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基于西门子840D的轧辊磨床纳米数控系统研究与开发 被引量:2
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作者 毕俊喜 俞涛 李强 《制造技术与机床》 CSCD 北大核心 2006年第2期31-33,共3页
基于西门子最新的840D开放式数控平台和功能强大的SIMATICS7-300PLC,按照模块化的软件设计思想,利用OEM开发包和高级语言编程工具相结合,开发研究轧辊磨床智能化纳米数控系统。介绍了控制系统的结构体系、功能模块划分和主要模块的实现... 基于西门子最新的840D开放式数控平台和功能强大的SIMATICS7-300PLC,按照模块化的软件设计思想,利用OEM开发包和高级语言编程工具相结合,开发研究轧辊磨床智能化纳米数控系统。介绍了控制系统的结构体系、功能模块划分和主要模块的实现方法。 展开更多
关键词 840D 轧辊磨床 纳米数控 开放式 智能化
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基于PROFIBUS-DP的SIMATIC S7-300通讯及网络组态研究 被引量:4
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作者 陆胜 刘锬 《机床与液压》 北大核心 2007年第9期15-16,19,共3页
介绍了西门子SIMATIC S7-300中的PROFIBUS-DP协议、通讯及网络组态,以及纳米数控中基于PROFIBUS-DP主/从站的建立方法和通讯原理。本文所述的方法和通讯原理在某基于先进控制平台840D的专用数控加工中心得到较好的验证,网络组态的使用... 介绍了西门子SIMATIC S7-300中的PROFIBUS-DP协议、通讯及网络组态,以及纳米数控中基于PROFIBUS-DP主/从站的建立方法和通讯原理。本文所述的方法和通讯原理在某基于先进控制平台840D的专用数控加工中心得到较好的验证,网络组态的使用提高了加工数据的实时通讯能力。 展开更多
关键词 PROFIBUS-DP 纳米数控 组态 通讯
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Defect-free surface of quartz glass polished in elastic mode by chemical impact reaction 被引量:1
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作者 彭文强 关朝亮 李圣怡 《Journal of Central South University》 SCIE EI CAS 2014年第12期4438-4444,共7页
Removal of brittle materials in the brittle or ductile mode inevitably causes damaged or strained surface layers containing cracks, scratches or dislocations. Within elastic deformation, the arrangement of each atom c... Removal of brittle materials in the brittle or ductile mode inevitably causes damaged or strained surface layers containing cracks, scratches or dislocations. Within elastic deformation, the arrangement of each atom can be recovered back to its original position without any defects introduced. Based on surface hydroxylation and chemisorption theory, material removal mechanism of quartz glass in the elastic mode is analyzed to obtain defect-free surface. Elastic contact condition between nanoparticle and quartz glass surface is confirmed from the Hertz contact theory model. Atoms on the quartz glass surface are removed by chemical bond generated by impact reaction in the elastic mode, so no defects are generated without mechanical process. Experiment was conducted on a numerically controlled system for nanoparticle jet polishing, and one flat quartz glass was polished in the elastic mode. Results show that scratches on the sample surface are completely removed away with no mechanical defects introduced, and microroughness(Ra) is decreased from 1.23 nm to 0.47 nm. Functional group Ce — O — Si on ceria nanoparticles after polishing was detected directly and indirectly by FTIR, XRD and XPS spectra analysis from which the chemical impact reaction is validated. 展开更多
关键词 defect-free surface chemical impact reaction nanoparticle jet polishing elastic mode
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