Two soluble copolymers of fluorenone and dioctoxylbenzene （PFN） or anthracene （PFNAn） were synthesized through Heck polymerization, and were characterized by gel permeation chromatography （GPC）, FT-IR, IH-NMR, e...Two soluble copolymers of fluorenone and dioctoxylbenzene （PFN） or anthracene （PFNAn） were synthesized through Heck polymerization, and were characterized by gel permeation chromatography （GPC）, FT-IR, IH-NMR, elemental analysis and thermogravimetric analysis. The polymers possess good solubility in common organic solvents and high thermal stability with the Onset decomposition temperature at higher than 410 ℃. The photophysical properties of the polymers were investigated in both solutions and spin-coated films. Cyclic voltammetry results revealed that the copolymers possess higher electron affinity and reversible reduction/re-oxidation processes. Their electroluminescent properties were further investigated. PFN and PFNAn show stable and saturated red light emission with high thermal stability and high electron injection ability. This type of conjugated polymers may be promising for the applications as electron acceptors in polymer photovoltaic cells and electron transporting materials.展开更多
The matrix polymer PTBCHNB bearing o-nitrobenzyl group was successfully synthesized by copolymerization of tertiary-butyl methacrylate(TBMA), cyclohexyl methacrylate(CHMA) and o-nitrobenzyl methacrylate(NBMA) via reve...The matrix polymer PTBCHNB bearing o-nitrobenzyl group was successfully synthesized by copolymerization of tertiary-butyl methacrylate(TBMA), cyclohexyl methacrylate(CHMA) and o-nitrobenzyl methacrylate(NBMA) via reversible addition fragmentation chain transfer(RAFT) polymerization method. PTBCHNB was characterized by FTIR, 1HNMR, GPC and DSC. After UV irradiation, the o-nitrobenzyl groups of PTBCHNB were photocleaved and the resulting carboxyl groups were highly alkali soluble, and PTBCHNB was converted to PCHIBMA bearing carboxyl groups. So, the matrix polymer could be etched by mild alkali solution with no requirements of photoacid generators and other diverse additives. The photocleavable behaviors of PTBCHNB were determined by FTIR, 1H NMR and TGA analysis. The resist formulated with PTBCHNB and cast in THF solution showed square pattern of 10 μm×10 μm using a mercury-xenon lamp in a contact printing mode and tetramethyl-ammonium hydroxide aqueous solution as a developer.展开更多
基金Projects(50803074, 50633050) supported by the National Natural Science Foundation of ChinaProject supported by the Opening Fund of State Key Laboratory of Powder MetallurgyStart-up Fund of Central South University, China
文摘Two soluble copolymers of fluorenone and dioctoxylbenzene （PFN） or anthracene （PFNAn） were synthesized through Heck polymerization, and were characterized by gel permeation chromatography （GPC）, FT-IR, IH-NMR, elemental analysis and thermogravimetric analysis. The polymers possess good solubility in common organic solvents and high thermal stability with the Onset decomposition temperature at higher than 410 ℃. The photophysical properties of the polymers were investigated in both solutions and spin-coated films. Cyclic voltammetry results revealed that the copolymers possess higher electron affinity and reversible reduction/re-oxidation processes. Their electroluminescent properties were further investigated. PFN and PFNAn show stable and saturated red light emission with high thermal stability and high electron injection ability. This type of conjugated polymers may be promising for the applications as electron acceptors in polymer photovoltaic cells and electron transporting materials.
基金Project(2008AA03323) supported by the High-Tech Research and Development of ChinaProject(21374016) supported by the National Natural Science Foundation of ChinaProject(BY201153) supported by Production,Forward-Looking Joint Research Project of Jiangsu Province,China
文摘The matrix polymer PTBCHNB bearing o-nitrobenzyl group was successfully synthesized by copolymerization of tertiary-butyl methacrylate(TBMA), cyclohexyl methacrylate(CHMA) and o-nitrobenzyl methacrylate(NBMA) via reversible addition fragmentation chain transfer(RAFT) polymerization method. PTBCHNB was characterized by FTIR, 1HNMR, GPC and DSC. After UV irradiation, the o-nitrobenzyl groups of PTBCHNB were photocleaved and the resulting carboxyl groups were highly alkali soluble, and PTBCHNB was converted to PCHIBMA bearing carboxyl groups. So, the matrix polymer could be etched by mild alkali solution with no requirements of photoacid generators and other diverse additives. The photocleavable behaviors of PTBCHNB were determined by FTIR, 1H NMR and TGA analysis. The resist formulated with PTBCHNB and cast in THF solution showed square pattern of 10 μm×10 μm using a mercury-xenon lamp in a contact printing mode and tetramethyl-ammonium hydroxide aqueous solution as a developer.
