...Surface-enhanced Raman scattering(SERS) has been widely used as an effective technique for lowconcentration molecules detections in the past decades. This work proposes a rapid and accessible process to fabricate SERS-active substrates with high uniformity and controllability based on two-step laser ablation. Laser beams directly ablate the surface of Si, concurrently creating microstructures and ejecting molten materials caused by the thermal effect that nucleate in ambient air. The nuclei grow into nanoparticles and deposit over the surface. These nanoparticles,together with microstructures, improve the light collection efficiency of the SERS-active substrates. Especially after Au thin film deposition, these nanoparticles can provide nanogaps as hotspots for SERS. By orthogonal experiment design,laser processing parameters for better performances are determined. Compared with substrates fabricated by single 1064 nm master oscillator power amplifier(MOPA) laser ablation, substrates ablated by the primary 1064 nm MOPA laser and secondary UV pulsed laser show more uniform nanoparticles’ deposition over the surface. The optimized largearea substrate has a SERS detection limit of 10^(-8)mol/L for 4-aminothiophenol(4-ATP), indicating the potential realworld applications for trace detection.展开更多
基金Project(52075103)supported by the National Natural Science Foundation of ChinaProject(2020B1515120058)supported by the Key Project of Regional Joint Fund of Guangdong Basic and Applied Basic Research Foundation,China。
文摘Ablation threshold is an important concept in the study of femtosecond laser micro-and nano-machining.In this paper,the ablation experiments of three kinds of surface roughness 4H-Si C substrates irradiated by femtosecond laser were carried out.The feature thresholds were systematically measured for three surface roughness Si C substrates and found in the modification and annealing regions ranging from coincidence(R_(a)=0.5 nm)to a clear demarcation(R_(a)=5.5 nm),eventually being difficult to identify the presence of the former(R_(a)=89 nm).Under multi-pulse laser irradiation,oriented ripple structures were generated in the annealing region,where deep subwavelength ripples(about 110 nm,Λ≈0.2λ)can be generated above substrates with surface roughness higher than 5.5 nm.We investigated the effect of surface roughness on the ablation morphology,ablation threshold,and periodic structures of femtosecond laser ablation of 4H-Si C substrates,while the ablation threshold was tended to decrease and stabilize with the increase of pulse number N≥500.
基金Project(2020H0006) supported by the Fujian Provincial Science and Technology ProgrammeChina+2 种基金Project(62175203) supported by the National Natural Science Foundation of ChinaProject(RD2020050301) supported by the Innovation Laboratory for Science and Technology of Energy Materials of Fujian Province Applied Research ProjectChina。
文摘Surface-enhanced Raman scattering(SERS) has been widely used as an effective technique for lowconcentration molecules detections in the past decades. This work proposes a rapid and accessible process to fabricate SERS-active substrates with high uniformity and controllability based on two-step laser ablation. Laser beams directly ablate the surface of Si, concurrently creating microstructures and ejecting molten materials caused by the thermal effect that nucleate in ambient air. The nuclei grow into nanoparticles and deposit over the surface. These nanoparticles,together with microstructures, improve the light collection efficiency of the SERS-active substrates. Especially after Au thin film deposition, these nanoparticles can provide nanogaps as hotspots for SERS. By orthogonal experiment design,laser processing parameters for better performances are determined. Compared with substrates fabricated by single 1064 nm master oscillator power amplifier(MOPA) laser ablation, substrates ablated by the primary 1064 nm MOPA laser and secondary UV pulsed laser show more uniform nanoparticles’ deposition over the surface. The optimized largearea substrate has a SERS detection limit of 10^(-8)mol/L for 4-aminothiophenol(4-ATP), indicating the potential realworld applications for trace detection.
