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高分辨快原子轰击质谱法研究 被引量:1
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作者 程光荣 曹淑兰 张刚 《质谱学报》 EI CAS CSCD 1994年第2期77-80,共4页
本文介绍高分辩快原子轰击质谱技术(HRFABMS)。同时给出了内标物质和测量条件,讨论了数据处理方法。
关键词 离分辨 快原子轰击 质谱法 内标物
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Determination of trace elements in high purity nickel by high resolution inductively coupled plasma mass spectrometry 被引量:11
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作者 聂西度 梁逸曾 +1 位作者 唐有根 谢华林 《Journal of Central South University》 SCIE EI CAS 2012年第9期2416-2420,共5页
The contents ofMg, Al, Si, Ti, Cr, Mn, Fe, Co, Cu, Ga, As, Se, Cd, Sb, Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). The sample was diss... The contents ofMg, Al, Si, Ti, Cr, Mn, Fe, Co, Cu, Ga, As, Se, Cd, Sb, Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). The sample was dissolved in HNO3 and HCI by microwave digestion. Most of the spectral interferences could be avoided by measuring in the high resolution mode. The matrix effects because of the presence of excess HC1 and nickel were evaluated. Correction for matrix effects was made using Sc, Rh and T1 as internal standards. The optimum conditions for the determination were tested and discussed. The detection limits range from 0.012 to 1.76 ~tg/g depending on the type of elements. The applicability of the proposed method is also validated by the analysis of high purity nickel reference material (NIST SRM 671). The relative standard deviation (RSD) is less than 3.3%. Results for determination of trace elements in high purity nickel were presented. 展开更多
关键词 high resolution inductively coupled plasma mass spectrometry high purity nickel trace element matrix effect internal standard
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