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温纳偏置电测深法压制表层电性不均匀体影响的研究 被引量:14
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作者 岳建华 刘树才 李志聃 《煤田地质与勘探》 CAS CSCD 北大核心 1994年第6期51-56,共6页
巷道底板浮煤等电性不均匀体及厚度变化是造成煤矿井下电测深曲线畸变的主要因素。通过模型实验研究了温纳偏置电测保法压制浮煤等表层电性不均匀体影响的能力。用感度分析法讨论了表层电性不均匀体产生地电干扰的机制。实测结果表明,... 巷道底板浮煤等电性不均匀体及厚度变化是造成煤矿井下电测深曲线畸变的主要因素。通过模型实验研究了温纳偏置电测保法压制浮煤等表层电性不均匀体影响的能力。用感度分析法讨论了表层电性不均匀体产生地电干扰的机制。实测结果表明,该方法改善了电测深曲线质量,有效地提高了电测深法地质应用效果。 展开更多
关键词 电测深法 表层电性 不均匀体影响
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Influence of particle size and surfactants on uniformity and quantity of silicon carbide particles in electrodeposited nickel-silicon carbide coatings 被引量:4
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作者 KAN Hong-min MENG Yuan-yuan Ramana G REDDY 《Journal of Central South University》 SCIE EI CAS CSCD 2021年第6期1627-1636,共10页
The electrodeposition of nickel-silicon carbide coatings on a copper electrode was done by mixing SiC particles in the nickel electrodeposition solution.The influence of surfactants and silicon carbide particle size o... The electrodeposition of nickel-silicon carbide coatings on a copper electrode was done by mixing SiC particles in the nickel electrodeposition solution.The influence of surfactants and silicon carbide particle size on uniformity and quantity of silicon carbide particles in nickel-silicon carbide composite coatings was investigated.It was found that particle size affects the nucleation overpotential,with 40 nm silicon carbide nanoparticles more effective in promoting nickel nucleation than 500 nm particles due to an increase in active nucleation sites.In terms of surfactants,anionic surfactant sodium dodecyl sulfate(SDS)produced better dispersion of 40 nm silicon carbide particles than cationic surfactant cetyltrimethyl ammonium bromide(CTAB),but little difference was found between the two when 500 nm silicon carbide particles were used.Thus,although the suspension of silicon carbide particles can be improved and their co-deposition can be promoted with a cationic surfactant CTAB,it is less effective than an anionic surfactant SDS in terms of surface finish. 展开更多
关键词 nickel-silicon carbide composite coating cyclic voltammetry potentiostatic transients sodium dodecyl sulfate surfactant cetyltrimethyl ammonium bromide surfactant
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