Diamond films were deposited on high-speed steel substrates by hot filament chemical vapor deposition （HFCVD） method. To minimize the early formation of graphite and to enhance the diamond film adhesion, a WC-Co coa...Diamond films were deposited on high-speed steel substrates by hot filament chemical vapor deposition （HFCVD） method. To minimize the early formation of graphite and to enhance the diamond film adhesion, a WC-Co coating was used as an interlayer on the steel substrates by high velocity oxy-fuel spraying. The effects of methane content on nucleation, quality, residual stress and adhesion of diamond films were investigated. The results indicate that the increasing methane content leads to the increase in nucleation density, residual stress, the degradation of quality and adhesion of diamond films. Diamond films deposited on high-speed steel （HSS） substrate with a WC-Co interlayer exhibit high nucleation density and good adhesion under the condition of the methane content initially set to be a higher value （4%, volume fraction） for 30 min, and then reduced to 2% for subsequent growth at pressure of 3 kPa and substrate temperature of 800 ℃.展开更多
A Ti interlayer with thickness about 300 nm was sputtered on Cu microchannels, followed by an ultrasonic seeding with nanodiamond powders. Adherent diamond film with crystalline grains close to thermal equilibrium sha...A Ti interlayer with thickness about 300 nm was sputtered on Cu microchannels, followed by an ultrasonic seeding with nanodiamond powders. Adherent diamond film with crystalline grains close to thermal equilibrium shape was tightly deposited by hot-filament chemical vapor deposition(HF-CVD). The nucleation and growth of diamond were investigated with micro-Raman spectroscope and field emission scanning electron microscope(FE-SEM) with energy dispersive X-ray detector(EDX). Results show that the nucleation density is found to be up to 1010 cm-2. The enhancement of the nucleation kinetics can be attributed to the nanometer rough Ti interlayer surface. An improved absorption of nanodiamond particles is found, which act as starting points for the diamond nucleation during HF-CVD process. Furthermore, finite element simulation was conducted to understand the thermal management properties of prepared diamond/Cu microchannel heat sink.展开更多
基金Project(1343-74236000005) supported by the Innovation Foundation for Postgraduates of Hunan Province, ChinaProject(ZKJ2008001) supported by the Open Fund for Valuable Instruments of Central South University, ChinaProject(2008112048) supported by the Open Fund of State Key Laboratory of Metallurgy, China
文摘Diamond films were deposited on high-speed steel substrates by hot filament chemical vapor deposition （HFCVD） method. To minimize the early formation of graphite and to enhance the diamond film adhesion, a WC-Co coating was used as an interlayer on the steel substrates by high velocity oxy-fuel spraying. The effects of methane content on nucleation, quality, residual stress and adhesion of diamond films were investigated. The results indicate that the increasing methane content leads to the increase in nucleation density, residual stress, the degradation of quality and adhesion of diamond films. Diamond films deposited on high-speed steel （HSS） substrate with a WC-Co interlayer exhibit high nucleation density and good adhesion under the condition of the methane content initially set to be a higher value （4%, volume fraction） for 30 min, and then reduced to 2% for subsequent growth at pressure of 3 kPa and substrate temperature of 800 ℃.
基金Project(21271188) supported by the National Natural Science Foundation of China
文摘A Ti interlayer with thickness about 300 nm was sputtered on Cu microchannels, followed by an ultrasonic seeding with nanodiamond powders. Adherent diamond film with crystalline grains close to thermal equilibrium shape was tightly deposited by hot-filament chemical vapor deposition(HF-CVD). The nucleation and growth of diamond were investigated with micro-Raman spectroscope and field emission scanning electron microscope(FE-SEM) with energy dispersive X-ray detector(EDX). Results show that the nucleation density is found to be up to 1010 cm-2. The enhancement of the nucleation kinetics can be attributed to the nanometer rough Ti interlayer surface. An improved absorption of nanodiamond particles is found, which act as starting points for the diamond nucleation during HF-CVD process. Furthermore, finite element simulation was conducted to understand the thermal management properties of prepared diamond/Cu microchannel heat sink.
