将水稻移植到0.2 mmol/L Ca SO4溶液中饥饿2 d,采用改进耗竭法研究了3种铵硝配比条件下3个不同硅效应水稻(耐低硅的硅高效水稻特优998和不耐低硅的硅高效水稻特优248以及硅不敏感水稻博Ⅱ优15)硅吸收动力学特征。结果表明:作图法和双倒...将水稻移植到0.2 mmol/L Ca SO4溶液中饥饿2 d,采用改进耗竭法研究了3种铵硝配比条件下3个不同硅效应水稻(耐低硅的硅高效水稻特优998和不耐低硅的硅高效水稻特优248以及硅不敏感水稻博Ⅱ优15)硅吸收动力学特征。结果表明:作图法和双倒数法动力学方程准确性高,达到极显著水平;不同铵硝配比条件水稻硅吸收动力学曲线均符合Michaelis-Menten酶动力学模型的描述;铵硝配比对不同的硅效应水稻的硅载体数量影响不显著,显著影响水稻对硅的亲和力。本实验条件下铵硝配比50/50有利于水稻特优248对硅的吸收,铵硝比75/25时吸收速率最低;特优998对硅有较高的亲和力,可能是其耐低硅高效的遗传性差别。展开更多
A combined conduction and radiation heat transfer model was used to simulate the heat transfer within wafer and investigate the effect of thermal transport properties on temperature non-uniformity within wafer surface...A combined conduction and radiation heat transfer model was used to simulate the heat transfer within wafer and investigate the effect of thermal transport properties on temperature non-uniformity within wafer surface. It is found that the increased conductivities in both doped and undoped regions help reduce the temperature difference across the wafer surface. However, the doped layer conductivity has little effect on the overall temperature distribution and difference. The temperature level and difference on the top surface drop suddenly when absorption coefficient changes from 104 to 103 m-1. When the absorption coefficient is less or equal to 103 m-1, the temperature level and difference do not change much. The emissivity has the dominant effect on the top surface temperature level and difference. Higher surface emissivity can easily increase the temperature level of the wafer surface. After using the improved property data, the overall temperature level reduces by about 200 K from the basis case. The results will help improve the current understanding of the energy transport in the rapid thermal processing and the wafer temperature monitor and control level.展开更多
文摘将水稻移植到0.2 mmol/L Ca SO4溶液中饥饿2 d,采用改进耗竭法研究了3种铵硝配比条件下3个不同硅效应水稻(耐低硅的硅高效水稻特优998和不耐低硅的硅高效水稻特优248以及硅不敏感水稻博Ⅱ优15)硅吸收动力学特征。结果表明:作图法和双倒数法动力学方程准确性高,达到极显著水平;不同铵硝配比条件水稻硅吸收动力学曲线均符合Michaelis-Menten酶动力学模型的描述;铵硝配比对不同的硅效应水稻的硅载体数量影响不显著,显著影响水稻对硅的亲和力。本实验条件下铵硝配比50/50有利于水稻特优248对硅的吸收,铵硝比75/25时吸收速率最低;特优998对硅有较高的亲和力,可能是其耐低硅高效的遗传性差别。
基金Project(N110204015)supported by the Fundamental Research Funds for the Central Universities,ChinaProject(2012M510075)supported by the China Postdoctoral Science Foundation
文摘A combined conduction and radiation heat transfer model was used to simulate the heat transfer within wafer and investigate the effect of thermal transport properties on temperature non-uniformity within wafer surface. It is found that the increased conductivities in both doped and undoped regions help reduce the temperature difference across the wafer surface. However, the doped layer conductivity has little effect on the overall temperature distribution and difference. The temperature level and difference on the top surface drop suddenly when absorption coefficient changes from 104 to 103 m-1. When the absorption coefficient is less or equal to 103 m-1, the temperature level and difference do not change much. The emissivity has the dominant effect on the top surface temperature level and difference. Higher surface emissivity can easily increase the temperature level of the wafer surface. After using the improved property data, the overall temperature level reduces by about 200 K from the basis case. The results will help improve the current understanding of the energy transport in the rapid thermal processing and the wafer temperature monitor and control level.
